Abstract:
In a joint structure for coupling a first component (21) to a second component (22) in a joint portion of a fluid flow passage, the second component (22) has a portion thereof inserted into the first component (21) to engage with the first component (21). The second component (22) is provided with a flange portion (26), which is disposed adjacent to a bottom surface of the first component (21) and welded or bonded to the bottom surface, so that these components (22, 21) are coupled with each other in an easy and a fluid-tight manner in a condition in which they are prevented from rotating relative to each other without using any locking pin. There is no fear that the components (22, 21) dissolve in a fluid or gaseous material passing through the fluid flow passage. The joint structure is easy in maintenance.
Abstract:
The present invention relates to a projection exposure method and an exposure apparatus for projecting a pattern on a photo-mask through a projection optical system onto a predetermined photosensitive material. The photosensitive material is a nonlinear photosensitive material in which the effective light intensity distribution is nonlinear to the intensity of incident exposure light. Further, multiple exposure is made with plural patterns having a certain lateral shift therebetween, or multiple exposure is made with shifting the position of an identical pattern, whereby multiple exposure is effected with patterns different in intensity distribution on the photosensitive material. A high-resolution pattern can be formed over the resolution limit of projection optical system by the above arrangement.
Abstract:
In a siphon tube (1) of a reservoir, even when a front end of tube (1) is in the vicinity of the bottom of the reservoir, there is no fear that slurries are sucked by tube (1) which: reaches the bottom of the reservoir to draw a liquid contained therein out of the reservoir is characterized by a liquid-inlet opening (3) directed normal to a longitudinal axis of tube (1). Tube (1) has its front end formed into: an inverted T-shape provided with opposite end openings in a laterally extending portion thereof, each of which openings forms the liquid-inlet opening (3); or, an L-shaped curved form a front end of which forms an opening directed normal to the longitudinal axis of tube (1); or, is closed with a cap so that an opening is disposed adjacent to an upper surface of the cap to serve as the liquid-inlet opening.
Abstract:
A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.
Abstract:
The present invention accomplishes an evaluation of image formation performance in which the influence of a coat is accurately reflected. According to the present invention, for the evaluation of image formation performance of an optical system obtained is a pupil transmittance distribution (a distribution of light transmittance on an exit pupil surface) of a light beam that enters an image point to be evaluated of the optical system. At least one of a rotational symmetrical component, an odd symmetrical component, and an even symmetrical component is extracted from the obtained pupil transmittance distribution as an evaluation index.
Abstract:
The object of this invention is to improve safety by preventing the leakage of liquid caused by the internal pressure of a container. A liquid path plug in which a pipe is provided in the lid section of the plug, and a gas path plug which does not have a pipe are attached to openings of the container. The engaging groove section is formed on the end surface of the liquid path cap which closes the through hole provided in the liquid path plug section of the liquid path plug. The engaging protrusion section and the engaging hole section are formed on the end surface of the gas path cap which is provided in the gas path plug section of the gas path plug and closes the through hole. The gas path cap is detached by engaging the engaging pin of the detaching fixture on the engaging hole section of the gas path cap and by turning the gas path cap. The liquid path cap is detached by engaging the engaging protrusion section of the detached gas path cap on the engaging groove section of the liquid path cap and by turning the gas path cap.
Abstract:
The present invention accomplishes an evaluation of image formation performance in which the influence of a coat is accurately reflected. According to the present invention, for the evaluation of image formation performance of an optical system obtained is a pupil transmittance distribution (a distribution of light transmittance on an exit pupil surface) of a light beam that enters an image point to be evaluated of the optical system. At least one of a rotational symmetrical component, an odd symmetrical component, and an even symmetrical component is extracted from the obtained pupil transmittance distribution as an evaluation index.
Abstract:
The present invention accomplishes an evaluation of image formation performance in which the influence of a coat is accurately reflected. According to the present invention, for the evaluation of image formation performance of an optical system obtained is a pupil transmittance distribution (a distribution of light transmittance on an exit pupil surface) of a light beam that enters an image point to be evaluated of the optical system. At least one of a rotational symmetrical component, an odd symmetrical component, and an even symmetrical component is extracted from the obtained pupil transmittance distribution as an evaluation index.
Abstract:
A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.
Abstract:
This pressure gauge comprises a mounting section connected to a joint provided partway along a pipeline, and a measurement section provided on the mounting section, and in which the upwards movement of an actuator rod causes a rotation of a needle. In the mounting section, a concave section is provided with a base which interconnects with the inside of the pipeline, and inside this concave section is provided a diaphragm with a closed base, with an outer surface comprising a bellows section formed as a concertina shape, and with a central aperture for housing the tip of the actuator rod, and the pressure of fluid within the pipeline acts upon the base of the diaphragm compressing the diaphragm. At the tip of the actuator rod housed within the housing aperture is installed a protective cap which is constructed from polytetrafluoroethylene resin or a vinyl chloride or the like with excellent chemical resistance.