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公开(公告)号:US20230201883A1
公开(公告)日:2023-06-29
申请号:US18068869
申请日:2022-12-20
Applicant: SEMES CO., LTD.
Inventor: Yong Hyun Choi , Young Hun Lee , Yong Joon Im , Seung Hoon Oh , Tae Jong Choi , Yong Sun Ko , Sang Min Lee , Jin Woo Jung
CPC classification number: B08B3/022 , H01L21/67173 , H01L21/68707 , B08B13/00 , B25J11/0095 , F26B3/283
Abstract: Disclosed is an apparatus for treating a substrate. The apparatus for treating the substrate includes a liquid treating chamber for liquid-treating the substrate by supplying a treatment liquid to the substrate, a drying chamber for drying the substrate by supplying a process fluid to the substrate, a transfer unit for transferring the substrate between the liquid treating chamber and the drying chamber, and a rear surface cleaning unit for cleaning a rear surface of the substrate, in which the rear surface cleaning unit may clean the rear surface of the substrate while transferring the substrate from the liquid treating chamber to the drying chamber.
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公开(公告)号:US12272543B2
公开(公告)日:2025-04-08
申请号:US18068917
申请日:2022-12-20
Applicant: SEMES CO., LTD.
Inventor: Yong Hyun Choi , Young Hun Lee , Seung Hoon Oh , Mi So Park , Tae Jong Choi , Yong Sun Ko , Jin Woo Jung
Abstract: The present invention provides a method for treating a substrate. The method for treating a substrate comprises: treating the substrate with liquid; and drying the liquid-treated substrate, and the liquid treatment step includes: a first liquid supply step of supplying a first liquid to an upper surface of the rotating substrate; and a second liquid supply step of supplying a second liquid to an upper surface of the rotating substrate, and in the second liquid supply step, a rotation speed of the substrate is adjusted such that the second liquid supplied on the substrate flows from a central region of the substrate to an edge region of the substrate.
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3.
公开(公告)号:US20230212044A1
公开(公告)日:2023-07-06
申请号:US18148168
申请日:2022-12-29
Applicant: SEMES CO., LTD.
Inventor: Bok Kyu Lee , Byung Woo Sim , Yong Sun Ko , Young Seop Choi , Myung A Jeon
IPC: C02F1/78
CPC classification number: C02F1/78 , C02F2201/005 , C02F2209/001 , C02F2209/02 , C02F2209/23
Abstract: Disclosed is a method of decomposing ozone in ozone water. According to the present invention, a temperature of ozone water is increased by mixing ozone water with heated water, and the ozone in the ozone water is decomposed into oxygen by the increase in the temperature.
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