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    METHOD AND DEVICE FOR COATING A POLYMER FILM WITH AN OXIDE LAYER
    1.
    发明申请
    METHOD AND DEVICE FOR COATING A POLYMER FILM WITH AN OXIDE LAYER 有权
    用于涂覆聚合物膜与氧化物层的方法和装置

    公开(公告)号：US20090199964A1

    公开(公告)日：2009-08-13

    申请号：US12092363

    申请日：2006-11-02

    申请人： Pierre Fayet ,  Torsten Olofsson ,  Hans-Jurgen Tiller ,  Thomas Richter

    发明人： Pierre Fayet ,  Torsten Olofsson ,  Hans-Jurgen Tiller ,  Thomas Richter

    IPC分类号： B05D3/08 ,  B05C9/02

    CPC分类号： C23C16/453 ,  C23C16/401 ,  C23C16/54

    摘要： A web of a polymer film (1) is coated with an oxide layer, in particular with an SiOx barrier layer, by transporting the web with the aid of a rotatable drum (12) through a plurality of flame bands, which are directed in a radial direction from above against the circumferential surface of the drum, which extend at a distance from each other across the width of the web being supported and transported on this circumferential surface, and which are fed with a gas mixture including a combustible gas, an oxidant, and a silicon containing compound. Therein the circumferential surface of the rotatable drum is cooled to a predetermined temperature and the web is transported through the area of the tip of the inner flame region. Polymer films with barrier layers produced in the named way have at small layer thicknesses of less than 10 nm very good barrier properties.

    摘要翻译： 聚合物膜（1）的网由氧化物层，特别是用SiO x阻挡层涂覆，借助可旋转的鼓（12）通过多个火焰带传送网 径向方向从滚筒的圆周表面延伸，该圆周表面在该圆周表面上被支撑和输送的幅材的宽度上彼此间隔一定距离，并且被馈送有包括可燃气体，氧化剂 ，和含硅化合物。 其中，可旋转滚筒的圆周表面被冷却到预定温度，并且幅材被输送通过内火焰区域的尖端区域。 具有以指定方式制造的阻挡层的聚合物膜具有小于10nm的小层厚度非常好的阻隔性能。

    Method and device for coating a polymer film with an oxide layer
    2.
    发明授权
    Method and device for coating a polymer film with an oxide layer 有权
    用氧化物层涂覆聚合物膜的方法和装置

    公开(公告)号：US08486488B2

    公开(公告)日：2013-07-16

    申请号：US12092363

    申请日：2006-11-02

    申请人： Pierre Fayet ,  Torsten Olofsson ,  Hans-Jurgen Tiller ,  Thomas Richter

    发明人： Pierre Fayet ,  Torsten Olofsson ,  Hans-Jurgen Tiller ,  Thomas Richter

    IPC分类号： C23C16/00

    CPC分类号： C23C16/453 ,  C23C16/401 ,  C23C16/54

    摘要： A web of a polymer film (1) is coated with an oxide layer, in particular with an SiOx barrier layer, by transporting the web with the aid of a rotatable drum (12) through a plurality of flame bands, which are directed in a radial direction from above against the circumferential surface of the drum, which extend at a distance from each other across the width of the web being supported and transported on this circumferential surface, and which are fed with a gas mixture including a combustible gas, an oxidant, and a silicon containing compound. Therein the circumferential surface of the rotatable drum is cooled to a predetermined temperature and the web is transported through the area of the tip of the inner flame region. Polymer films with barrier layers produced in the named way have at small layer thicknesses of less than 10 nm very good barrier properties.

    摘要翻译： 聚合物膜（1）的网由氧化物层，特别是用SiO x阻挡层涂覆，借助可旋转的鼓（12）通过多个火焰带传送网 径向方向从滚筒的圆周表面延伸，该圆周表面在该圆周表面上被支撑和输送的幅材的宽度上彼此间隔一定距离，并且被馈送有包括可燃气体，氧化剂 ，和含硅化合物。 其中，可旋转滚筒的圆周表面被冷却到预定温度，并且幅材被输送通过内火焰区域的尖端区域。 具有以指定方式制造的阻挡层的聚合物膜具有小于10nm的小层厚度非常好的阻隔性能。

