公开(公告)号：US09336917B2

公开(公告)日：2016-05-10

申请号：US13142787

申请日：2010-06-30

申请人： Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

发明人： Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

IPC分类号： G21K1/06 ,  G01J3/12 ,  B82Y10/00

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G01J3/12 ,  G21K1/062 ,  G21K2201/064 ,  H01J2237/1205 ,  H01J2237/1516

摘要： An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatus 100 includes a monochromator 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

摘要翻译： 一种X射线装置，其产生具有窄能带宽的虚拟光源，并能进行高分辨率X射线衍射测量; 使用该方法的方法; 并提供X射线照射方法。 X射线装置100包括：单色器105，其分散发散的X射线束;以及选择部107，其安装在聚光的X射线束的聚光位置，用于选择具有波长的X射线 在一个特定的范围内，允许它通过，并创建一个虚拟源。 利用这种布置，可以在焦点110处创建具有窄能带宽的虚拟源，并且借助于虚拟源，可以获得高分辨率X射线衍射测量。 通过使用X射线装置100，能够从Kα2射线充分地分离具有例如Kα1射线的极窄能量带宽的X射线束。 此外，还可以切出部分连续X射线束以创建虚拟源。

公开(公告)号：US20110268252A1

公开(公告)日：2011-11-03

申请号：US13142787

申请日：2010-06-30

申请人： Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

发明人： Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

IPC分类号： G01T1/36

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G01J3/12 ,  G21K1/062 ,  G21K2201/064 ,  H01J2237/1205 ,  H01J2237/1516

摘要： An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided.An X-ray apparatus 100 includes a spectrometer 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

摘要翻译： 一种X射线装置，其产生具有窄能带宽的虚拟光源，并能进行高分辨率X射线衍射测量; 使用该方法的方法; 并提供X射线照射方法。 X射线装置100包括分光器105，其分散发散的X射线束;以及选择部107，其安装在聚光X射线束的聚光位置，用于选择具有波长的X射线束 在一个特定的范围内，允许它通过，并创建一个虚拟源。 利用这种布置，可以在焦点110处创建具有窄能带宽的虚拟源，并且借助于虚拟源，可以获得高分辨率X射线衍射测量。 通过使用X射线装置100，能够从Kα2射线充分地分离具有例如Kα1射线的极窄能量带宽的X射线束。 此外，还可以切出部分连续X射线束以创建虚拟源。

公开(公告)号：US20120051518A1

公开(公告)日：2012-03-01

申请号：US13266842

申请日：2010-04-14

申请人： Kazuhiko Omote ,  Boris Verman ,  Licai Jiang

发明人： Kazuhiko Omote ,  Boris Verman ,  Licai Jiang

IPC分类号： G01N23/201

CPC分类号： G21K1/06 ,  G01N23/201

摘要： A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.

摘要翻译： X射线散射测量装置和测量方法可以以高分辨率测量已经经历小角度散射和具有反射几何形状的衍射的X射线的强度，并且可以容易且精确地测量样品表面上的微结构。 X射线散射测量装置适用于样品表面的微结构测量，包括产生X射线的X射线源; 连续地反映所产生的X射线的第一镜和第二镜; 支持样品的样品台; 以及检测在样品表面上散射的X射线的二维检测器。 第一个镜子将生成的X射线聚焦到平行于样品表面的平面内的二维检测器上，而第二反射镜将由第一反射镜反射的X射线在垂直的平面内的样品表面上聚焦 到样品表面。

公开(公告)号：US08767918B2

公开(公告)日：2014-07-01

申请号：US13266842

申请日：2010-04-14

申请人： Kazuhiko Omote ,  Boris Verman ,  Licai Jiang

发明人： Kazuhiko Omote ,  Boris Verman ,  Licai Jiang

IPC分类号： G21K1/06 ,  G01N23/201

CPC分类号： G21K1/06 ,  G01N23/201

摘要： A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.

摘要翻译： X射线散射测量装置和测量方法可以以高分辨率测量已经经历小角度散射和具有反射几何形状的衍射的X射线的强度，并且可以容易且精确地测量样品表面上的微结构。 X射线散射测量装置适用于样品表面的微结构测量，包括产生X射线的X射线源; 连续地反映所产生的X射线的第一镜和第二镜; 支持样品的样品台; 以及检测在样品表面上散射的X射线的二维检测器。 第一个镜子将生成的X射线聚焦到平行于样品表面的平面内的二维检测器上，而第二反射镜将由第一反射镜反射的X射线在垂直的平面内的样品表面上聚焦 到样品表面。

公开(公告)号：US06937694B2

公开(公告)日：2005-08-30

申请号：US10129415

申请日：2002-05-01

申请人： Ryouichi Yokoyama ,  Kazuhiko Omote ,  Kamihisa Endo ,  Ryuji Matsuo

发明人： Ryouichi Yokoyama ,  Kazuhiko Omote ,  Kamihisa Endo ,  Ryuji Matsuo

IPC分类号： G01N23/207

CPC分类号： G01N23/207

摘要： A method for measuring a pole of a sample, using a reflection method, is effective substantially over all measurement regions ranging from the region of high-tilting-angle α of a conventional pole measuring to the in-plane diffraction region corresponding to low-tilting-angle α.

