公开(公告)号：US20190119526A1

公开(公告)日：2019-04-25

申请号：US16093061

申请日：2017-09-22

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Haruka NISHIKAWA ,  Toshiyuki IEDA ,  Atsushi NAGAI ,  Kazuya SHIMADA

IPC: C09G1/04 ,  C03C15/00

Abstract: An occurrence of a dimple during glass polishing is suppressed by scraping a fine scratch that will become the dimple to be grown in a pre-polishing, followed by main polishing. However, at a mark of the dimple in which the growth thereof is suppressed in the pre-polishing, fine roughening of a surface is generated. Further, a polishing liquid containing hydrofluoric acid, an alkali metal, water, and a surfactant that is a sulfonic acid-type or sulfate-type surfactant can suppress excess crystal growth of a deposit formed in a fine scratch in pre-polishing and suppress roughening of a surface after polishing.

公开(公告)号：US20230156924A1

公开(公告)日：2023-05-18

申请号：US17914961

申请日：2020-12-24

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Kazuya SHIMADA ,  Masahito HAYAMIZU ,  Toshihiko SAKATA ,  Makoto CHAKUNO

IPC: H05K3/02 ,  H05K3/42 ,  C23C28/00

CPC classification number: H05K3/022 ,  H05K3/422 ,  H05K3/426 ,  H05K3/427 ,  C23C28/322 ,  H05K2203/0716 ,  H05K2203/072 ,  H05K2203/0723

Abstract: A method for forming a metal film includes forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, removing fluorine in the oxide layer, supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid.

公开(公告)号：US20180362897A1

公开(公告)日：2018-12-20

申请号：US15781421

申请日：2015-06-16

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Haruka NISHIKAWA ,  Toshiyuki IEDA ,  Kazuya SHIMADA

IPC: C11D7/10 ,  B08B9/08 ,  B08B9/027 ,  B08B3/08 ,  C11D17/08

Abstract: When an alkali-free glass is polished with a polishing liquid containing hydrofluoric acid as a main component, a sludge is generated on a glass surface and in a storage unit and a pipe of a polishing device. As a result, there arise problems such as deterioration of quality and stopping of the device. A washing liquid that dissolves a sludge containing aluminum and fluorine produced in a glass polishing device is characterized by containing Al3+ ions, and a sludge formed by bonding a divalent element such as Mg, Ca, Sr, and Ba with Al and F can be dissolved with this washing liquid. The problems are solved by washing the inside of the polishing device with this washing liquid.

公开(公告)号：US20250161928A1

公开(公告)日：2025-05-22

申请号：US18873950

申请日：2023-12-27

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Masahito HAYAMIZU ,  Kazuya SHIMADA ,  Asuka HIROOKA ,  Toshihiko SAKATA

IPC: B01J37/02 ,  B01J23/14 ,  B01J23/62 ,  C23C18/16 ,  C23C18/18 ,  C23C18/42

Abstract: A method for forming a tin oxide multilayer film with a catalyst layer, the method including preparing a concentrated liquid in which a tin compound is dissolved in a polar solvent; diluting the concentrated liquid with the polar solvent and a fluoride solution to prepare a reaction liquid that is a stable divalent tin solution; immersing a substance to be treated in the reaction liquid to form a tin oxide layer on a surface of the substance to be treated; and immersing the substance to be treated having the tin oxide layer formed on the surface in a catalyst solution containing catalyst metal ions to form a catalyst layer on the tin oxide layer.

公开(公告)号：US20230389189A1

公开(公告)日：2023-11-30

申请号：US18205318

申请日：2023-06-02

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Kazuya SHIMADA ,  Masahito HAYAMIZU ,  Toshihiko SAKATA ,  Makoto CHAKUNO

IPC: H05K3/02 ,  C23C28/00 ,  H05K3/42

CPC classification number: H05K3/022 ,  C23C28/322 ,  H05K3/422 ,  H05K3/426 ,  H05K3/427 ,  H05K2203/0716 ,  H05K2203/072 ,  H05K2203/0723

Abstract: Method for forming a metal film includes forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, removing fluorine in the oxide layer, supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid.