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公开(公告)号:US20160155866A1
公开(公告)日:2016-06-02
申请号:US14953264
申请日:2015-11-27
Applicant: LG ELECTRONICS INC.
Inventor: Jungmin HA , Sungjin KIM , Juhwa CHEONG , Junyong AHN , Hyungwook CHOI , Wonjae CHANG , Jaesung KIM
IPC: H01L31/0224 , H01L31/0368 , H01L31/077 , H01L31/02 , H01L31/18 , H01L31/0216
CPC classification number: H01L31/022433 , H01L31/0201 , H01L31/02167 , H01L31/02168 , H01L31/022425 , H01L31/03685 , H01L31/0747 , H01L31/077 , H01L31/1824 , H01L31/1864 , H01L31/1868 , Y02E10/50
Abstract: Disclosed are a solar cell and a method for manufacturing the same. A solar cell includes a semiconductor substrate, a tunnel layer on the first surface of the semiconductor substrate, a first conductive type semiconductor region on the tunnel layer and includes impurities of a first conductive type, a second conductive type semiconductor region on a second surface and includes impurities of a second conductive type opposite the first conductive type, a first passivation film on the first conductive type semiconductor region, a first electrode formed on the first passivation film and connected to the first conductive type semiconductor region through an opening portion formed in the first passivation film, a second passivation film on the second conductive type semiconductor region, and a second electrode formed on the second passivation film and connected to the second conductive type semiconductor region through an opening portion formed in the second passivation film.
Abstract translation: 公开了一种太阳能电池及其制造方法。 太阳能电池包括半导体衬底,半导体衬底的第一表面上的隧道层,隧道层上的第一导电类型半导体区域,并且包括第一导电类型的杂质,第二表面上的第二导电类型半导体区域, 包括与第一导电类型相反的第二导电类型的杂质,第一导电类型半导体区域上的第一钝化膜,形成在第一钝化膜上并通过形成在第一导电类型半导体区域中的开口部分连接到第一导电类型半导体区域的第一电极 第一钝化膜,第二导电型半导体区域上的第二钝化膜,以及形成在第二钝化膜上并通过形成在第二钝化膜中的开口部分连接到第二导电型半导体区域的第二电极。
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公开(公告)号:US20190326456A1
公开(公告)日:2019-10-24
申请号:US16457129
申请日:2019-06-28
Applicant: LG ELECTRONICS INC.
Inventor: Jungmin HA , Sungjin KIM , Juhwa CHEONG , Junyong AHN , Hyungwook CHOI , Wonjae CHANG , Jaesung KIM
IPC: H01L31/0224 , H01L31/18 , H01L31/0747 , H01L31/077 , H01L31/02 , H01L31/0368 , H01L31/0216
Abstract: A method for manufacturing a solar cell can include forming a tunneling layer on first and second surfaces of a semiconductor substrate, the tunneling layer including a dielectric material; forming a polycrystalline silicon layer on the tunnel layer at the first surface and on the second surface of the semiconductor substrate; removing portions of the tunnel layer and the polycrystalline silicon layer formed at the first surface of the semiconductor substrate; forming a doping region at the first surface of the semiconductor substrate by diffusing a dopant; forming a passivation layer on the polycrystalline silicon layer at the second surface of the semiconductor substrate; and forming a second electrode connected to the polycrystalline silicon layer by penetrating through the passivation layer.
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公开(公告)号:US20180277694A1
公开(公告)日:2018-09-27
申请号:US15995701
申请日:2018-06-01
Applicant: LG ELECTRONICS INC.
Inventor: Jungmin HA , Sungjin KIM , Juhwa CHEONG , Junyong AHN , Hyungwook CHOI , Wonjae CHANG , Jaesung KIM
IPC: H01L31/0224 , H01L31/0747 , H01L31/18 , H01L31/077 , H01L31/02 , H01L31/0368 , H01L31/0216
CPC classification number: H01L31/022433 , H01L31/0201 , H01L31/02167 , H01L31/02168 , H01L31/022425 , H01L31/03685 , H01L31/0747 , H01L31/077 , H01L31/1824 , H01L31/1864 , H01L31/1868 , Y02E10/50
Abstract: A solar cell can include a silicon semiconductor substrate having a first conductive type; a oxide layer on a first surface of the silicon semiconductor substrate; a polysilicon layer on the oxide layer and having the first conductive type; an emitter region at a second surface of the silicon semiconductor substrate opposite to the first surface and having a second conductive type opposite to the first conductive type; a first passivation film on the polysilicon layer; a first electrode connected to the polysilicon layer through an opening formed in the first passivation film; a second passivation film on the emitter region; and a second electrode connected to the emitter region through an opening formed in the second passivation film.
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公开(公告)号:US20190319140A1
公开(公告)日:2019-10-17
申请号:US16456915
申请日:2019-06-28
Applicant: LG ELECTRONICS INC.
