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公开(公告)号：US20050136334A1
公开(公告)日：2005-06-23
申请号：US10736779
申请日：2003-12-17
IPC分类号： G03F1/08 , G03F7/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F1/54
摘要： A device manufacturing method, is presented herein. In one embodiment, the device manufacturing method includes a mask for use with DUV having a quartz substrate and chrome absorber. The chrome absorber has a thickness of about 700 nm which causes increased TE polarization in the transmitted light and improves contrast at the substrate level.
摘要翻译： 本文提供了一种器件制造方法。 在一个实施例中，器件制造方法包括用于具有石英衬底和铬吸收体的DUV的掩模。 铬吸收体具有约700nm的厚度，这导致透射光中的TE偏振增加并且改善了衬底水平的对比度。
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2.发明申请Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby 有权辐射系统，光刻设备，器件制造方法和由此制造的器件公开(公告)号：US20050270511A1
公开(公告)日：2005-12-08
申请号：US10862819
申请日：2004-06-08
CPC分类号： G03F7/70141
摘要： A radiation system includes a radiation generator to generate a beam of radiation, a source, and an illumination system configured to receive the beam of radiation and provide a projection beam of radiation. The illumination system includes a beam measuring system configured measure at least one of position and tilt of the beam of radiation relative to the illumination system and a projecting device configured to redirect only a part of a cross section of the beam of radiation to the beam measuring system. The beam measuring system may include several position sensors, the readouts of which can be used to determine incorrect alignment of the radiation source with respect to the illumination system. Diaphragms are connected to the collector of the radiation generator, so that in addition to X, Y, and Z corrections, Rx, Ry and Rz corrections are possible.
摘要翻译： 辐射系统包括用于产生辐射束的辐射发生器，源和被配置为接收辐射束并提供投射辐射束的照明系统。 所述照明系统包括：束测量系统，被配置为测量所述辐射束相对于所述照明系统的位置和倾斜中的至少一个;以及投影装置，其被配置为仅将所述辐射束的横截面的一部分重定向到所述光束测量 系统。 光束测量系统可以包括几个位置传感器，其读出可用于确定辐射源相对于照明系统的不正确对准。 隔膜连接到辐射发生器的收集器，因此除了X，Y和Z校正之外，Rx，Ry和Rz校正是可能的。
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3.发明申请Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence 有权用于执行基于模型的光学邻近校正因子分解邻居影响的装置，方法和计算机程序产品公开(公告)号：US20060250589A1
公开(公告)日：2006-11-09
申请号：US11122220
申请日：2005-05-05
IPC分类号： G03B27/68
CPC分类号： G03F1/36
摘要： Model Based Optical Proximity Correction (MOPC) biasing techniques may be utilized for optimizing a mask pattern. However, conventional MOPC techniques do not account for influence from neighboring features on a mask. This influence may be factored in the following manner—first, generating a predicted pattern from a target pattern and selecting a plurality of evaluation points at which biasing may be determined. Next, a set of multivariable equations are generated for each evaluation point, each equation representing influence of neighboring features on a mask. The equations are solved to determine that amount of bias at each evaluation point, and the mask is optimized accordingly. This process may be repeated until the mask pattern is further optimized.
摘要翻译： 基于模型的光学邻近校正（MOPC）偏置技术可用于优化掩模图案。 然而，传统的MOPC技术不能解释掩模上相邻特征的影响。 这种影响可以以以下方式考虑：首先，从目标图案生成预测图案，并且选择可以确定偏置的多个评估点。 接下来，为每个评估点生成一组多变量方程，每个方程表示相邻特征对掩模的影响。 求解等式以确定每个评估点的偏差量，并相应地优化掩模。 可以重复该过程，直到掩模图案进一步优化。
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公开(公告)号：US20060092397A1
公开(公告)日：2006-05-04
申请号：US10979798
申请日：2004-11-03
IPC分类号： G03B27/54
CPC分类号： G03F7/70941 , G03F7/70558 , G03F7/70666
摘要： A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.
摘要翻译： 光刻设备包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于透射或反射投影光束中的辐射并且在其横截面中赋予投影光束图案， 用于保持基板的基板台，以及用于将图案化的光束投影到基板的目标部分上的投影系统。 提供了一种传感器，用于测量投影光束在基板处的空间强度分布。 可以根据测量的强度分布来确定图案形成装置的透射或反射率的空间分布以及入射在图案形成装置上的投影光束的分布。 通过比较具有相同图案的区域的透射率或反射率，可以确定透射率的总体（宏观）分布或图案形成装置的反射率。
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5.发明申请Optical element for use in lithography apparatus and method of conditioning radiation beam 审中-公开用于光刻设备的光学元件和调节辐射束的方法公开(公告)号：US20070058151A1
公开(公告)日：2007-03-15
申请号：US11224319
申请日：2005-09-13
申请人： Markus Franciscus Eurlings , Marinus Van Dam , Hendrikus Van Greevenbroek , Edwin Knols , Heine Mulder , Gerardus Maria Swinkels , Damian Fiolka
发明人： Markus Franciscus Eurlings , Marinus Van Dam , Hendrikus Van Greevenbroek , Edwin Knols , Heine Mulder , Gerardus Maria Swinkels , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70091 , G02B5/1819 , G02B5/1838 , G02B27/286 , G03F7/70566
摘要： An optical element for effecting a desired change in incident radiation at a plane of an illumination system of a lithographic apparatus comprises an array of cells manufactured as a single unit, each cell being arranged to redirect the incident radiation in a predetermined direction. An array of polarizing regions is also provided, each polarizing region being associated with a corresponding cell. Each cell arranged to redirect radiation in a first direction has associated with it a polarizing region ensuring that the redirected radiation has a first polarization, so that all of the radiation redirected in the first direction has the same polarization.
