Silicon nitride sintered body and process for producing the same
    1.
    发明授权
    Silicon nitride sintered body and process for producing the same 失效
    氮化硅烧结体及其制造方法

    公开(公告)号:US5275772A

    公开(公告)日:1994-01-04

    申请号:US957506

    申请日:1992-10-05

    CPC分类号: C04B35/5935 C04B35/597

    摘要: The present invention relates to a silicon nitride sintered body [wherein the composition of Si.sub.3 N.sub.4 -first aid (Y.sub.2 O.sub.3 +MgO)-second aid (at least one of Al.sub.2 O.sub.3 and AlN)] falls within a range defined by lines joining points A, B, C and D in FIG. 1, the crystal phase of the sintered body contains both .alpha.-Si.sub.3 N.sub.4 and .beta.'-sialon, and the relative density is 98% or more. This sintered body is produced by subjecting a green compact of the above-described source to primary sintering in a nitrogen gas atmosphere at 1300 to 1700.degree. C. so that the relative density reaches 96% or more, and the precipitation ratio of the .alpha.-Si.sub.3 N.sub.4 crystal phases to the .beta.'-sialon crystal phase in the sintered body is in the range of from 40:60 to 80:20; and then subjecting the primary sintered body to secondary sintering in a nitrogen gas atmosphere at 1300 to 1700.degree. C. so that the relative density reaches 98% or more. The sintered body has superior strength properties, especially at ordinary temperatures, and can be produced with a high productivity in a high yield at a low cost.

    摘要翻译: 本发明涉及一种氮化硅烧结体[其中,Si 3 N 4 - 急救(Y 2 O 3 + MgO) - 辅助剂(Al 2 O 3和AlN中的至少一种)的组成]落在由连接点A,B, C和D。 如图1所示,烧结体的结晶相含有α-Si 3 N 4和β'-Sialon,相对密度为98%以上。 该烧结体是通过使上述源的生坯在1300〜1700℃的氮气气氛中进行一次烧结而制成的,使得相对密度达到96%以上, Si3N4晶相与烧结体中的β' - 赛隆结晶相的比例范围为40:60至80:20; 然后在1300〜1700℃的氮气气氛中使一次烧结体进行二次烧结,使得相对密度达到98%以上。 该烧结体具有优异的强度特性,特别是在普通温度下,可以低成本高产率地以高生产率生产。

    Silicon nitride sintered body and process for producing the same
    3.
    发明授权
    Silicon nitride sintered body and process for producing the same 失效
    硅氮化物烧结体及其制造方法

    公开(公告)号:US5204297A

    公开(公告)日:1993-04-20

    申请号:US825989

    申请日:1992-01-27

    IPC分类号: C04B35/593 C04B35/597

    CPC分类号: C04B35/5935 C04B35/597

    摘要: The present invention relates to a silicon nitride sintered body [wherein the composition of Si.sub.3 N.sub.4 -first aid (Y.sub.2 O.sub.3 +MgO)-second aid (at least one of Al.sub.2 O.sub.3 and AlN)] falls within a range defined by lines joining points A, B, C and D in FIG. 1, the crystal phase of the sintered body contains both .alpha.-Si.sub.3 N.sub.4 and .beta.'-sialon, and the relative density is 98% or more. This sintered body is produced by subjecting a green compact of the above-described source to primary sintering in a nitrogen gas atmosphere at 1300.degree. to 1700.degree. C. so that the relative density reaches 96% or more, and the precipitation ratio of the .alpha.-Si.sub.3 N.sub.4 crystal phases to the .beta.'-sialon crystal phase in the sintered body is in the range of from 40:60 to 80:20; and then subjecting the primary sintered body to secondary sintering in a nitrogen gas atmosphere at 1300.degree. to 1700.degree. C. so that the relative density reaches 98% or more. The sintered body has superior strength properties, especially at ordinary temperatures, and can be produced with a high productivity in a high yield at a low cost.

    Silicon nitride sintered body and process for producing the same
    4.
    发明授权
    Silicon nitride sintered body and process for producing the same 失效
    硅氮化物烧结体及其制造方法

    公开(公告)号:US5173458A

    公开(公告)日:1992-12-22

    申请号:US810723

    申请日:1991-12-18

    IPC分类号: C04B35/593

    CPC分类号: C04B35/5935

    摘要: Disclosed is a silicon nitride sintered body produced by subjecting a green compact of a mixed powder composed of 1) a silicon nitride powder having a percentage .alpha. crystallization of 93% or more and a mean grain diameter of 0.7 .mu.m or less and 2) 5 to 15% by weight in total of a first sintering aid selected from among rare earth element, yttrium oxide and lanthanide oxides and a second sintering aid consisting of aluminum oxide or nitride and at least one selected from among oxides and nitrides of Mg, Ca and Li, to primary sintering in a nitrogen gas atmosphere under a pressure of 1.1 atm or less at 1500.degree. to 1700.degree. C.; and subjecting the sintered body to secondary sintering in a nitrogen gas atmosphere under a pressure of 10 atm or more at the primary sintering temperature or below, thereby giving a sintered body wherein the relative density of the sintered body is 99% or more and the precipitation ratio of an .alpha.-Si.sub.3 N.sub.4 (including .beta.'-sialon) crystal phase ranges from 1:3 to 1:8 in terms of the peak intensity ratio in X-ray diffraction.

