公开(公告)号：US08249220B2

公开(公告)日：2012-08-21

申请号：US12578667

申请日：2009-10-14

Applicant: Boris Verman ,  Yuriy Platonov ,  Licai Jiang

Inventor： Boris Verman ,  Yuriy Platonov ,  Licai Jiang

IPC: G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray optical system includes an x-ray source which emits x-rays, a first optical element which conditions the x-rays to form two beams and at least a second optical element which further conditions at least one of the two beams from the first optical element.

Abstract translation: X射线光学系统包括发射x射线的X射线源，调节X射线以形成两个光束的第一光学元件和至少另外将来自两个光束中的至少一个的条件的第二光学元件 第一光学元件。

公开(公告)号：US08111807B2

公开(公告)日：2012-02-07

申请号：US12560803

申请日：2009-09-16

Applicant: Takashi Ida ,  Licai Jiang

Inventor： Takashi Ida ,  Licai Jiang

IPC: G01N23/207 ,  G01N23/20

CPC classification number: G01N23/207

Abstract: A sample is supported on a flat rotary specimen stage and irradiated at an incidence angle θ via a divergence slit with an x-ray beam emitted by an x-ray source, the diffraction beam from the sample is received via a divergence slit and the light-receiving slit by an x-ray detector placed at the position of a diffraction angle 2θ to generate diffraction beam intensity data, the x-ray incidence angle θ and diffraction angle 2θ are fixed at intrinsic values on the sample, the sample is rotated within a plane at designated step angles by the flat rotary specimen stage, the diffraction beam intensity is measured by the x-ray detector in each in-plane rotation step, the variance induced by particle statistics is calculated from the calculated diffraction beam intensities, and the size of the crystallites in the sample is calculated based on the variance induced by the particle statistics.

Abstract translation: 样品支撑在平面旋转样品台上并以入射角照射; 通过具有由X射线源发射的x射线束的发散狭缝，来自样品的衍射光束经由发散狭缝接收，并且光接收狭缝通过放置在衍射角位置处的X射线检测器 2＆thetas; 产生衍射光束强度数据，X射线入射角度; 和衍射角2＆thetas; 固定在样品的固有值上，样品以平面旋转样品台在指定的步进角度的平面内旋转，衍射光束强度通过X射线检测器在每个面内旋转步骤中测量，方差诱导 根据计算的衍射光束强度计算颗粒统计量，并且基于由粒子统计引起的方差计算样品中微晶的尺寸。

公开(公告)号：US20110064199A1

公开(公告)日：2011-03-17

申请号：US12560803

申请日：2009-09-16

Applicant: Takashi IDA ,  Licai Jiang

Inventor： Takashi IDA ,  Licai Jiang

IPC: G01N23/207

CPC classification number: G01N23/207

Abstract: A sample is supported on a flat rotary specimen stage and irradiated at an incidence angle θ via a divergence slit with an x-ray beam emitted by an x-ray source, the diffraction beam from the sample is received via a divergence slit and the light-receiving slit by an x-ray detector placed at the position of a diffraction angle 2θ to generate diffraction beam intensity data, the x-ray incidence angle θ and diffraction angle 2θ are fixed at intrinsic values on the sample, the sample is rotated within a plane at designated step angles by the flat rotary specimen stage, the diffraction beam intensity is measured by the x-ray detector in each in-plane rotation step, the variance induced by particle statistics is calculated from the calculated diffraction beam intensities, and the size of the crystallites in the sample is calculated based on the variance induced by the particle statistics.

Abstract translation: 样品支撑在平面旋转样品台上并以入射角照射; 通过具有由X射线源发射的x射线束的发散狭缝，来自样品的衍射光束经由发散狭缝接收，并且光接收狭缝通过放置在衍射角位置处的X射线检测器 2＆thetas; 产生衍射光束强度数据，X射线入射角度; 和衍射角2＆thetas; 固定在样品的固有值上，样品以平面旋转样品台在指定的步进角度的平面内旋转，衍射光束强度通过X射线检测器在每个面内旋转步骤中测量，方差诱导 根据计算的衍射光束强度计算颗粒统计量，并且基于由粒子统计引起的方差计算样品中微晶的尺寸。

公开(公告)号：US09336917B2

公开(公告)日：2016-05-10

申请号：US13142787

申请日：2010-06-30

Applicant: Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

Inventor： Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

IPC: G21K1/06 ,  G01J3/12 ,  B82Y10/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G01J3/12 ,  G21K1/062 ,  G21K2201/064 ,  H01J2237/1205 ,  H01J2237/1516

Abstract: An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatus 100 includes a monochromator 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