摘要翻译： 用于在光刻设备的照明系统的平面处实现入射辐射的期望变化的光学元件包括以单个单元制造的单元阵列，每个单元被布置成沿着预定方向重定向入射的辐射。 还提供了偏振区域的阵列，每个偏振区域与相应的单元相关联。 布置成沿第一方向重定向辐射的每个单元与其相关联的是偏振区域，确保重定向的辐射具有第一偏振，使得在第一方向上重定向的所有辐射具有相同的偏振。
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6.发明申请公开(公告)号：US20050280800A1
公开(公告)日：2005-12-22
申请号：US11101649
申请日：2005-04-08
IPC分类号： G03B27/32 , G03F1/00 , G03F1/36 , G06F17/50 , H01L21/027
CPC分类号： G03F1/36
摘要： Disclosed is a method of optimizing a design to be formed on a substrate. The method includes approximating rounding of at least one corner of an image of the design; generating a representation of the design further to the approximate rounding of the at least one corner; generating an initial representation of a mask utilized to image the design based on the representation; and performing Optical Proximity Correction (OPC) further to the initial representation of the mask.
摘要翻译： 公开了一种优化要在基板上形成的设计的方法。 该方法包括近似设计图像的至少一个角的舍入; 产生所述设计的表示进一步到所述至少一个角的近似舍入; 生成用于基于所述表示对所述设计进行成像的掩模的初始表示; 并进一步执行光学近距校正（OPC）以进行掩模的初始表示。
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公开(公告)号：US20060139599A1
公开(公告)日：2006-06-29
申请号：US11019525
申请日：2004-12-23
IPC分类号： G03B27/54
CPC分类号： G03F7/70108 , G03F7/70275
摘要： A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统; 图案形成装置，其被配置成图案化所述辐射束以形成图案化的辐射束; 以及投影系统，被配置为将图案化的辐射束投影到基板上。 光学组件包括在辐射源和图案形成装置之间二维布置的多个光学元件，以产生辐射束的预定角度分布。 为了提高辐射束的均匀性，光学元件从具有不同形状和/或尺寸的预定数量的光学元件中选择。
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8.发明申请Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems 有权用于抑制使用光刻系统打印的特征的波纹的装置，方法和程序产品公开(公告)号：US20060010417A1
公开(公告)日：2006-01-12
申请号：US11092983
申请日：2005-03-30
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： A method for minimizing rippling of features when imaged on a surface of a substrate using a mask. The method includes the steps of determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design; determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and modifying the design at each section by the amount determined in the previous step.
摘要翻译： 一种当使用掩模在衬底的表面上成像时最小化特征波纹的方法。 该方法包括以下步骤：在设计的多个部分的每个部分的多个评估点中的每一个处确定设计的第一表示和设计的图像的第二表示之间的偏差; 基于所述多个评价点的评价来确定每个部分处的所述设计的修改量; 并在每个部分修改设计在上一步确定的量。
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公开(公告)号：US20050270513A1
公开(公告)日：2005-12-08
申请号：US11139990
申请日：2005-05-31
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/702
摘要： A lithographic apparatus includes an illumination system including a field faceted mirror including a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil facets of a pupil faceted mirror. Each of the field facets is configured to provide an illumination slit at a level of a patterning device. The illumination slits are summed together at the level of the patterning device to illuminate the patterning device. First blades are configured to block radiation from a radiation source and each first blade is selectively actuable to cover a portion of a selectable number of field facets. The field faceted mirror further comprises partial field facets, the partial field facets being configured to produce a partial illumination slit at the level of the patterning device, and the pupil faceted mirror further includes pupil facets corresponding to the partial field facets. The partial field facets are configured to produce an illumination slit that is summed with the summed illumination slits of the field facets and/or correct for non-uniformity in the summed illumination slits of the field facets. Second blades are selectively actuable to cover a portion of a selectable number of partial field facets.
摘要翻译： 光刻设备包括照明系统，该照明系统包括包括多个场面的场分面反射镜，并且被配置为从辐射源接收辐射并且在瞳孔面镜的相应光瞳面上形成辐射源的多个图像。 每个场面被配置为在图案形成装置的水平面上提供照明狭缝。 照明狭缝在图案形成装置的水平面相加在一起，以照亮图案形成装置。 第一刀片被配置为阻挡来自辐射源的辐射，并且每个第一刀片可选择性地致动以覆盖可选择数量的场面的一部分。 场分面镜还包括部分场面，部分场面被配置为在图案形成装置的高度处产生局部照明狭缝，并且瞳孔面镜还包括对应于部分场面的光瞳面。 部分场面被配置为产生与场面的相加的照明狭缝相加的照明狭缝和/或校正场面的相加的照明狭缝中的不均匀性。 第二刀片可选择性地致动以覆盖可选数量的部分场面的一部分。
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