公开(公告)号：US20250138424A1

公开(公告)日：2025-05-01

申请号：US18613917

申请日：2024-03-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dmitry ANDROSOV ,  Cheol KANG ,  Hana KIM ,  Sungan DO ,  Yonghoon MOON ,  Hoyoon PARK ,  Jaejun LEE

IPC: G03F7/039

Abstract: Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition: wherein a description of Formula 1 is provided in the present specification.

公开(公告)号：US20250021003A1

公开(公告)日：2025-01-16

申请号：US18537601

申请日：2023-12-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol KANG ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hoyoon PARK ,  Chanjae AHN ,  Jaejun LEE ,  Sungwon CHOI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 below, a resist composition including the same, a method of forming a pattern by using the same, and a monomer represented by Formula 10 below. In Formulae 1 and 10, L11 to L13, a11 to a13, X11, Rf, and R11 to R13 are as described in the specification.

公开(公告)号：US20240255847A1

公开(公告)日：2024-08-01

申请号：US18404865

申请日：2024-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Yoonhyun KWAK ,  Hyeran KIM ,  Beomseok KIM ,  Hoyoon PARK ,  Sunyoung LEE ,  Minyoung HA

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/0048 ,  G03F7/039

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:






For descriptions of L1, n1, R1, and A+ in Formula 1, refer to those provided herein.

公开(公告)号：US20240199540A1

公开(公告)日：2024-06-20

申请号：US18312825

申请日：2023-05-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoon PARK ,  Hana KIM ,  Kyuhyun IM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Hyeran KIM ,  Changheon LEE

IPC: C07C323/09 ,  G03F7/004 ,  G03F7/20

CPC classification number: C07C323/09 ,  G03F7/0042 ,  G03F7/2004 ,  G03F7/2059 ,  C07C2601/16

Abstract: Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the same, and a pattern forming method using the same:






wherein A11, L11, L12, a11, a12, R11 to R13, b13, n11, n12, and M+ in Formula 1 are defined as described in the specification.

公开(公告)号：US20240327338A1

公开(公告)日：2024-10-03

申请号：US18483895

申请日：2023-10-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Aram JEON ,  Hana KIM ,  Beomseok KIM ,  Hoyoon PARK ,  Kyuhyun IM ,  Jinwon JEON ,  Sungwon CHOI

IPC: C07C309/58 ,  C07C309/42 ,  G03F7/004 ,  G03F7/029 ,  G03F7/20

CPC classification number: C07C309/58 ,  C07C309/42 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/029 ,  G03F7/2004

Abstract: Provided are an organic salt represented by Formula 1, a resist composition including the same, and a method of forming a pattern by using the same:


A11+B11−  Formula 1



wherein, in Formula 1,
A11+ is represented by Formula 1A, and B11− is represented by Formula 1B,










wherein descriptions of R11 to R13, L21, L22, a21, a22, R21, R22, Rf, b22, c11 and n11 in Formulae 1A and 1B are provided herein.

公开(公告)号：US20240319595A1

公开(公告)日：2024-09-26

申请号：US18612246

申请日：2024-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoon PARK ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hyeran KIM ,  Chanjae AHN ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:




A description of Formula 1 is provided herein.

公开(公告)号：US20240317672A1

公开(公告)日：2024-09-26

申请号：US18483911

申请日：2023-10-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dmitry ANDROSOV ,  Cheol KANG ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Beomseok KIM ,  Hana KIM ,  Hoyoon PARK

IPC: C07C69/94 ,  G03F7/038 ,  G03F7/039

CPC classification number: C07C69/94 ,  G03F7/0385 ,  G03F7/039 ,  C07C2601/08 ,  C07C2603/54

Abstract: Disclosed are a polycarboxylate compound represented by Formula 1 below, a resist composition including the same, and a method of forming a pattern using the same.




In Formula 1, A11, X11, m11, n11, R13 and b13 are as described in the specification.