    Adjusting shim
    5.
    发明授权
    Adjusting shim 失效
    调整垫片

    公开(公告)号:US5358797A

    公开(公告)日:1994-10-25

    申请号:US911914

    申请日:1992-07-10

    摘要: The present invention provides an improved adjusting shim used in a valve train for an internal combustion engine for an automobile. The adjusting shim produced from a base material consisting of a ceramic material containing 80 to 98 wt. % of silicon nitride and/or sialon and has a porosity of not more than 3%, a bending strength of not less than 1.0 GPa and an impact compressive elastic limit (Hugoniot elastic limit) of not less than 15 GPa, wherein the base material is provided on the surface thereof which contacts a cam with a ceramic surface layer having a composition different from that of the base material and a hardness lower than that of the base material. The adjusting shim of the present invention enables a power loss of a valve train to be minimized; the abrasion resistance thereof to be improved; and the fuel economy, the performance and durability of an internal combustion engine to be improved.

    摘要翻译: 本发明提供一种用于汽车内燃机的气门机构中使用的改进的调节垫片。 由由含有80〜98重量%的陶瓷材料构成的基材制成的调整垫片 %的氮化硅和/或赛隆,并且具有不大于3%的孔隙率,不小于1.0GPa的弯曲强度和不小于15GPa的冲击压缩弹性极限(Hugoniot弹性极限)),其中所述基材 在其表面上设置有与具有不同于基材的组成的陶瓷表面层的凸轮接触,并且硬度低于基材的硬度。 本发明的调节垫片能够使气门机构的功率损失最小化; 其耐磨性得到提高; 并且燃料经济性,内燃机的性能和耐久性得到改善。

    Silicon nitride sintered body
    6.
    发明授权
    Silicon nitride sintered body 失效
    氮化硅烧结体

    公开(公告)号:US5502011A

    公开(公告)日:1996-03-26

    申请号:US303591

    申请日:1994-09-09

    CPC分类号: C04B35/597

    摘要: A silicon nitride sintered body characterized by comprising crystal grains having a linear density of 60 to 120 per 50 .mu.m length as measured in an arbitrary two-dimensional section of the sintered body. The silicon nitride sintered body has a shock compressive elasticity limit (Hugoniot-elastic limit) of 15 GPa or more and is substantially composed of crystal phases of .alpha.-silicon nitride and .beta.'-sialon. The percentages of the .alpha.-silicon nitride and .beta.'-sialon are not more than 30% and not less than 70%, respectively. The silicon nitride sintered body is particularly excellent in mechanical strengths at room temperature as well as in productivity and cost efficiency and is useful for applications as the material of parts where a particularly high impact strength is required, such as a valve train mechanism for automobile parts.

    摘要翻译: 一种氮化硅烧结体,其特征在于包括在烧结体的任意二维截面中测得的每50μm长度的线密度为60至120的晶粒。 氮化硅烧结体具有15GPa或更高的冲击压缩弹性极限(Hugoniot弹性极限),并且基本上由α-氮化硅和β'塞隆的结晶相组成。 α硅氮化物和β' - 赛隆的百分比分别不超过30%且不小于70%。 氮化硅烧结体在室温下的机械强度以及生产​​率和成本效率方面特别优异,作为需要特别高的冲击强度的部件的材料,例如汽车部件的气门机构 。

    Ceramic adjusting shim
    8.
    发明授权
    Ceramic adjusting shim 失效
    陶瓷调节垫片

    公开(公告)号:US5372099A

    公开(公告)日:1994-12-13

    申请号:US174471

    申请日:1993-12-28

    IPC分类号: F01L1/14 F01L1/16 F01L1/20

    摘要: The preset invention provides a ceramic adjusting shim capable of minimizing the abrasion of parts contacting the adjusting shim, for example, a cam and a tappet. The ceramic adjusting shim is produced from a ceramic material and has a surface roughness of 0.05 to 0.2 .mu.m in ten-point average roughness Rz.

    摘要翻译: 本发明提供一种陶瓷调节垫片,其能够最小化与调节垫片接触的部件的磨损,例如凸轮和挺杆。 陶瓷调节垫片由陶瓷材料制成,并且在十点平均粗糙度Rz中具有0.05至0.2μm的表面粗糙度。

    Method of machining silicon nitride ceramics and silicon nitride
ceramics products
    10.
    发明授权
    Method of machining silicon nitride ceramics and silicon nitride ceramics products 失效
    氮化硅陶瓷和氮化硅陶瓷制品的加工方法

    公开(公告)号:US5297365A

    公开(公告)日:1994-03-29

    申请号:US921255

    申请日:1992-07-29

    CPC分类号: B24B19/22 B24B1/00

    摘要: An industrially feasible method of grinding silicon nitride ceramics, is disclosed and provides a sufficiently smooth surface. Namely, the surface has a maximum height-roughness Rmax of 0.1 microns or less and a ten-point mean roughness Rz of 0.05 microns. Further, with this method, surface damage can be repaired while grinding. The vertical cutting feed rate of a grinding wheel into a workpiece should be within the range of 0.005-0.1 micron for each rotation of the working surface of the wheel and change linearly or stepwise. The cutting speed of the grinding wheel in a horizontal (rotational) direction should be within the range of 25 to 75 m/sec. With this arrangement, the contact pressure and grinding heat that is generated between the workpiece and the hard abrasive grains during grinding are combined. In other words, mechanical and thermal actions are combined.

    摘要翻译: 公开了一种工业上可行的研磨氮化硅陶瓷的方法,并提供了足够光滑的表面。 即,表面的最大高度粗糙度Rmax为0.1微米以下,十点平均粗糙度Rz为0.05微米。 此外,通过该方法,可以在磨削时修复表面损伤。 砂轮进入工件的垂直切削进给速率应在车轮工作表面的每次旋转时在0.005-0.1微米的范围内,并且线性或逐步改变。 砂轮在水平(旋转)方向上的切割速度应在25至75米/秒的范围内。 通过这种布置,在磨削期间在工件和硬磨粒之间产生的接触压力和磨削热被组合。 换句话说,组合了机械和热动作。