    GAS BURNER
    3.
    发明申请
    GAS BURNER 有权
    煤气灶

    公开(公告)号：US20110244411A1

    公开(公告)日：2011-10-06

    申请号：US12864376

    申请日：2009-01-20

    申请人： Gil Rochat ,  Pierre Fayet ,  Thomas Richter ,  Bernhard Zobel

    发明人： Gil Rochat ,  Pierre Fayet ,  Thomas Richter ,  Bernhard Zobel

    IPC分类号： F23D14/62

    CPC分类号： F23D14/586 ,  C23C16/453 ,  F23D14/10 ,  F23D91/02

    摘要： A gas burner, which is particularly suitable for flame treatment of substrates having large surfaces, e.g. for coating such surfaces in a combustion chemical vapor deposition (CCVD) process, includes a burner body with a gas supply connection and a nozzle plate, wherein the burner body and the nozzle plate constitute together a gas plenum and the nozzle plate constitutes a perforated wall section of the plenum. The nozzle plate includes a large number of nozzles extending from a plenum side to a flame side of the nozzle plate and it is made of a plurality of sheets which are arranged in a stack and extend substantially perpendicular or substantially parallel to the nozzle extension. The sheets include through openings, wherein the through openings of all sheets are at least partly aligned with each other, or they have a comb-like form.

    摘要翻译： 一种气体燃烧器，其特别适用于具有大表面的基底的火焰处理。 为了在燃烧化学气相沉积（CCVD）工艺中涂覆这些表面，包括具有气体供应连接和喷嘴板的燃烧器主体，其中燃烧器主体和喷嘴板一起构成气体压力室，并且喷嘴板构成穿孔壁 全会的一部分。 喷嘴板包括从喷嘴板的气室侧延伸到火焰侧的大量喷嘴，并且其由多个布置成堆叠并基本垂直或基本上平行于喷嘴延伸部延伸的片制成。 片材包括通孔，其中所有片材的通孔至少部分地彼此对准，或者它们具有梳状形式。

    Gas burner
    4.
    发明授权
    Gas burner 有权
    煤气灶

    公开(公告)号：US09004913B2

    公开(公告)日：2015-04-14

    申请号：US12864376

    申请日：2009-01-20

    申请人： Gil Rochat ,  Pierre Fayet ,  Thomas Richter ,  Bernhard Zobel

    发明人： Gil Rochat ,  Pierre Fayet ,  Thomas Richter ,  Bernhard Zobel

    IPC分类号： F23D14/62 ,  F23D14/58 ,  F23D14/10 ,  F23D99/00

    CPC分类号： F23D14/586 ,  C23C16/453 ,  F23D14/10 ,  F23D91/02

    摘要： A gas burner, which is particularly suitable for flame treatment of substrates having large surfaces, e.g. for coating such surfaces in a combustion chemical vapor deposition (CCVD) process, includes a burner body with a gas supply connection and a nozzle plate, wherein the burner body and the nozzle plate constitute together a gas plenum and the nozzle plate constitutes a perforated wall section of the plenum. The nozzle plate includes a large number of nozzles extending from a plenum side to a flame side of the nozzle plate and it is made of a plurality of sheets which are arranged in a stack and extend substantially perpendicular or substantially parallel to the nozzle extension. The sheets include through openings, wherein the through openings of all sheets are at least partly aligned with each other, or they have a comb-like form.

    摘要翻译： 一种气体燃烧器，其特别适用于具有大表面的基底的火焰处理。 为了在燃烧化学气相沉积（CCVD）工艺中涂覆这些表面，包括具有气体供应连接和喷嘴板的燃烧器主体，其中燃烧器主体和喷嘴板一起构成气体压力室，并且喷嘴板构成穿孔壁 全会的一部分。 喷嘴板包括从喷嘴板的气室侧延伸到火焰侧的大量喷嘴，并且其由多个布置成堆叠并基本垂直或基本上平行于喷嘴延伸部延伸的片制成。 片材包括通孔，其中所有片材的通孔至少部分地彼此对准，或者它们具有梳状形式。

    DEVICE FOR CARRYING OUT A PLASMA-ASSISTED PROCESS
    9.
    发明申请
    DEVICE FOR CARRYING OUT A PLASMA-ASSISTED PROCESS 有权
    执行等离子体辅助工艺的装置

