公开(公告)号：US07286326B2

公开(公告)日：2007-10-23

申请号：US11140557

申请日：2005-05-27

申请人： Nobuto Yasui ,  Hiroshi Inaba ,  Shinji Sasaki ,  Hiroshi Ishizaki

发明人： Nobuto Yasui ,  Hiroshi Inaba ,  Shinji Sasaki ,  Hiroshi Ishizaki

IPC分类号： G11B5/60

CPC分类号： G11B5/6005 ,  G11B5/40 ,  G11B5/56 ,  G11B5/6082

摘要： Embodiments of the invention provide an air bearing surface protection film having good corrosive resistance, electrical insulative property and mechanical wear resistance in the state of an extremely thin film. In one embodiment, an air bearing surface protection film having good corrosive resistance, electrical insulative property and mechanical wear resistance in a state of an extremely thin film is obtained by disposing a thin silicon nitride film having high density, high electric resistance, chemical stability and high adhesion with a substrate as a lowermost air bearing surface protection film and disposing a film comprising tetrahedral amorphous carbon and nitrogen as an uppermost air bearing surface protection film.

摘要翻译： 本发明的实施例提供一种在极薄膜状态下具有良好的耐腐蚀性，电绝缘性和机械耐磨性的空气轴承表面保护膜。 在一个实施方案中，通过设置具有高密度，高电阻，化学稳定性的薄氮化硅膜和具有高密度，高电阻，化学稳定性的薄氮化硅膜，获得在极薄膜状态下具有良好的耐腐蚀性，电绝缘性和机械耐磨性的空气轴承表面保护膜 作为最低空气轴承表面保护膜与基板的高粘合性，并且将包含四面体非晶碳和氮的膜设置为最上面的空气轴承表面保护膜。

公开(公告)号：US20050264938A1

公开(公告)日：2005-12-01

申请号：US11140557

申请日：2005-05-27

申请人： Nobuto Yasui ,  Hiroshi Inaba ,  Shinji Sasaki ,  Hiroshi Ishizaki

发明人： Nobuto Yasui ,  Hiroshi Inaba ,  Shinji Sasaki ,  Hiroshi Ishizaki

IPC分类号： G11B5/60 ,  G11B5/255 ,  G11B5/56 ,  G11B17/32 ,  G11B21/20 ,  G11B21/21

CPC分类号： G11B5/6005 ,  G11B5/40 ,  G11B5/56 ,  G11B5/6082

摘要： Embodiments of the invention provide an air bearing surface protection film having good corrosive resistance, electrical insulative property and mechanical wear resistance in the state of an extremely thin film. In one embodiment, an air bearing surface protection film having good corrosive resistance, electrical insulative property and mechanical wear resistance in a state of an extremely thin film is obtained by disposing a thin silicon nitride film having high density, high electric resistance, chemical stability and high adhesion with a substrate as a lowermost air bearing surface protection film and disposing a film comprising tetrahedral amorphous carbon and nitrogen as an uppermost air bearing surface protection film.

摘要翻译： 本发明的实施例提供一种在极薄膜状态下具有良好的耐腐蚀性，电绝缘性和机械耐磨性的空气轴承表面保护膜。 在一个实施方案中，通过设置具有高密度，高电阻，化学稳定性的薄氮化硅膜和具有高密度，高电阻，化学稳定性的薄氮化硅膜，获得在极薄膜状态下具有良好的耐腐蚀性，电绝缘性和机械耐磨性的空气轴承表面保护膜 作为最低空气轴承表面保护膜与基板的高粘合性，并且将包含四面体非晶碳和氮的膜设置为最上面的空气轴承表面保护膜。

公开(公告)号：US08092560B2

公开(公告)日：2012-01-10

申请号：US11594080

申请日：2006-11-08

申请人： Hiroshi Inaba ,  Hiromu Chiba ,  Xudong Yang ,  Shinji Sasaki ,  Nobuto Yasui

发明人： Hiroshi Inaba ,  Hiromu Chiba ,  Xudong Yang ,  Shinji Sasaki ,  Nobuto Yasui

IPC分类号： B24B1/00 ,  B24D11/00 ,  B05D1/12 ,  H05H1/24 ,  C23C14/00 ,  C23C14/32 ,  C25B11/00

CPC分类号： B24D18/0054 ,  B24B37/12

摘要： Since structural portions of a device made of a plurality of materials are different from one another in mechanical hardness, it is very difficult to uniformly lap the structural portions. This is attributable to generation of machining recessions due to differences in lapped amount when large fixed abrasive grains are used, and generation of lapping marks caused by that the dropped abrasive grains rotate. Accordingly, in order to cope with the disadvantage, it is essential to surely grip abrasive grains of small size to a surface of a surface plate.[Solving Means]Abrasive grains are fixedly forced into a surface of a lapping tool with mechanical pressure and then the surface of the lapping tool including the abrasive grains is subjected to plasma processing, whereby an improvement in adhesion between the abrasive grains and a surface plate and reduction in the number of loose abrasive grains, which are dropped from the surface of the lapping tool, can be achieved, so that it is possible to realize lapping, in which a surface of a device made of a plurality of materials is made very plane.

