公开(公告)号：US20120273690A1

公开(公告)日：2012-11-01

申请号：US13458861

申请日：2012-04-27

申请人： Marco Jan Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

发明人： Marco Jan Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

IPC分类号： G21K5/04 ,  H01J3/26 ,  H01J3/14

CPC分类号： G03F7/70 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

摘要： The invention relates to a charged particle system such as a multi beam lithography system, comprising a manipulator device for manipulation of one or more charged particle beams, wherein the manipulator device comprises at least one through opening in the plane of the planar substrate for passing at least one charged particle beam there through. Each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of said through opening and in a second set of multiple second electrodes along a second part of said perimeter. An electronic control circuit is arranged for providing voltage differences the electrodes in dependence of a position of the first and second electrode along the perimeter of the through opening.

摘要翻译： 本发明涉及带电粒子系统，例如多光束光刻系统，其包括用于操纵一个或多个带电粒子束的操纵器装置，其中所述操纵器装置包括在所述平面基板的平面中的至少一个通孔，用于通过 至少一个带电粒子束通过。 每个通孔具有沿着所述通孔的周边的第一部分布置在第一组多个第一电极中的电极和沿着所述周边的第二部分的第二组多个第二电极。 电子控制电路被布置用于根据第一和第二电极沿着通孔的周边的位置来提供电极的电压差。

公开(公告)号：US08089056B2

公开(公告)日：2012-01-03

申请号：US12393049

申请日：2009-02-26

申请人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

发明人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

IPC分类号： H01J37/12 ,  H01J37/30

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

摘要： A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.

摘要翻译： 一种用于使用多个子束曝光目标的带电粒子多子束系统。 该系统包括在其中形成有多个孔的第一板，形成在每个孔的位置处的多个静电投影透镜系统，使得每个电子束通过相应的投影透镜系统。 这些孔具有足够均匀的放置和尺寸以使得能够使用公共控制电压将子束聚焦到靶的表面上。 优选地，静电投影透镜系统由公共电信号控制，以将电子束聚焦在表面上，而无需校正各个电子束的聚焦或路径。

公开(公告)号：US08258484B2

公开(公告)日：2012-09-04

申请号：US12905131

申请日：2010-10-15

申请人： Marco Jan Jaco Wieland ,  Alexander Hendrik Vincent Van Veen

发明人： Marco Jan Jaco Wieland ,  Alexander Hendrik Vincent Van Veen

IPC分类号： H01J37/147 ,  H01J37/244 ,  H01J3/26 ,  G01J1/42

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J2237/0437 ,  H01J2237/0492 ,  H01J2237/1504 ,  H01J2237/2485 ,  H01J2237/31762

摘要： The invention relates to a charged particle multi-beamlet lithography system for exposing a target using a plurality of beamlets. The system has a beam generator, a beamlet blanker, and a beamlet projector. The beam generator is configured to generate a plurality of charged particle beamlets. The beamlet blanker is configured to pattern the beamlets. The beamlet projector is configured to project the patterned beamlets onto the target surface. The system further has a deflection device. The deflection device has a plurality of memory cells. Each memory cell is provided with a storage element and is connected to a switching electrode of a deflector.

摘要翻译： 本发明涉及一种用于使用多个子束曝光靶的带电粒子多子束光刻系统。 该系统具有光束发生器，子束遮挡器和小射束投影仪。 束发生器被配置为产生多个带电粒子子束。 子束消除器被配置为对子束进行图案化。 子束投影仪被配置为将图案化的子束投影到目标表面上。 该系统还具有偏转装置。 偏转装置具有多个存储单元。 每个存储单元设置有存储元件，并连接到偏转器的开关电极。

公开(公告)号：US08242467B2

公开(公告)日：2012-08-14

申请号：US12728965

申请日：2010-03-22

申请人： Remco Jager ,  Aukje Arianne Annette Kastelijn ,  Guido de Boer ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

发明人： Remco Jager ,  Aukje Arianne Annette Kastelijn ,  Guido de Boer ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

