MOS technology power device with low output resistance and low capacity, and related manufacturing process
    2.
    发明申请
    MOS technology power device with low output resistance and low capacity, and related manufacturing process 审中-公开
    MOS技术功率器件具有低输出电阻和低容量,以及相关的制造工艺

    公开(公告)号:US20020123195A1

    公开(公告)日:2002-09-05

    申请号:US10006778

    申请日:2001-11-05

    CPC classification number: H01L29/7802 H01L29/0847 H01L29/66712

    Abstract: A MOS-gated power device includes a plurality of elementary functional units, each elementary functional unit including a body region of a first conductivity type formed in a semiconductor material layer of a second conductivity type having a first resistivity value. Under each body region a respective lightly doped region of the second conductivity type is provided having a second resistivity value higher than the first resistivity value.

    Abstract translation: MOS门控功率器件包括多个基本功能单元,每个基本功能单元包括形成在具有第一电阻率值的第二导电类型的半导体材料层中的第一导电类型的体区。 在每个体区下方提供具有高于第一电阻率值的第二电阻率值的第二导电类型的相应轻掺杂区。

    High voltage mos-gated power device and related manufacturing process
    3.
    发明申请
    High voltage mos-gated power device and related manufacturing process 有权
    高电压电力装置及相关制造工艺

    公开(公告)号:US20030201503A1

    公开(公告)日:2003-10-30

    申请号:US10430771

    申请日:2003-05-06

    CPC classification number: H01L29/7802 H01L29/0619 H01L29/0634 H01L29/66712

    Abstract: MOS-gated power device including a plurality of elementary functional units, each elementary functional unit including a body region of a first conductivity type formed in a semiconductor material layer of a second conductivity type. A plurality of doped regions of a first conductivity type is formed in the semiconductor material layer, each one of the doped regions being disposed under a respective body region and being separated from other doped regions by portions of the semiconductor material layer.

    Abstract translation: 包括多个基本功能单元的MOS门控功率器件,每个基本功能单元包括形成在第二导电类型的半导体材料层中的第一导电类型的体区。 在半导体材料层中形成第一导电类型的多个掺杂区域,每个掺杂区域设置在相应的主体区域下方,并且通过半导体材料层的一部分与其它掺杂区域分离。

Patent Agency Ranking