摘要翻译： 由于由多种​​材料制成的装置的结构部分在机械硬度上彼此不同，所以很难均匀地研磨结构部分。 这是由于当使用大的固定磨粒时由于研磨量的差异而产生加工凹陷，并且由于下落的磨料颗粒旋转而产生研磨痕迹。 因此，为了应对这个缺点，必须将小尺寸的磨粒牢固地夹在表面板的表面上。 [解决方案]将研磨颗粒以机械压力固定地压入研磨工具的表面，然后对包含磨粒的研磨工具的表面进行等离子体处理，由此改善磨粒与表面板之间的粘合性 并且可以实现从研磨工具的表面落下的松散的磨粒的数量的减少，从而可以实现由多种材料制成的装置的表面非常成型的研磨 飞机

公开(公告)号：US07805827B2

公开(公告)日：2010-10-05

申请号：US11486182

申请日：2006-07-12

申请人： Nobuto Yasui ,  Hiroshi Inaba ,  Shinji Sasaki ,  Kazuhito Miyata

发明人： Nobuto Yasui ,  Hiroshi Inaba ,  Shinji Sasaki ,  Kazuhito Miyata

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3169 ,  G11B5/102 ,  G11B5/3106 ,  G11B5/6005 ,  G11B21/21 ,  Y10T29/49025 ,  Y10T29/49027 ,  Y10T29/4903 ,  Y10T29/49032 ,  Y10T29/49046 ,  Y10T29/49048

摘要： In one embodiment of the present invention, a method of producing a magnetic head slider comprises the steps of forming, on the air bearing surface of the slider, an air bearing surface overcoat, removing the surface region from a hard amorphous carbon film by the irradiation with an ion beam which is tilted with respect to a normal to the air bearing surface, and forming a rail in the air bearing surface on which the air bearing surface overcoat has been formed. A high density and covering performance are obtained when the angle of irradiating the ion beam is not smaller than about 60 degrees from a normal to the air bearing surface of the magnetic head slider and when the acceleration voltage for the ion beam is not higher than about 300 V in the step of removing part of the air bearing surface overcoat.

摘要翻译： 在本发明的一个实施例中，制造磁头滑块的方法包括以下步骤：在滑块的空气轴承表面上形成空气轴承表面外涂层，通过照射从硬的无定形碳膜上除去表面区域 具有相对于空气轴承表面的法线倾斜的离子束，并且在已经形成有空气轴承表面外涂层的空气轴承表面中形成轨道。 当照射离子束的角度与磁头滑块的空气轴承表面的法线不小于约60度时，并且当离子束的加速电压不高于约10度时，可获得高密度和覆盖性能 在去除部分空气轴承表面外套的步骤中为300V。

公开(公告)号：US20070122548A1

公开(公告)日：2007-05-31

申请号：US11594080

申请日：2006-11-08

申请人： Hiroshi Inaba ,  Hiromu Chiba ,  Xudong Yang ,  Shinji Sasaki ,  Nobuto Yasui

发明人： Hiroshi Inaba ,  Hiromu Chiba ,  Xudong Yang ,  Shinji Sasaki ,  Nobuto Yasui

IPC分类号： H05H1/24 ,  B05D1/12

CPC分类号： B24D18/0054 ,  B24B37/12

摘要： Since structural portions of a device made of a plurality of materials are different from one another in mechanical hardness, it is very difficult to uniformly lap the structural portions. This is attributable to generation of machining recessions due to differences in lapped amount when large fixed abrasive grains are used, and generation of lapping marks caused by that the dropped abrasive grains rotate. Accordingly, in order to cope with the disadvantage, it is essential to surely grip abrasive grains of small size to a surface of a surface plate. [Solving Means]Abrasive grains are fixedly forced into a surface of a lapping tool with mechanical pressure and then the surface of the lapping tool including the abrasive grains is subjected to plasma processing, whereby an improvement in adhesion between the abrasive grains and a surface plate and reduction in the number of loose abrasive grains, which are dropped from the surface of the lapping tool, can be achieved, so that it is possible to realize lapping, in which a surface of a device made of a plurality of materials is made very plane.