Abstract translation: 一种X射线装置，其产生具有窄能带宽的虚拟光源，并能进行高分辨率X射线衍射测量; 使用该方法的方法; 并提供X射线照射方法。 X射线装置100包括：单色器105，其分散发散的X射线束;以及选择部107，其安装在聚光的X射线束的聚光位置，用于选择具有波长的X射线 在一个特定的范围内，允许它通过，并创建一个虚拟源。 利用这种布置，可以在焦点110处创建具有窄能带宽的虚拟源，并且借助于虚拟源，可以获得高分辨率X射线衍射测量。 通过使用X射线装置100，能够从Kα2射线充分地分离具有例如Kα1射线的极窄能量带宽的X射线束。 此外，还可以切出部分连续X射线束以创建虚拟源。

公开(公告)号：US20110085644A1

公开(公告)日：2011-04-14

申请号：US12578667

申请日：2009-10-14

Applicant: Boris Verman ,  Yuriy Platonov ,  Licai Jiang

Inventor： Boris Verman ,  Yuriy Platonov ,  Licai Jiang

IPC: G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray optical system includes an x-ray source which emits x-rays, a first optical element which conditions the x-rays to form two beams and at least a second optical element which further conditions at least one of the two beams from the first optical element.

Abstract translation: X射线光学系统包括发射x射线的X射线源，调节X射线以形成两个光束的第一光学元件和至少另外将来自两个光束中的至少一个的条件的第二光学元件 第一光学元件。

公开(公告)号：US20090296889A1

公开(公告)日：2009-12-03

申请号：US12130574

申请日：2008-05-30

Applicant: Licai Jiang

Inventor： Licai Jiang

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

Abstract translation: 一种用于产生高强度X射线束的X射线光学系统。 该系统包括具有通过围绕不同于光学器件的几何对称轴线的旋转轴线旋转限定轮廓而形成的表面的光学元件。 因此，系统可以使用具有圆形发射轮廓或大的源的源来向样品提供增加的通量。

公开(公告)号：US06330301B1

公开(公告)日：2001-12-11

申请号：US09466261

申请日：1999-12-17

Applicant: Licai Jiang

Inventor： Licai Jiang

IPC: G21K106

CPC classification number: G01N23/201

Abstract: An x-ray analysis system including a focusing optic for focusing an x-ray beam to a focal point, a first slit optically coupled to the focusing optic, a second slit optically coupled to the first slit, and an x-ray detector, where the focal point is located in front of the detector.

Abstract translation: 一种X射线分析系统，包括用于将X射线束聚焦到焦点的聚焦光学器件，与聚焦光学器件光学耦合的第一狭缝，与第一狭缝光学耦合的第二狭缝和x射线检测器，其中 焦点位于检测器前面。

公开(公告)号：US20120051518A1

公开(公告)日：2012-03-01

申请号：US13266842

申请日：2010-04-14

Applicant: Kazuhiko Omote ,  Boris Verman ,  Licai Jiang

Inventor： Kazuhiko Omote ,  Boris Verman ,  Licai Jiang

IPC: G01N23/201

CPC classification number: G21K1/06 ,  G01N23/201

Abstract: A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.

Abstract translation: X射线散射测量装置和测量方法可以以高分辨率测量已经经历小角度散射和具有反射几何形状的衍射的X射线的强度，并且可以容易且精确地测量样品表面上的微结构。 X射线散射测量装置适用于样品表面的微结构测量，包括产生X射线的X射线源; 连续地反映所产生的X射线的第一镜和第二镜; 支持样品的样品台; 以及检测在样品表面上散射的X射线的二维检测器。 第一个镜子将生成的X射线聚焦到平行于样品表面的平面内的二维检测器上，而第二反射镜将由第一反射镜反射的X射线在垂直的平面内的样品表面上聚焦 到样品表面。

公开(公告)号：US20110280530A1

公开(公告)日：2011-11-17

申请号：US13051708

申请日：2011-03-18

Applicant: Boris Verman ,  Licai Jiang

Inventor： Boris Verman ,  Licai Jiang

IPC: G02B6/04 ,  B82Y20/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061

Abstract: An x-ray generating system includes a source of x-ray radiation, a waveguide bundle optic for collimating the x-ray radiation produced by the source, a focusing optic for focusing the collimated x-ray radiation to a focal point.

Abstract translation: X射线产生系统包括X射线辐射源，用于准直由源产生的x射线辐射的波导束光学器件，用于将准直X射线辐射聚焦到焦点的聚焦光学器件。

公开(公告)号：US20110188636A1

公开(公告)日：2011-08-04

申请号：US12699493

申请日：2010-02-03

Applicant: Boris Verman ,  Michael Young ,  Licai Jiang

Inventor： Boris Verman ,  Michael Young ,  Licai Jiang

IPC: H01J35/04 ,  G21K1/00 ,  H01J35/30 ,  G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.

Abstract translation: 多光束X射线系统包括发射x射线的X射线源和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学元件。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 理想位置。