IPC分类号： G21K5/04

CPC分类号： G03F7/70291 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31777

摘要： The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

摘要翻译： 本发明涉及一种光刻系统，其中电子图像图案被传送到用于将图像投影到目标表面的曝光工具，所述曝光工具包括用于控制曝光投影的控制单元，所述控制单元至少部分地包括在 所述曝光工具的投影空间，并且通过光信号提供控制数据，所述光信号通过使用自由空间光学互连而耦合到所述控制单元，所述自由空间光学互连包括发射到光敏部分的光敏部分的调制光束 所述控制单元，其中所述调制光束使用用于所述光束在所述光敏部分上的轴入射的孔眼耦合到所述光敏部分，所述孔或者所述反射镜的孔可选地用于通过 曝光预测

公开(公告)号：US07868300B2

公开(公告)日：2011-01-11

申请号：US11521705

申请日：2006-09-14

申请人： Pieter Kruit ,  Erwin Slot ,  Tijs Frans Teepen ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

发明人： Pieter Kruit ,  Erwin Slot ,  Tijs Frans Teepen ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

IPC分类号： H01J3/00

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/30433 ,  H01J2237/31757

摘要： Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which the charged particle beams are converted into light beams by using a converter element, using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams, electronically reading out resulting signals from said detectors after exposure thereof by said light beams, utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.

摘要翻译： 用于测量带电粒子束系统的大量带电粒子束的特性的光刻系统，传感器和方法，特别是直接写入光刻系统，其中通过使用转换器元件将带电粒子束转换成光束，使用 与所述转换器元件成一直线的一系列光敏检测器，例如二极管，CCD或CMOS器件，用于检测所述光束，用所述光束曝光之后，从所述检测器电子地读出所得到的信号，利用所述信号确定 一个或多个光束特性的值，从而使用自动电子计算器，以及电子地调整带电粒子系统，以便校正超出所有或多个所述带电粒子束的规格范围值，每一个用于一个或多个属性， 基于所述计算的属性值。

公开(公告)号：US20100171046A1

公开(公告)日：2010-07-08

申请号：US12728965

申请日：2010-03-22

申请人： Remco Jager ,  Aukje Arianne Annette Kastelijn ,  Guido de Boer ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

发明人： Remco Jager ,  Aukje Arianne Annette Kastelijn ,  Guido de Boer ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

IPC分类号： H01J37/30

CPC分类号： G03F7/70291 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31777

摘要： The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

摘要翻译： 本发明涉及一种光刻系统，其中电子图像图案被传送到用于将图像投影到目标表面的曝光工具，所述曝光工具包括用于控制曝光投影的控制单元，所述控制单元至少部分地包括在 所述曝光工具的投影空间，并且通过光信号提供控制数据，所述光信号通过使用自由空间光学互连而耦合到所述控制单元，所述自由空间光学互连包括发射到光敏部分的光敏部分的调制光束 所述控制单元，其中所述调制光束使用用于所述光束在所述光敏部分上的轴入射的孔眼耦合到所述光敏部分，所述孔或者所述反射镜的孔可选地用于通过 曝光预测

公开(公告)号：US07709815B2

公开(公告)日：2010-05-04

申请号：US11521671

申请日：2006-09-15

申请人： Remco Jager ,  Aukje Arianne Annette Kastelijn ,  Guido de Boer ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

发明人： Remco Jager ,  Aukje Arianne Annette Kastelijn ,  Guido de Boer ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

IPC分类号： G21K5/04 ,  G21K1/00

CPC分类号： G03F7/70291 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31777

摘要： The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

摘要翻译： 本发明涉及一种光刻系统，其中电子图像图案被传送到用于将图像投影到目标表面的曝光工具，所述曝光工具包括用于控制曝光投影的控制单元，所述控制单元至少部分地包括在 所述曝光工具的投影空间，并且通过光信号提供控制数据，所述光信号通过使用自由空间光学互连而耦合到所述控制单元，所述自由空间光学互连包括发射到光敏部分的光敏部分的调制光束 所述控制单元，其中所述调制光束使用用于所述光束在所述光敏部分上的轴入射的孔眼耦合到所述光敏部分，所述孔或者所述反射镜的孔可选地用于通过 曝光预测

公开(公告)号：US09105439B2

公开(公告)日：2015-08-11

申请号：US13304427

申请日：2011-11-25

申请人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

发明人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

IPC分类号： H01J37/317 ,  H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/30

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

摘要： The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

摘要翻译： 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。