摘要翻译： 由于由多种​​材料制成的装置的结构部分在机械硬度上彼此不同，所以很难均匀地研磨结构部分。 这是由于当使用大的固定磨粒时由于研磨量的差异而产生加工凹陷，并且由于下落的磨料颗粒旋转而产生研磨痕迹。 因此，为了应对这个缺点，必须将小尺寸的磨粒牢固地夹在表面板的表面上。 [解决方案]将研磨颗粒以机械压力固定地压入研磨工具的表面，然后对包含磨粒的研磨工具的表面进行等离子体处理，由此改善磨粒与表面板之间的粘合性 并且可以实现从研磨工具的表面落下的松散的磨粒的数量的减少，从而可以实现由多种材料制成的装置的表面非常成型的研磨 飞机

公开(公告)号：US20070014050A1

公开(公告)日：2007-01-18

申请号：US11486182

申请日：2006-07-12

申请人： Nobuto Yasui ,  Hiroshi Inaba ,  Shinji Sasaki ,  Kazuhito Miyata

发明人： Nobuto Yasui ,  Hiroshi Inaba ,  Shinji Sasaki ,  Kazuhito Miyata

IPC分类号： G11B5/60

CPC分类号： G11B5/3169 ,  G11B5/102 ,  G11B5/3106 ,  G11B5/6005 ,  G11B21/21 ,  Y10T29/49025 ,  Y10T29/49027 ,  Y10T29/4903 ,  Y10T29/49032 ,  Y10T29/49046 ,  Y10T29/49048

摘要： A magnetic head slider having an air bearing surface overcoat that has excellent corrosion resistance and wear resistance despite its very small thickness is provided. In one embodiment, a method of producing a magnetic head slider comprises the steps of forming, on the air bearing surface of the slider, an air bearing surface overcoat which is a film stack of an amorphous silicon film and a hard amorphous carbon film, removing the surface region from the hard amorphous carbon film by the irradiation with an ion beam which is tilted with respect to a normal to the air bearing surface, and forming a rail in the air bearing surface on which the air bearing surface overcoat has been formed. The amount of the diamond component in the hard amorphous carbon film must not be smaller than about 45% and, desirably, in a range of about 60% to 85%. A high density and covering performance are obtained when the angle of irradiating the ion beam is not smaller than about 60 degrees from a normal to the air bearing surface of the magnetic head slider and when the acceleration voltage for the ion beam is not higher than about 300 V in the step of removing part of the air bearing surface overcoat.

摘要翻译： 提供具有空气轴承表面外涂层的磁头滑块，其具有优异的耐腐蚀性和耐磨性，尽管其非常小的厚度。 在一个实施例中，制造磁头滑动器的方法包括以下步骤：在滑块的空气轴承表面上形成空气轴承表面外涂层，其是非晶硅膜和硬质非晶碳膜的膜叠层，去除 通过照射相对于空气轴承表面的法线倾斜的离子束，并且在已经形成有空气轴承表面外涂层的空气轴承表面中形成轨道，来自硬非晶碳膜的表面区域。 硬质无定形碳膜中的金刚石成分的含量不得小于约45％，优选为约60％〜85％的范围。 当照射离子束的角度与磁头滑块的空气轴承表面的法线不小于约60度时，并且当离子束的加速电压不高于约10度时，可获得高密度和覆盖性能 在去除部分空气轴承表面外套的步骤中为300V。

公开(公告)号：US08354034B2

公开(公告)日：2013-01-15

申请号：US12491741

申请日：2009-06-25

申请人： Nobuto Yasui ,  Shinji Sasaki ,  Kazuhito Miyata ,  Mineaki Kodama

发明人： Nobuto Yasui ,  Shinji Sasaki ,  Kazuhito Miyata ,  Mineaki Kodama

IPC分类号： B44C1/22

CPC分类号： G11B5/3163 ,  G11B5/102 ,  G11B5/3169 ,  G11B5/3173

摘要： A magnetic head suitable for high-density recording is provided at a high yield by a method that suppresses a reduction in reproducing output signal due to ion-beam irradiation. After an air-bearing surface of a read element, a magnetic-head element, or a row bar is mechanically polished, the air-bearing surface is irradiated with an ion beam, such that an orthographic projection of an ion-beam incidence direction onto the air-bearing surface forms an in-plane incidence angle of 30 degrees to 150 degrees or of 210 degrees to 330 degrees with respect to a track-width direction. Thereby, the formation of a short circuit due to ion-beam irradiation may be hindered.

