摘要:
An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
摘要:
An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
摘要:
A module for transferring a substrate includes a load port for supporting a container to receive a plurality of substrates, a substrate transfer chamber disposed between the load port and a substrate process module, a substrate transfer robot disposed in the substrate transfer chamber for transferring the substrates between the container and the substrate process module, a gas supply unit connected to the substrate transfer chamber for supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, and a contamination control unit connected to the substrate transfer chamber for circulating the purge gas supplied into the substrate transfer chamber, resupplying the circulated purge gas into the substrate transfer chamber and removing particles and airborne molecular contaminants from the purge gas being circulated. Contamination of a substrate may be prevented and a necessary amount of purge gas may be reduced.
摘要:
An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the profile of the photoresist pattern. The air shower head is interposed between a lens system of the exposure device and a wafer stage, and has a hole in the middle thereof through which exposure light can pass to a wafer supported on the stage. The air shower head includes an upper frame defining a cavity open at the bottom thereof, and a porous bottom member covering the bottom of the upper frame. The porous member is mechanically secured to bottom ends of both the inner and outer side walls of the upper frame, i.e., without the use of chemical binders, to reduce the ability of the air shower head to serve as a source of contamination.
摘要:
The present invention relates to a process of preparing syndiotactic styrenic polymers with a high conversion rate in the form of fine powder, which comprises (a) preparing styrenic polymers in a solid state by reacting a mixture consisting of styrenic monomers, a metallocene catalyst, a cocatalyst and inert organic solvent in a polymerization reactor, (b) separating a portion of the styrenic polymers from the reactor, (c) recycling the portion of the styrenic polymers in the reactor, and (d) reacting the recycled styrenic polymers with styrenic monomers. The styrenic monomers may include olefinic monomers. The monomers can be introduced to a single inlet or multiple inlets of the reactor. A single reactor or a plural number of reactors can be operated in the present invention. The plural numbers of reactors are arranged in series or in parallel. In the present invention, a self-cleaning mono- or twin-axis reactor can be employed to prevent the polymers from agglomerating on the inner wall or the axis. Alternatively, a cylindrical reactor can be employed, where the styrenic polymers are transported in a solid or powder state rotating in a certain direction at the range of Froude Number of from 0.1 to 10 and polymerization proceeds toward the exit of the reactor.
摘要:
In one aspect, a composition is provided which is capable of removing an insulation material which includes at least one of a low-k material and a passivation material. The composition of this aspect includes about 5 to about 40 percent by weight of a fluorine compound, about 0.01 to about 20 percent by weight of a first oxidizing agent, about 10 to about 50 percent by weight of a second oxidizing agent, and a remaining water.
摘要:
A communication control system and method provides communication over the Internet between a first user having a first communication device, such as IP phone or computer, and a second user having a second communication device. The communication control system provides a plurality of user selectable communication options, such as voice communication, chatting, e-mail and fax. The communication control system interfacing with the second communication device to determine whether the second communication device is available to communicate using a first communication option, such as voice communication. The communication control system checking transmission delay of the communication network to determine whether an optimum communication may be achieved using the first communication option. If the first communication option is not feasible due to the transmission anomaly, a second communication option, such as chatting is selected.
摘要:
In one aspect, a composition is provided which is capable of removing an insulation material which includes at least one of a low-k material and a passivation material. The composition of this aspect includes about 5 to about 40 percent by weight of a fluorine compound, about 0.01 to about 20 percent by weight of a first oxidizing agent, about 10 to about 50 percent by weight of a second oxidizing agent, and a remaining water.
摘要:
A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.
摘要:
A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.