METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

    公开(公告)号:US20240145306A1

    公开(公告)日:2024-05-02

    申请号:US18236165

    申请日:2023-08-21

    Abstract: A method of manufacturing a semiconductor device is provided. The method includes: forming a first structure on a first wafer; forming a second structure on a second wafer including second chip regions and a second scribe lane region surrounding the second chip regions; separating first ones of the second chip regions in a central portion of the second wafer in a plan view by a first dicing process; bonding the first ones of the second chip regions with the first wafer; separating second ones of the second chip regions in an edge portion of the second wafer in a plan view by a second dicing process; bonding the second ones of the second chip regions with the first wafer, and separating the bonded first and second wafers by a third dicing process.

    BLOCK SELECTION CIRCUIT CONTROLLING SERIES CONNECTED PASS TRANSISTORS AND FLASH MEMORY INCLUDING THE SAME

    公开(公告)号:US20250095745A1

    公开(公告)日:2025-03-20

    申请号:US18677536

    申请日:2024-05-29

    Abstract: A flash memory includes a memory block connected to word lines, an address decoder that selects one or more of the word lines, a first pass transistor connected to the address decoder, a second pass transistor connected in series with the first pass transistor and connected to one word line among the word lines, a first driver circuit that controls a gate voltage of the first pass transistor based on a first enable signal, and a second driver circuit that controls a gate voltage of the second pass transistor based on a second enable signal. Based on the memory block being an unselected memory block during an erase operation, the first driver circuit controls the first pass transistor to be in a floating state, the second driver circuit controls a power voltage to be provided to a gate of the second pass transistor.

    SEMICONDUCTOR DEVICE INCLUDING DETECTION STRUCTURE

    公开(公告)号:US20240153830A1

    公开(公告)日:2024-05-09

    申请号:US18139707

    申请日:2023-04-26

    CPC classification number: H01L22/34 G01R31/2607 H10B80/00

    Abstract: A semiconductor device includes a semiconductor die, a detection structure, a path control circuit and a detection circuit. The semiconductor die includes a central region in which a semiconductor integrated circuit is provided and an external region surrounding the central region. The detection structure is provided in the external region. The path control circuit includes a plurality of switches that controls electrical connection of the detection structure. The detection circuit determines whether a defect is present in the semiconductor die and a location of the defect based on a difference signal. The difference signal corresponds to a difference between a forward direction test output signal and a backward direction test output signal obtained by propagating a test input signal through the detection structure in a forward direction and a backward direction, respectively, via the path control circuit.

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