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1.发明授权Lithographic apparatus, reflective member and a method of irradiating the underside of a liquid supply system 有权光刻设备，反射构件和照射液体供应系统的下侧的方法公开(公告)号：US09019466B2
公开(公告)日：2015-04-28
申请号：US11862855
申请日：2007-09-27
申请人： Martinus Hendrikus Antonius Leenders , Youri Johannes Laurentius Maria Van Dommelen , Hans Jansen , Robert Douglas Watso , Anthonius Martinus Cornelis Petrus De Jong , Jan Willem Cromwijk , Thomas Laursen
发明人： Martinus Hendrikus Antonius Leenders , Youri Johannes Laurentius Maria Van Dommelen , Hans Jansen , Robert Douglas Watso , Anthonius Martinus Cornelis Petrus De Jong , Jan Willem Cromwijk , Thomas Laursen
CPC分类号： G03F7/70925 , G03F7/2041 , G03F7/70341
摘要： A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.
摘要翻译： 一种光刻设备，其包括被配置为将通过投影系统投射的清洁光束反射到液体回收系统的下侧上的反射器。 还描述了用于照射用于清洁的液体供应系统的下侧的方法。
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公开(公告)号：US08823918B2
公开(公告)日：2014-09-02
申请号：US12428237
申请日：2009-04-22
申请人： Robert Douglas Watso , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
发明人： Robert Douglas Watso , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
摘要翻译： 公开了一种包括清洁站的光刻投影设备。 公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体的起泡。 还公开了热隔离岛的使用以及其最佳位置。
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公开(公告)号：US07916269B2
公开(公告)日：2011-03-29
申请号：US11862817
申请日：2007-09-27
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。
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公开(公告)号：US09158206B2
公开(公告)日：2015-10-13
申请号：US13032222
申请日：2011-02-22
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。
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公开(公告)号：US20090284715A1
公开(公告)日：2009-11-19
申请号：US12428237
申请日：2009-04-22
申请人： Robert Douglas Watso , Youri Johannes Laurentius Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
发明人： Robert Douglas Watso , Youri Johannes Laurentius Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Anthonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
摘要翻译： 公开了一种包括清洁站的光刻投影设备。 公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体发泡。 还公开了热隔离岛的使用以及其最佳位置。
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公开(公告)号：US20090014030A1
公开(公告)日：2009-01-15
申请号：US11822695
申请日：2007-07-09
申请人： Anthonius Martinus Cornelis Petrus De Jong , Igor Petrus Maria Bouchoms , Richard Joseph Bruls , Hans Jansen , Martinus Hendrikus Antonius Leenders , Peter Franciscus Wanten , Marcus Theodoor Wilhelmus Van Der Heijden , Jacques Cor Johan Van Der Donck , Frederik Johannes Van Den Bogaard , Jan Groenewold , Sandra Van Der Graaf , Carmen Julia Zoldesi
发明人： Anthonius Martinus Cornelis Petrus De Jong , Igor Petrus Maria Bouchoms , Richard Joseph Bruls , Hans Jansen , Martinus Hendrikus Antonius Leenders , Peter Franciscus Wanten , Marcus Theodoor Wilhelmus Van Der Heijden , Jacques Cor Johan Van Der Donck , Frederik Johannes Van Den Bogaard , Jan Groenewold , Sandra Van Der Graaf , Carmen Julia Zoldesi
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70916
摘要： A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.
摘要翻译： 公开了一种从光刻中使用的设备中除去污染物的方法。 该方法包括将基底装载到装置中，基底包括刚性支撑层和设置在刚性支撑层上的可变形层，使得基底的可变形层与待除去污染的装置的表面接触 引入可变形层与设备表面之间的相对运动，从该表面去除污染物以从表面去除污染物以便去除，并除去脱落的污染物。 还描述和要求保护本发明的其它方面。
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公开(公告)号：US20090174870A1
公开(公告)日：2009-07-09
申请号：US12289621
申请日：2008-10-30
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paul Blom , Ronald Harm Gunther Kramer , Michel van Putten , Ariel de Graaf
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paul Blom , Ronald Harm Gunther Kramer , Michel van Putten , Ariel de Graaf
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70733
摘要： A cleaning apparatus to clean a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the cleaning apparatus to clean a surface is also disclosed. The immersion lithographic apparatus may comprise a substrate table to support a substrate and a fluid confinement structure to at least partly confine immersion fluid between a projection system and a substrate table and/or substrate.
摘要翻译： 公开了一种用于清洁浸没式光刻设备的基板或部件的清洁装置。 清洁装置可以包括等离子体激光源，导管和激光束限制系统。 等离子体自由基源可以提供自由基流。 导管可以将来自等离子体源的源自由基提供到待清洁的表面。 自由基限制系统可以引导自由基清洁表面的局部化部分。 清洁装置可以包括旋转器并且可以被配置为清洁基板边缘。 还公开了包括清洁表面的清洁装置的浸没式光刻设备。 浸没式光刻设备可以包括用于支撑衬底和流体限制结构的衬底台，以至少部分地将浸没流体限制在投影系统和衬底台和/或衬底之间。
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公开(公告)号：US20110292359A1
公开(公告)日：2011-12-01
申请号：US13198479
申请日：2011-08-04
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
CPC分类号： B08B3/12 , B08B3/08 , B08B2203/0288 , G03F7/70341 , G03F7/70925
摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
摘要翻译： 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，液体供应装置，其构造成向要清洁的表面和声音换能器之间的储存器提供液体，以及液体出口，该液体出口构造成去除由液体供应装置提供的液体，所构建的清洁工具和 被布置为使得在使用中，液体在重力的影响下流入出口。
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9.发明授权Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method 有权清洁装置，光刻设备和光刻设备清洁方法公开(公告)号：US09013672B2
公开(公告)日：2015-04-21
申请号：US11819949
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用超声波通过液体清洁浸没式光刻投影设备的表面的方法。 在液体中诱导流动，期望地是径向流动。
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公开(公告)号：US07900641B2
公开(公告)日：2011-03-08
申请号：US11819959
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： B08B3/04
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
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