Semiconductor package and semiconductor device including the same
    1.
    发明授权
    Semiconductor package and semiconductor device including the same 有权
    半导体封装和包括其的半导体器件

    公开(公告)号:US08929693B2

    公开(公告)日:2015-01-06

    申请号:US13787918

    申请日:2013-03-07

    Abstract: A semiconductor package and a semiconductor device including the same. The semiconductor package includes: a package substrate; a plurality of connection elements that are disposed on the package substrate; and a semiconductor chip that includes at least one optical input/output element that transmits/receives an optical signal to/from the outside at an optical input/output angle with respect to a direction perpendicular to a bottom surface of the package substrate, and is electrically connected to the package substrate through the plurality of connection.

    Abstract translation: 一种半导体封装和包括该半导体封装的半导体器件。 半导体封装包括:封装衬底; 多个连接元件,其设置在所述封装基板上; 以及半导体芯片,其包括至少一个光输入/输出元件,所述至少一个光输入/输出元件相对于垂直于所述封装基板的底面的方向以光输入/输出角度向/从外部发送/接收光信号,并且是 通过多个连接电连接到封装衬底。

    Methods of fabricating semiconductor devices
    2.
    发明授权
    Methods of fabricating semiconductor devices 有权
    制造半导体器件的方法

    公开(公告)号:US08557664B2

    公开(公告)日:2013-10-15

    申请号:US13644166

    申请日:2012-10-03

    CPC classification number: H01L21/768

    Abstract: A method of fabricating a semiconductor device using a recess channel array is disclosed. A substrate is provided having a first region and a second region, including a first transistor in the first region including a first gate electrode partially filling a trench, and source and drain regions that are formed at both sides of the trench, and covered by a first insulating layer. A first conductive layer is formed on the substrate. A contact hole through which the drain region is exposed is formed by patterning the first conductive layer and the first insulating layer. A contact plug is formed that fills the contact hole. A bit line is formed that is electrically connected to the drain region through the contact plug, and simultaneously a second gate electrode is formed in the second region by patterning the first conductive layer.

    Abstract translation: 公开了一种使用凹槽通道阵列制造半导体器件的方法。 提供了具有第一区域和第二区域的衬底,该第一区域和第二区域包括第一区域中的第一晶体管,该第一区域包括部分地填充沟槽的第一栅电极,以及形成在沟槽两侧的源区和漏区, 第一绝缘层。 在基板上形成第一导电层。 通过图案化第一导电层和第一绝缘层来形成漏极区域露出的接触孔。 形成一个填充接触孔的接触塞。 形成通过接触插塞电连接到漏极区的位线,同时通过对第一导电层进行构图而在第二区域中形成第二栅电极。

    Semiconductor Package and Semiconductor Device Including the Same
    3.
    发明申请
    Semiconductor Package and Semiconductor Device Including the Same 有权
    半导体封装和包括其的半导体器件

    公开(公告)号:US20130330035A1

    公开(公告)日:2013-12-12

    申请号:US13787918

    申请日:2013-03-07

    Abstract: A semiconductor package and a semiconductor device including the same. The semiconductor package includes: a package substrate; a plurality of connection elements that are disposed on the package substrate; and a semiconductor chip that includes at least one optical input/output element that transmits/receives an optical signal to/from the outside at an optical input/output angle with respect to a direction perpendicular to a bottom surface of the package substrate, and is electrically connected to the package substrate through the plurality of connection

    Abstract translation: 一种半导体封装和包括该半导体封装的半导体器件。 半导体封装包括:封装衬底; 多个连接元件,其设置在所述封装基板上; 以及半导体芯片,其包括至少一个光输入/输出元件,所述至少一个光输入/输出元件相对于垂直于所述封装基板的底面的方向以光输入/输出角度向/从外部发送/接收光信号,并且是 通过多个连接电连接到封装衬底

    Methods of Fabricating Semiconductor Devices
    4.
    发明申请
    Methods of Fabricating Semiconductor Devices 有权
    制造半导体器件的方法

    公开(公告)号:US20130026564A1

    公开(公告)日:2013-01-31

    申请号:US13644166

    申请日:2012-10-03

    CPC classification number: H01L21/768

    Abstract: A method of fabricating a semiconductor device using a recess channel array is disclosed. A substrate is provided having a first region and a second region, including a first transistor in the first region including a first gate electrode partially filling a trench, and source and drain regions that are formed at both sides of the trench, and covered by a first insulating layer. A first conductive layer is formed on the substrate. A contact hole through which the drain region is exposed is formed by patterning the first conductive layer and the first insulating layer. A contact plug is formed that fills the contact hole. A bit line is formed that is electrically connected to the drain region through the contact plug, and simultaneously a second gate electrode is formed in the second region by patterning the first conductive layer.

    Abstract translation: 公开了一种使用凹槽通道阵列制造半导体器件的方法。 提供了具有第一区域和第二区域的衬底,该第一区域和第二区域包括第一区域中的第一晶体管,该第一区域包括部分地填充沟槽的第一栅电极,以及形成在沟槽两侧的源区和漏区, 第一绝缘层。 在基板上形成第一导电层。 通过图案化第一导电层和第一绝缘层来形成漏极区域露出的接触孔。 形成一个填充接触孔的接触塞。 形成通过接触插塞电连接到漏极区的位线,同时通过对第一导电层进行构图而在第二区域中形成第二栅电极。

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