OPTICAL DEVICE SURFACE TREATMENT PROCESS AND SMUDGE-RESISTANT ARTICLE PRODUCED THEREBY
    1.
    发明申请
    OPTICAL DEVICE SURFACE TREATMENT PROCESS AND SMUDGE-RESISTANT ARTICLE PRODUCED THEREBY 审中-公开
    光学设备表面处理工艺和抗菌品生产

    公开(公告)号:US20130229378A1

    公开(公告)日:2013-09-05

    申请号:US13883368

    申请日:2011-11-07

    IPC分类号: G06F3/041

    摘要: A surface treatment process comprises (a) providing at least one optical device; (b) providing a curable surface treatment composition comprising (1) at least one fluorinated organosilane compound comprising (i) a monovalent segment selected from polyfluoroalkyl, polyfluoroether, polyfluoropolyether, and combinations thereof and (ii) a monovalent endgroup comprising at least one silyl moiety comprising at least one group selected from hydrolyzable groups, hydroxyl, and combinations thereof, and (2) at least one fluorinated organosilane compound comprising (i) a multivalent segment selected from polyfluoroalkane, polyfluoroether, polyfluoropolyether, and combinations thereof and (ii) at least two monovalent endgroups, each independently comprising at least one silyl moiety comprising at least one group selected from hydrolyzable groups, hydroxyl, and combinations thereof; (c) applying the curable surface treatment composition to the optical device; and (d) curing the applied, curable surface treatment composition.

    摘要翻译: 表面处理方法包括(a)提供至少一个光学装置; (b)提供可固化的表面处理组合物,其包含(1)至少一种氟化有机硅烷化合物,其包含(i)选自多氟烷基,多氟醚,多氟聚醚及其组合的单价链段和(ii)包含至少一个甲硅烷基部分的单价末端基 包括选自可水解基团,羟基及其组合中的至少一个基团,和(2)至少一种氟化有机硅烷化合物,其包含(i)选自多氟烷烃,多氟醚,多氟聚醚及其组合的多价链段和(ii)至少 两个单价端基,各自独立地包含至少一个含有至少一个选自可水解基团,羟基及其组合的基团的甲硅烷基部分; (c)将可固化表面处理组合物施加到光学装置上; 和(d)固化所施加的可固化表面处理组合物。

    Method and apparatus for providing mobile and other intermittent connectivity in a computing environment
    3.
    发明授权
    Method and apparatus for providing mobile and other intermittent connectivity in a computing environment 有权
    在计算环境中提供移动和其他间歇连接的方法和装置

    公开(公告)号:US09473925B2

    公开(公告)日:2016-10-18

    申请号:US11781318

    申请日:2007-07-23

    摘要: A seamless solution transparently addresses the characteristics of nomadic systems, and enables existing network applications to run reliably in mobile environments. A Mobility Management Server coupled to the mobile network maintains the state of each of any number of Mobile End Systems and handles the complex session management required to maintain persistent connections to the network and to other peer processes. If a Mobile End System becomes unreachable, suspends, or changes network address (e.g., due to roaming from one network interconnect to another), the Mobility Management Server maintains the connection to the associated peer task—allowing the Mobile End System to maintain a continuous connection even though it may temporarily lose contact with its network medium. An interface-based listener uses network point of attachment information supplied by a network interface to determine roaming conditions and to efficiently reestablish connection upon roaming. The Mobility Management Server can distribute lists to Mobile End Systems specifying how to contact it over disjoint networks.

    摘要翻译: 无缝解决方案透明地解决游牧系统的特点,并使现有的网络应用在移动环境中可靠运行。 耦合到移动网络的移动管理服务器维护任何数量的移动终端系统中的每一个的状态,并且处理维持与网络和其他对等进程的持续连接所需的复杂会话管理。 如果移动终端系统变得无法访问,暂停或更改网络地址(例如,由于从一个网络互连漫游到另一个网络互连),则移动性管理服务器维护与相关联的对等任务的连接,从而允许移动终端系统维持连续 连接,即使它可能暂时失去与其网络媒体的接触。 基于接口的侦听器使用由网络接口​​提供的网络连接点信息来确定漫游条件,并在漫游时有效地重新建立连接。 移动管理服务器可以将列表分发到移动终端系统,指定如何通过不相交的网络与其联系。

    Process for enhanced photoresist removal in conjunction with various
methods and chemistries
    7.
    发明授权
    Process for enhanced photoresist removal in conjunction with various methods and chemistries 失效
    结合各种方法和化学物质增强光致抗蚀剂去除的方法

    公开(公告)号:US5861064A

    公开(公告)日:1999-01-19

    申请号:US819670

    申请日:1997-03-17

    CPC分类号: H01L21/02052 H01L21/31133

    摘要: A novel method is disclosed for the removal of organic material, particularly hardened photoresist, from the surface of a substrate. Layers of organic material are removed using at least two treatment cycles, each of which includes the steps of a) applying an acid-containing composition, optionally mixed with an oxidizer, to the substrate surface, and then b) applying water to the substrate surface. The process is characterized by higher temperature spikes, shorter process times and lower chemical usage than is obtained with conventional photoresist stripping methods which do not employ repetitious treatments. The method may be practiced with spray processing equipment.

    摘要翻译: 公开了一种从衬底的表面去除有机材料,特别是硬化的光致抗蚀剂的新方法。 使用至少两个处理循环去除有机材料层,每个处理循环包括以下步骤:a)将任选与氧化剂混合的含酸组合物施加到基材表面,然后b)将水施加到基材表面 。 该方法的特征在于比不使用重复处理的常规光刻胶剥离方法获得的更高的温度峰值,更短的处理时间和更低的化学品用量。 该方法可以用喷雾处理设备来实施。