Inventor: Jungmin HA , Sungjin KIM , Juhwa CHEONG , Junyong AHN , Hyungwook CHOI , Wonjae CHANG , Jaesung KIM
IPC: H01L31/0224 , H01L31/18 , H01L31/0747 , H01L31/077 , H01L31/02 , H01L31/0368 , H01L31/0216
Abstract: A solar cell can include a silicon substrate; a tunnel layer disposed on a first surface of the silicon substrate, the tunnel layer including a dielectric material; a polycrystalline silicon layer disposed on the tunnel layer; a dielectric layer disposed on the polycrystalline silicon layer; and an electrode penetrating through the dielectric layer and directly contacting with the polycrystalline silicon layer, wherein the polycrystalline silicon layer includes a metal crystal region positioned at a region where the polycrystalline silicon layer contacts the electrode, and wherein the metal crystal region includes a plurality of metal crystals, the plurality of metal crystals including a metal material same as a metal material included in the electrode.
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公开(公告)号:US20220262967A1
公开(公告)日:2022-08-18
申请号:US17627541
申请日:2020-04-09
Applicant: LG ELECTRONICS INC.
Inventor: Sungjin KIM , Juhwa CHEONG , Hyungwook CHOI , Wonjae CHANG
IPC: H01L31/0368 , H01L31/0224 , H01L31/18
Abstract: A solar cell according to an embodiment of the present disclosure includes a first passivation layer including a first aluminum oxide layer positioned on a first conductivity-type region composed of a polycrystalline silicon layer having an n-type conductivity and having hydrogen, and a first dielectric layer positioned on the first aluminum oxide layer and including a material different from the first aluminum oxide layer.
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公开(公告)号:US20190148573A1
公开(公告)日:2019-05-16
申请号:US16250463
申请日:2019-01-17
Applicant: LG ELECTRONICS INC.
Inventor: Jungmin HA , Sungjin KIM , Juhwa CHEONG , Junyong AHN , Hyungwook CHOI , Wonjae CHANG , Jaesung KIM
IPC: H01L31/0224 , H01L31/18 , H01L31/0216 , H01L31/0368 , H01L31/077 , H01L31/02 , H01L31/0747
Abstract: A solar cell can include a silicon semiconductor substrate; an oxide layer on a first surface of the silicon semiconductor substrate; a polysilicon layer on the oxide layer; a diffusion region at a second surface of the silicon semiconductor substrate; a dielectric film on the polysilicon layer; a first electrode connected to the polysilicon layer through the dielectric film; a passivation film on the diffusion region; and a second electrode connected to the diffusion region through the passivation film.
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公开(公告)号:US20180248060A1
公开(公告)日:2018-08-30
申请号:US15904030
申请日:2018-02-23
Applicant: LG ELECTRONICS INC.
Inventor: Younggu DO , Sungjin KIM , Hyungwook CHOI
IPC: H01L31/04 , H01L31/0376 , H01L31/18 , H01L31/0352
CPC classification number: H01L31/04 , H01L31/02167 , H01L31/022425 , H01L31/02363 , H01L31/0352 , H01L31/03762 , H01L31/068 , H01L31/1804 , H01L31/1864 , H01L31/1868 , H01L31/202 , Y02E10/547 , Y02P70/521
Abstract: Provided is a method of manufacturing a photovoltaic solar cell, including: forming a first conductivity type region that contains a first conductivity dopant, on one surface of a semiconductor substrate and an opposite surface that is opposite to the one surface; removing the first conductivity type region formed on the opposite surface of the semiconductor substrate by performing dry etching; and forming a second conductivity type region that contains a second conductivity type dopant, on the opposite surface of the semiconductor substrate.
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公开(公告)号:US20170309761A1
公开(公告)日:2017-10-26
申请号:US15643180
申请日:2017-07-06
Applicant: LG ELECTRONICS INC.
Inventor: Jungmin HA , Sungjin KIM , Juhwa CHEONG , Junyong AHN , Hyungwook CHOI , Wonjae CHANG , Jaesung KIM
IPC: H01L31/0224 , H01L31/18 , H01L31/0216 , H01L31/02 , H01L31/0368 , H01L31/0747 , H01L31/077
CPC classification number: H01L31/022433 , H01L31/0201 , H01L31/02167 , H01L31/02168 , H01L31/022425 , H01L31/03685 , H01L31/0747 , H01L31/077 , H01L31/1824 , H01L31/1864 , H01L31/1868 , Y02E10/50
Abstract: A method for manufacturing a solar cell can include a tunnel layer forming step of forming a tunnel layer on a first surface of a semiconductor substrate, a first conductive type semiconductor region forming step of forming a first conductive type semiconductor region on the first surface of the semiconductor substrate, a second conductive type semiconductor region forming step of forming a second conductive type semiconductor region by doping impurities of a second conductive type into a second surface of the semiconductor substrate, a first passivation film forming step of forming a first passivation film on the first conductive type semiconductor region and an electrode forming step of forming a first electrode connected to the first conductive type semiconductor region and a second electrode connected to the second conductive type semiconductor region.
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