中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

21 records (took 0.013 seconds)

    Adaptable X-ray analysis apparatus
    1.
    发明授权
    Adaptable X-ray analysis apparatus 有权

    公开(公告)号：US12031925B2

    公开(公告)日：2024-07-09

    申请号：US17899096

    申请日：2022-08-30

    Applicant: Malvern Panalytical B.V.

    Inventor： Detlef Beckers ,  Alexander Kharchenko ,  Milen Gateshki

    IPC: G01N23/20008 ,  G01N23/223 ,  H05G1/52 ,  A61B6/00 ,  A61B6/40 ,  A61B6/42

    CPC classification number: G01N23/20008 ,  G01N23/223 ,  A61B6/40 ,  A61B6/4208 ,  A61B6/44 ,  H05G1/52

    Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 μm. In the second X-ray analysis mode the X-ray source operates at a second operating power that is higher than the first operating power, and the area of the effective focal spot is larger than the area of the effective focal spot in the first X-ray analysis mode.

    Apparatus and method for X-ray analysis with hybrid control of beam divergence
    2.
    发明授权
    Apparatus and method for X-ray analysis with hybrid control of beam divergence 有权

    公开(公告)号：US10782252B2

    公开(公告)日：2020-09-22

    申请号：US16382606

    申请日：2019-04-12

    Applicant: Malvern Panalytical B.V.

    Inventor： Milen Gateshki ,  Detlef Beckers

    IPC: G01N23/20 ,  G01N23/20008 ,  G01N23/20016 ,  G01N23/223

    Abstract: An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit (210) between an X-ray source (4) and a sample (6); and optionally a further slit (220, 220a). A controller (17) is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit (210) limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit (220) does not limit the divergence of the incident beam. At the third width: the adjustable slit (210) does not limit the divergence of the incident beam, and the further slit (220) limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit (210) continues to limit the area irradiated.

    Microdiffraction
    4.
    发明授权
    Microdiffraction 有权
    微型衍射

    公开(公告)号：US09110003B2

    公开(公告)日：2015-08-18

    申请号：US13780216

    申请日：2013-02-28

    Applicant: PANalytical B.V.

    Inventor： Detlef Beckers ,  Milen Gateshki

    IPC: G01N23/207

    CPC classification number: G01N23/207 ,  G01N2223/313

    Abstract: A method of X-ray diffraction illuminates a beam (4) of X-rays along an illuminated strip (16) on a surface (14) of a sample (10). The X-rays are diffracted by the sample (10) and pass through a mask (20) having a slit extending essentially perpendicularly to the strip (16). The X-rays are detected by a two-dimensional X-ray detector to measure the diffracted X-rays at different positions along the strip (16).

    Abstract translation: X射线衍射的方法沿着样品（10）的表面（14）上的照明条（16）照射X射线束（4）。 X射线被样品（10）衍射并通过具有基本上垂直于条带（16）延伸的狭缝的掩模（20）。 通过二维X射线检测器检测X射线，以测量沿着条带（16）的不同位置的衍射X射线。

    MICRODIFFRACTION
    5.
    发明申请
    MICRODIFFRACTION 有权

    公开(公告)号：US20130243159A1

    公开(公告)日：2013-09-19

    申请号：US13780216

    申请日：2013-02-28

    Applicant: PANALYTICAL B.V.

    Inventor： Detlef Beckers ,  Milen Gateshki

    IPC: G01N23/207

    CPC classification number: G01N23/207 ,  G01N2223/313

    Abstract: A method of X-ray diffraction illuminates a beam (4) of X-rays along an illuminated strip (16) on a surface (14) of a sample (10). The X-rays are diffracted by the sample (10) and pass through a mask (20) having a slit extending essentially perpendicularly to the strip (16). The X-rays are detected by a two-dimensional X-ray detector to measure the diffracted X-rays at different positions along the strip (16).

    Abstract translation: X射线衍射的方法沿着样品（10）的表面（14）上的照明条（16）照射X射线束（4）。 X射线被样品（10）衍射并通过具有基本上垂直于条带（16）延伸的狭缝的掩模（20）。 通过二维X射线检测器检测X射线，以测量沿着条带（16）的不同位置的衍射X射线。

    X-RAY ANALYSIS APPARATUS AND METHOD
    6.
    发明公开
    X-RAY ANALYSIS APPARATUS AND METHOD 审中-公开

    公开(公告)号：US20240298400A1

    公开(公告)日：2024-09-05

    申请号：US18593530

    申请日：2024-03-01

    Applicant: Malvern Panalytical B.V.

    Inventor： Detlef Beckers ,  Alexander Kharchenko ,  Dmitriy Malyutin

    IPC: H05G1/52 ,  G01N23/20016 ,  H01J35/14 ,  H01J35/30

    CPC classification number: H05G1/52 ,  G01N23/20016 ,  H01J35/153 ,  H01J35/30 ,  G01N2223/303

    Abstract: The present invention relates to an X-ray analysis apparatus and an X-ray method for analysing a sample. The X-ray analysis apparatus includes an X-ray source comprising an anode and a cathode, and configured to irradiate an irradiated area on a target surface of the anode. The X-ray analysis apparatus further includes a steering arrangement, a processor and a controller. The steering arrangement is configured to position the irradiated area on the target surface of the anode. The processor is configured to receive X-ray analysis information, and to determine a change in position of the irradiated area on the target surface based on the X-ray analysis information. The controller is configured to control the steering arrangement to move the irradiated area on the target surface according to the change in position determined by the processor.

    X-ray analysis apparatus and method
    7.
    发明授权
    X-ray analysis apparatus and method 有权

    公开(公告)号：US11035805B2

    公开(公告)日：2021-06-15

    申请号：US16382562

    申请日：2019-04-12

    Applicant: Malvern Panalytical B.V.

    Inventor： Detlef Beckers ,  Milen Gateshki ,  Jaap Boksem

    IPC: G01N23/20008 ,  G01N23/201 ,  G01N23/207 ,  G01N23/2055 ,  G01N23/20

    Abstract: An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.

Patent Agency Ranking