    公开(公告)号：US20100116644A1

    公开(公告)日：2010-05-13

    申请号：US12691408

    申请日：2010-01-21

    申请人： Pierre Fayet ,  Bertrand Jaccoud

    发明人： Pierre Fayet ,  Bertrand Jaccoud

    IPC分类号： C23C14/35

    CPC分类号： H01J37/32009 ,  C23C16/509 ,  H01J37/3266

    摘要： A device for carrying out a plasma enhanced process includes, within a vacuum chamber, at least one magnetron electrode (32) constituting an unbalanced magnetron having a flat magnetron face (20) with peripheral and central magnetic poles of opposite polarities connected to a source (34) of alternating voltage. The device further includes a device for positioning a substrate (25), the substrate having a surface to be treated facing the magnetron face (20), and a gas supply device for supplying a process gas or process gas mixture to the space between the magnetron face (20) and the treated surface. The distance between the magnetron face (20) and the treated surface is adapted to the magnetic field created by the magnetron electrode (32) such that there is a visible plasma band running between darker tunnels formed by magnetic field lines extending between peripheral and central magnetic poles of the magnetron face (20) and the treated surface, the plasma band having a minimum width but having homogeneous brightness towards the treated surface.

    摘要翻译： 用于进行等离子体增强处理的装置包括在真空室内的构成不平衡磁控管的至少一个磁控管电极（32），所述磁控管具有平坦的磁控管面（20），其具有连接到源极的相反极性的外围和中心磁极 34）交流电压。 所述装置还包括用于定位衬底（25）的装置，所述衬底具有面对磁控管面（20）的待处理表面，以及气体供应装置，用于将处理气体或处理气体混合物供应到磁控管 面（20）和处理过的表面。 磁控管面（20）和被处理表面之间的距离适应于由磁控管电极（32）产生的磁场，使得存在可见的等离子体带，该等离子带在由周边和中心磁体之间延伸的磁场线形成的较暗的隧道之间运行 磁控管面（20）和被处理表面的极点，等离子体带具有最小宽度但具有朝向被处理表面的均匀亮度。

    DEVICE FOR CARRYING OUT A PLASMA-ASSISTED PROCESS
    10.
    发明申请
    DEVICE FOR CARRYING OUT A PLASMA-ASSISTED PROCESS 审中-公开
    执行等离子体辅助工艺的装置

    公开(公告)号：US20080060933A1

    公开(公告)日：2008-03-13

    申请号：US11934939

    申请日：2007-11-05

    申请人： Pierre Fayet ,  Bertrand Jaccoud

    发明人： Pierre Fayet ,  Bertrand Jaccoud

    IPC分类号： C23C14/35

    CPC分类号： H01J37/32009 ,  C23C16/509 ,  H01J37/3266

    摘要： A device for carrying out a plasma enhanced process includes, within a vacuum chamber, at least one magnetron electrode (32) constituting an unbalanced magnetron having a flat magnetron face (20) with peripheral and central magnetic poles of opposite polarities connected to a source (34) of alternating voltage. The device further includes a device for positioning a substrate (25), the substrate having a surface to be treated facing the magnetron face (20), and a gas supply device for supplying a process gas or process gas mixture to the space between the magnetron face (20) and the treated surface. The distance between the magnetron face (20) and the treated surface is adapted to the magnetic field created by the magnetron electrode (32) such that there is a visible plasma band running between darker tunnels formed by magnetic field lines extending between peripheral and central magnetic poles of the magnetron face (20) and the treated surface, the plasma band having a minimum width but having homogeneous brightness towards the treated surface.

    摘要翻译： 用于进行等离子体增强处理的装置包括在真空室内的构成不平衡磁控管的至少一个磁控管电极（32），所述磁控管具有平坦的磁控管面（20），其具有连接到源极的相反极性的外围和中心磁极（ 34）交流电压。 所述装置还包括用于定位衬底（25）的装置，所述衬底具有面对磁控管面（20）的待处理表面，以及气体供应装置，用于将处理气体或处理气体混合物供应到磁控管 面（20）和处理过的表面。 磁控管面（20）和被处理表面之间的距离适应于由磁控管电极（32）产生的磁场，使得存在可见的等离子体带，该等离子带在由周边和中心磁体之间延伸的磁场线形成的较暗的隧道之间运行 磁控管面（20）和被处理表面的极点，等离子体带具有最小宽度但具有朝向被处理表面的均匀亮度。