Pattern defect inspection apparatus
    8.
    发明授权
    Pattern defect inspection apparatus 失效
    图案缺陷检查装置

    公开(公告)号:US4731855A

    公开(公告)日:1988-03-15

    申请号:US720730

    申请日:1985-04-08

    IPC分类号: G01N21/956 H01L21/26 G06K9/00

    CPC分类号: G01N21/956 H01L21/26

    摘要: A pattern defect inspection apparatus detects presence or absence of a defect in a pattern formed on a semiconductor wafer by scanning the pattern normally to the surface thereof by a coherent light beam of a predetermined spot size, detecting reflected diffraction lights generated thereby and processing the detected lights. It comprises an abnormal direction signal detector including photo-detectors having wide light receiving areas arranged in a plurality of spatial areas which the reflected diffraction lights from a normal pattern do not normally reach, a normal pattern detector including photo-detectors having large light receiving areas arranged in a plurality of spatial areas which the reflected diffraction lights from the normal pattern reach, and a defect discriminator for determining if the abnormal direction signals are due to a true defect or not in accordance with the signals from the abnormal direction signal detector and the normal pattern detector.

    摘要翻译: 图案缺陷检查装置通过用预定光斑尺寸的相干光束将图案通常扫描到其表面来检测在半导体晶片上形成的图案中的缺陷的存在或不存在,检测由此产生的反射衍射光并且处理检测到的 灯光 它包括异常方向信号检测器,其包括具有布置在多个空间区域中的宽光接收区域的光检测器,正常图案的反射衍射光通常不能正常到达,包括光检测器的正常图案检测器具有大的光接收面积 布置在从正常图案到达的反射衍射光的多个空间区域中,以及用于根据来自异常方向信号检测器的信号和用于确定异常方向信号是否由于真实缺陷而导致的缺陷鉴别器 正常模式检测器

    Method of inspecting the surface of an object and apparatus therefor
    9.
    发明授权
    Method of inspecting the surface of an object and apparatus therefor 失效
    检查物体表面的方法及其装置

    公开(公告)号:US4342515A

    公开(公告)日:1982-08-03

    申请号:US5924

    申请日:1979-01-23

    IPC分类号: G01B11/30 G01N21/21 G01N21/95

    摘要: This invention discloses inspection apparatus for detecting unfavorable foreign matters existent on the surface of an object such as semiconductor wafer. The apparatus includes a collimated beam generator portion which projects a collimated beam towards the object to-be-inspected from a side thereof, and a mechanism which senses light reflected from the surface of the object, through a polarizer plate. In accordance with this invention, the signal-to-noise ratio between a detection signal generated by a pattern of the foreign matter to-be-detected and a signal generated by a normal pattern of the object surface and sensed as a noise component can be enhanced.

    摘要翻译: 本发明公开了一种用于检测存在于半导体晶片等物体表面的不利异物的检查装置。 该装置包括:准直光束发生器部分,其将准直光束从其侧面朝向被检查对象投射;以及机构,其通过偏振板感测从物体的表面反射的光。 根据本发明,由待检测的异物的图案产生的检测信号与由物体表面的法线图形产生的并被感测为噪声分量的信号之间的信噪比可以是 增强。

    Surface treatment device
    10.
    发明授权
    Surface treatment device 失效
    表面处理装置

    公开(公告)号:US4282825A

    公开(公告)日:1981-08-11

    申请号:US61049

    申请日:1979-07-26

    IPC分类号: G03F7/30 B05C3/04 B05C3/10

    CPC分类号: G03F7/3021 Y10S134/902

    摘要: A surface treatment device capable of carrying out the surface treatment such as washing or etching of plate-like articles such as semiconductor wafers maintaining high degree of reliability, wherein a surface treating liquid is introduced into a ring-like or a conduit-like treating vessel. The plate-like articles to be treated are moved by a conveyor on a conveyor path having a surface in parallel with the surfaces of the plate-like articles against the stream of the treating liquid in a piece-by-piece manner, so that the surfaces of the plate-like articles are treated, whereby the surfaces of the semiconductor wafers can be desirably treated prior to manufacturing the semiconductor products.

    摘要翻译: 一种表面处理装置,其能够进行表面处理,例如洗涤或蚀刻保持高可靠性的诸如半导体晶片的板状制品,其中表面处理液体被引入环状或管状的处理容器 。 待处理的板状物品通过输送机在输送路径上移动,该传送路径的表面与板状物体的表面平行地抵靠处理液体的流逐个方式移动,因此, 对板状制品的表面进行处理,由此可以在制造半导体产品之前理想地处理半导体晶片的表面。