摘要翻译： 通过抑制由离子束照射引起的再现输出信号的降低的方法，以高产率提供了适合于高密度记录的磁头。 在读取元件的空气轴承表面，磁头元件或行杆机械抛光之后，用离子束照射空气轴承表面，使得离子束入射方向的正投影到 空气轴承表面相对于轨道宽度方向形成30度至150度或210度至330度的面内入射角。 由此，可能妨碍由于离子束照射而形成的短路。

公开(公告)号：US20090321389A1

公开(公告)日：2009-12-31

申请号：US12491741

申请日：2009-06-25

申请人： Nobuto Yasui ,  Shinji Sasaki ,  Kazuhito Miyata ,  Mineaki Kodama

发明人： Nobuto Yasui ,  Shinji Sasaki ,  Kazuhito Miyata ,  Mineaki Kodama

IPC分类号： B44C1/22

CPC分类号： G11B5/3163 ,  G11B5/102 ,  G11B5/3169 ,  G11B5/3173

摘要： A magnetic head suitable for high-density recording is provided at a high yield by a method that suppresses a reduction in reproducing output signal due to ion-beam irradiation. After an air-bearing surface of a read element, a magnetic-head element, or a row bar is mechanically polished, the air-bearing surface is irradiated with an ion beam, such that an orthographic projection of an ion-beam incidence direction onto the air-bearing surface forms an in-plane incidence angle of 30 degrees to 150 degrees or of 210 degrees to 330 degrees with respect to a track-width direction. Thereby, the formation of a short circuit due to ion-beam irradiation may be hindered.

摘要翻译： 通过抑制由离子束照射引起的再现输出信号的降低的方法，以高产率提供了适合于高密度记录的磁头。 在读取元件的空气轴承表面，磁头元件或行杆机械抛光之后，用离子束照射空气轴承表面，使得离子束入射方向的正投影到 空气轴承表面相对于轨道宽度方向形成30度至150度或210度至330度的面内入射角。 由此，可能妨碍由于离子束照射而形成的短路。

公开(公告)号：US06875326B2

公开(公告)日：2005-04-05

申请号：US10319695

申请日：2002-12-16

申请人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

发明人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

IPC分类号： H05H1/24 ,  B01J19/08 ,  C23C14/32 ,  C23F4/00 ,  H01J37/32 ,  H01L21/203 ,  H01L21/302 ,  C23C14/00 ,  C23C16/00

CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/3266

摘要： A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation unit and a processing chamber connected to the other end of the row unit and having a stage for holding a substrate to be processed. A shutter is provided for covering the plasma during a period of a predetermined time after start of arc discharge or during a period of predetermined time before end of arc discharge. The shutter is disposed between the first magnetic field duct and the substrate to be processed, and is movable. The shutter is capable of being supplied with a voltage, and is kept in a state so as to be electrically insulated from the processing chamber.

摘要翻译： 等离子体处理装置包括：通过使用阴极电弧放电来产生等离子体的等离子体生成单元，排列成一行的第一和第二磁场导管，用于输送等离子体，该等离子体的一端与等离子体产生单元连接;处理室 连接到行单元的另一端并且具有用于保持要处理的基板的台。 在电弧放电开始之后的预定时间期间或在电弧放电结束之前的预定时间段期间，提供用于覆盖等离子体的快门。 快门设置在第一磁场通道和待处理基板之间，并且是可移动的。 快门能够被提供电压，并且保持在与处理室电绝缘的状态。

公开(公告)号：US06638403B1

公开(公告)日：2003-10-28

申请号：US09644072

申请日：2000-08-23

申请人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

发明人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

IPC分类号： C23C1400

CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/3266

摘要： In the plasma processing device which utilizes a low pressure arc discharge, a method for efficiently capturing and removing electrically charged particles and neutral particles having no charge which are at most 5 &mgr;m in particle diameter is demanded. The electrically charged particles can be captured efficiently by installing an electric field filter in a transportation course of plasma. The electric field filter has a cylindrical structure which is uneven in inner wall shape. A voltage in the range of 10 to 90 V is applied to the electric field filter. The neutral filters can be captured efficiently by installing a neutral filter having an opening sectional area which is at most 40% of a sectional area of the transportation course.

摘要翻译： 在使用低压电弧放电的等离子体处理装置中，要求有效地捕获和去除带电粒子的方法和粒径不超过5μm的无电荷的中性粒子。 通过在等离子体的输送过程中安装电场滤波器可以有效地捕获带电粒子。 电场滤波器具有内壁形状不均匀的圆筒状结构。 对电场滤波器施加10〜90V范围的电压。 可以通过安装具有开口截面积至多为运输路线横截面面积的40％的中性过滤器来有效地捕获中性过滤器。