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公开(公告)号:US20210183944A1
公开(公告)日:2021-06-17
申请号:US16746974
申请日:2020-01-20
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Yi-Ting Wu , Jian-Jhong Chen , Po-Chun Yang , Jhen-Siang Wu , Yung-Ching Hsieh , Bo-Chang Li , Jen-Yu Wang , Cheng-Tung Huang
Abstract: A layout pattern for magnetoresistive random access memory (MRAM) includes a first magnetic tunneling junction (MTJ) pattern on a substrate, a second MTJ pattern adjacent to the first MTJ pattern, and a third MTJ pattern between the first MTJ pattern and the second MTJ pattern. Preferably, the first MTJ pattern, the second MTJ pattern, and the third MTJ pattern constitute a staggered arrangement.
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公开(公告)号:US10978122B1
公开(公告)日:2021-04-13
申请号:US16796953
申请日:2020-02-21
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chun-Yen Tseng , Yu-Tse Kuo , Chang-Hung Chen , Shu-Ru Wang , Ya-Lan Chiou , Chun-Hsien Huang , Chih-Wei Tsai , Hsin-Chih Yu , Yi-Ting Wu , Cheng-Tung Huang , Jen-Yu Wang , Jhen-Siang Wu , Po-Chun Yang , Yung-Ching Hsieh , Jian-Jhong Chen , Bo-Chang Li
Abstract: A memory includes (n−1) non-volatile cells, (n−1) bit lines and a current driving circuit. Each of the (n−1) non-volatile cells includes a first terminal and a second terminal. An ith bit line of the (n−1) bit lines is coupled to a first terminal of an ith non-volatile cell of the (n−1) non-volatile cells. The current driving circuit includes n first transistors coupled to the (n−1) non-volatile cells.
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公开(公告)号:US11018185B1
公开(公告)日:2021-05-25
申请号:US16746974
申请日:2020-01-20
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Yi-Ting Wu , Jian-Jhong Chen , Po-Chun Yang , Jhen-Siang Wu , Yung-Ching Hsieh , Bo-Chang Li , Jen-Yu Wang , Cheng-Tung Huang
Abstract: A layout pattern for magnetoresistive random access memory (MRAM) includes a first magnetic tunneling junction (MTJ) pattern on a substrate, a second MTJ pattern adjacent to the first MTJ pattern, and a third MTJ pattern between the first MTJ pattern and the second MTJ pattern. Preferably, the first MTJ pattern, the second MTJ pattern, and the third MTJ pattern constitute a staggered arrangement.
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公开(公告)号:US10651235B1
公开(公告)日:2020-05-12
申请号:US16296225
申请日:2019-03-08
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Yi-Ting Wu , Jhen-Siang Wu , Po-Chun Yang , Yung-Ching Hsieh , Zong-Sheng Zheng , Jian-Jhong Chen , Jen-Yu Wang , Cheng-Tung Huang
Abstract: A first MRAM set includes a first transistor and a second transistor. The first transistor includes a first gate structure, a first source/drain doping region and a first common source/drain doping region. The second transistor includes a second gate structure, a second source/drain doping region and the first common source/drain doping region. A second MTJ is disposed on the second transistor. The first common source/drain doping region electrically connects to the second MTJ. A first MTJ is disposed on the first transistor. The sizes of the first MTJ and the second MTJ are different. The second MTJ connects to the first MTJ in series. A bit line electrically connects the first MTJ. A source line electrically connects to the first source/drain doping region and the second source/drain doping region.
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