中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

22 records (took 0.015 seconds)

    Chromizing over cathodic arc coating
    1.
    发明授权
    Chromizing over cathodic arc coating 有权

    公开(公告)号：US10364490B2

    公开(公告)日：2019-07-30

    申请号：US15103761

    申请日：2014-11-19

    Applicant: United Technologies Corporation

    Inventor： Frank J. Trzcinski ,  Thomas Balzano ,  Prentice M. Sinesi ,  Mark A. Livings ,  Michael N. Task

    IPC: C23C14/58 ,  C23C10/10 ,  C23C10/20 ,  C23C28/02 ,  C23C14/16 ,  C23C10/38 ,  F01D5/28 ,  C23C14/34 ,  C23C30/00 ,  C23C14/14 ,  C23C10/32 ,  B32B15/04

    Abstract: The present invention provides a Cr-rich cathodic arc coating, an article in turbine blade coated with the chromizing over cathodic arc coating, and a method to produce the coating thereof. The Cr-rich cathodic arc coating in the present invention comprises a cathodic arc coating and a diffusion coating deposited atop the cathodic arc coating to enforce hot corrosion resistance. The hardware coated with the chromizing over cathodic arc coating in the present invention is reinforced with superior-hot corrosion resistance. The present invention further provides a novel method for producing the chromizing over cathodic arc coating by re-sequencing coating deposition order. The method in the present invention is efficient and cost-reducing by eliminating some operations, e.g., DHT and peening, between the cathodic arc coating and the diffusion coating. The hot corrosion resistance in the present invention results from the high Cr content in the surface of the coating.

    Aluminum-chromium diffusion coating
    2.
    发明授权
    Aluminum-chromium diffusion coating 有权

    公开(公告)号：US11286550B2

    公开(公告)日：2022-03-29

    申请号：US15470949

    申请日：2017-03-28

    Applicant: United Technologies Corporation

    Inventor： Michael N. Task ,  Xuan Liu

    IPC: C23C10/26 ,  C23C10/54 ,  C23C10/56 ,  C23C10/52 ,  C23C10/30 ,  C23C10/60

    Abstract: A process includes applying a slurry to a surface of a metallic article to produce a slurry film on the surface. The slurry is composed of a liquid carrier, chromium and aluminum, and an agent that is reactive with the chromium and aluminum to form intermediary compounds. The article and slurry film are then thermally treated at an activation temperature at which the agent reacts with the chromium and aluminum to form the intermediary compounds. The intermediary compounds deposit the chromium and aluminum on the surface. The thermal treating also diffuses the chromium and aluminum into a sub-surface region of the article such that the sub-surface region becomes enriched with chromium and aluminum.

    HPC AND HPT DISKS COATED BY ATOMIC LAYER DEPOSITION
    3.
    发明申请
    HPC AND HPT DISKS COATED BY ATOMIC LAYER DEPOSITION 审中-公开

    公开(公告)号：US20190284693A1

    公开(公告)日：2019-09-19

    申请号：US15923419

    申请日：2018-03-16

    Applicant: United Technologies Corporation

    Inventor： Michael N. Task

    IPC: C23C16/455 ,  C23C16/40 ,  F01D5/34 ,  F01D5/28

    Abstract: A process for coating a gas turbine engine disk comprises placing the disk having an outer surface into a chamber, the chamber configured to perform atomic layer deposition; injecting a first reactant into the chamber; forming a first monolayer gas thin film on the outer surface; removing the first reactant from the chamber; injecting a second reactant into the chamber; reacting second reactant with the first monolayer gas thin film; removing the second reactant from the chamber; and forming a protective barrier coating on the outer surface.

    Systems and methods for optimal source material deposition along hole edges
    5.
    发明授权
    Systems and methods for optimal source material deposition along hole edges 有权

    公开(公告)号：US11613805B2

    公开(公告)日：2023-03-28

    申请号：US16786228

    申请日：2020-02-10

    Applicant: UNITED TECHNOLOGIES CORPORATION

    Inventor： Michael N. Task ,  Russell A. Beers

    IPC: H01J37/32 ,  C23C14/32 ,  C23C14/04 ,  F23R3/00 ,  C23C14/14

    Abstract: A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.

    HPC and HPT disks coated by atomic layer deposition
    6.
    发明授权
    HPC and HPT disks coated by atomic layer deposition 有权

    公开(公告)号：US11473197B2

    公开(公告)日：2022-10-18

    申请号：US15923419

    申请日：2018-03-16

    Applicant: United Technologies Corporation

    Inventor： Michael N. Task

    IPC: C23C16/455 ,  C23C16/40 ,  F01D5/28 ,  F01D5/34 ,  F01D25/00 ,  F01D5/02

    Abstract: A process for coating a gas turbine engine disk comprises placing the disk having an outer surface into a chamber, the chamber configured to perform atomic layer deposition; injecting a first reactant into the chamber; forming a first monolayer gas thin film on the outer surface; removing the first reactant from the chamber; injecting a second reactant into the chamber; reacting second reactant with the first monolayer gas thin film; removing the second reactant from the chamber; and forming a protective barrier coating on the outer surface.

    SYSTEMS AND METHODS FOR OPTIMAL SOURCE MATERIAL DEPOSITION ALONG HOLE EDGES
    8.
    发明申请
    SYSTEMS AND METHODS FOR OPTIMAL SOURCE MATERIAL DEPOSITION ALONG HOLE EDGES 审中-公开

    公开(公告)号：US20200181760A1

    公开(公告)日：2020-06-11

    申请号：US16786228

    申请日：2020-02-10

    Applicant: UNITED TECHNOLOGIES CORPORATION

    Inventor： Michael N. Task ,  Russell A. Beers

    IPC: C23C14/32 ,  H01J37/32 ,  C23C14/14 ,  F23R3/00 ,  C23C14/04

    Abstract: A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.

Patent Agency Ranking