摘要翻译： 使用反射方法测量样品的极点的方法基本上在所有测量范围内有效，所述测量范围从常规极点测量的高倾斜角α的区域到对应于低倾斜度的面内衍射区域 角α。

公开(公告)号：US06385281B1

公开(公告)日：2002-05-07

申请号：US09657980

申请日：2000-09-08

申请人： Tetsuya Ozawa ,  Kazuhiko Omote ,  Jimpei Harada

发明人： Tetsuya Ozawa ,  Kazuhiko Omote ,  Jimpei Harada

IPC分类号： G01N23223

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： The present invention provides a new fluorescent X-ray analyzing method and an apparatus thereof which is capable of performing, with great precision, quantitative analysis and qualitative analysis for an atomic species generating fluorescent X-rays of not only a symmetrical energy spectrum but also an asymmetrical energy spectrum, wherein fluorescent X-rays generated from a sample by irradiation of X-rays or particle beams are measured as an energy spectrum, and profile fitting to the measured energy spectrum is performed by using an asymmetrical profile function which can express a symmetrical and an asymmetrical energy spectrum in accordance with an asymmetrical factor.

摘要翻译： 本发明提供了一种新的荧光X射线分析方法及其装置，其能够以非常精确的方式对产生不对称能谱的荧光X射线的原子物质进行定量分析和定性分析， 不对称能谱，其中通过X射线或粒子束的照射从样品产生的荧光X射线被测量为能谱，并且通过使用可以表示对称的非对称轮廓函数来执行对测量的能谱的拟合曲线 以及根据不对称因素的不对称能谱。

公开(公告)号：US08699663B2

公开(公告)日：2014-04-15

申请号：US13233739

申请日：2011-09-15

申请人： Kazuhiko Omote ,  Makoto Kambe ,  Yoshihiro Takeda

发明人： Kazuhiko Omote ,  Makoto Kambe ,  Yoshihiro Takeda

IPC分类号： G01N23/20

CPC分类号： G03B42/02 ,  A61B6/4035 ,  A61B6/484 ,  A61B6/588 ,  A61B6/589

摘要： There is provided an X-ray image photographing method and an X-ray image photographing apparatus capable of photographing a high resolution phase contrast image and a high resolution absorption contrast image in a short time according to the purpose only by finely adjusting the distance between a specimen and a detector with respect to an X-ray source. The X-ray image photographing method enables photographing of a fine structure with a high space resolution while d/L is sufficiently smaller than 1, when L is a distance from an X-ray source 110 to a specimen 500 and d is a distance from the specimen 500 to a detector 130. Further, a distance between a peak position and a valley position of a phase contrast is not less than ⅓Δ and not more than 3Δ, when λ is an average wavelength of the X-ray and Δ is a resolution of the detector 130.

摘要翻译： 本发明提供了一种能够根据目的在短时间内拍摄高分辨率相位差图像和高分辨率吸收对比图像的X射线图像拍摄方法和X射线图像拍摄装置，仅通过精细地调整 样品和检测器相对于X射线源。 当L是从X射线源110到样本500的距离时，X射线图像拍摄方法能够以d / L足够小于1的方式拍摄具有高空间分辨率的精细结构，并且d是距离 样本500到检测器130.此外，相位对比度的峰值位置和谷谷位置之间的距离不小于1/3和Dgr; 并且不大于3＆Dgr;当λ是X射线和＆Dgr的平均波长时; 是检测器130的分辨率。

公开(公告)号：US07098459B2

公开(公告)日：2006-08-29

申请号：US10457464

申请日：2003-06-10

申请人： Kazuhiko Omote ,  Akito Sasaki ,  Yoshiyasu Ito

发明人： Kazuhiko Omote ,  Akito Sasaki ,  Yoshiyasu Ito

IPC分类号： G01F23/00 ,  G01N23/20 ,  G01N23/201

CPC分类号： G01N23/083 ,  G21K1/02

摘要： Disclosed herein is a sample-analyzing method, in which an incident beam slit is provided between an X-ray source and a sample, a receiving side beam slit is provided between the sample and an X-ray detector, the X-ray detector detects X-rays scattered again from the sample and coming through the receiving side beam slit when the sample is irradiated with the X-rays applied through the incident beam slit, and a value is measured from a value detected by the X-ray detector. In the method, a true value is measured from the value, by using a slit function representing an influence which the incident beam slit and receiving side beam slit impose on the detected value. The slit function is determined from an intensity distribution of the X-rays scattered again from the sample. The method obtains an accurate slit function in accordance with the structure of the optical system employed and can therefore analyze the sample with high precision.

公开(公告)号：US07039161B2

公开(公告)日：2006-05-02

申请号：US10967246

申请日：2004-10-19

申请人： Yoshiyasu Ito ,  Kazuhiko Omote

发明人： Yoshiyasu Ito ,  Kazuhiko Omote

IPC分类号： G01N23/001 ,  G01N23/20 ,  G01B15/02

CPC分类号： G01N23/201

摘要： A method and apparatus for analyzing a film structure analyze particle or pore size distribution with high accuracy and evaluate a shape of a surface or interface even in the case where the absolute amount of particles or pores in the thin film is small. The method includes fitting a simulated X-ray scattering curve obtained by simulation calculation to a measured X-ray scattering intensity curve obtained by emitting an X-ray onto a surface of a film specimen having a single layer or multi-layer structure at an angle in the vicinity of the critical angle to the surface, by varying at least one parameter characterizing a physical property of the specimen, and obtaining optimum values of parameters providing the minimum difference between the measured X-ray scattering curve and the simulated X-ray scattering curve, so as to determine the structure of the film specimen, in which plural combinations of incident angle and outgoing angle relative to the surface of the film specimen are set so that there is no correlation between the incident angle and the outgoing angle, and the simulated X-ray scattering curve is fitted to the X-ray scattering curve that is obtained by measuring X-ray intensity for the respective combinations of incident angle and outgoing angle.

摘要翻译： 用于分析胶片结构的方法和装置以高精度分析颗粒或孔径分布，并且即使在薄膜中的颗粒或孔的绝对量小的情况下也可评估表面或界面的形状。 该方法包括将通过模拟计算获得的模拟X射线散射曲线拟合到通过将X射线发射到具有单层或多层结构的膜试样的表面上获得的测量的X射线散射强度曲线 在与表面临界角附近，通过改变至少一个表征样本的物理性质的参数，并获得提供所测量的X射线散射曲线和模拟X射线散射之间的最小差的参数的最佳值 曲线，以确定膜试样的结构，其中入射角和出射角相对于膜试样的表面的多个组合被设置为使得入射角和出射角之间没有相关性，并且 模拟的X射线散射曲线拟合到通过测量入射的各个组合的X射线强度而获得的X射线散射曲线 gle和出射角度。

公开(公告)号：US07035373B2

公开(公告)日：2006-04-25

申请号：US10802139

申请日：2004-03-17

申请人： Kazuhiko Omote

发明人： Kazuhiko Omote

IPC分类号： G01N23/20

CPC分类号： G01N23/20 ,  G21K1/06

摘要： An -ray emitted from an incident optical system is incident on a sample supported by a sample support mechanism, and a diffracted X-ray is detected by a receiving optical system. The incident optical system includes an X-ray source and a multilayer-film mirror. An attitude controlling unit of the sample support mechanism switches a condition of the sample support mechanism from a state maintaining the sample to have a first attitude in which a normal line of the surface of the sample is parallel with a first axis of rotation to another state maintaining the sample to have a second attitude in which the normal line of the surface of the sample is perpendicular to the first axis of rotation. When the receiving optical system is rotated around the first axis of rotation while maintaining the sample in the first attitude, in-plane diffraction measurement is possible. On the other hand, when the receiving optical system is rotated in the same way while maintaining the sample in the second attitude, out-of-plane diffraction measurement is possible.

摘要翻译： 从入射光学系统发射的射线入射到由样品支撑机构支撑的样品上，并且由接收光学系统检测衍射的X射线。 入射光学系统包括X射线源和多层膜镜。 样品支撑机构的姿态控制单元将样品支撑机构的状态从保持样品的状态切换成具有第一姿态，其中，样品的表面的法线与第一旋转轴线平行到另一状态 将样品保持为具有样品表面的法线垂直于第一旋转轴线的第二姿态。 当接收光学系统围绕第一旋转轴线旋转同时将样品保持在第一姿态时，可以进行面内衍射测量。 另一方面，当接收光学系统以相同的方式旋转同时将样品保持在第二姿态时，可以进行面外衍射测量。