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1.发明授权Stage device, an exposure apparatus and a device manufacturing method using the same 有权舞台装置，曝光装置和使用其的装置制造方法公开(公告)号：US06583859B2
公开(公告)日：2003-06-24
申请号：US09878210
申请日：2001-06-12
IPC分类号： G03B2758
CPC分类号： G03F7/70691 , G03B27/58 , G03B27/62 , G03F7/70358
摘要： A stage device includes a movable body, movable along a guide surface, for moving an element mounted on the movable body, a static pressure bearing, having at least one pad, for guiding the movable body along the guide surface, the at least one pad being attached to the movable body at a first position, and a linear motor, having a movable part and a relatively stationary part, for moving the movable body, the movable part of the linear motor being attached to the movable body at a second position. The movable body has a hollow structure at at least one of the first position and the second position. The hollow structure has an enclosure structure or a rib structure.
摘要翻译： 舞台装置包括可移动体，其可沿引导表面移动，用于移动安装在可移动体上的元件，静压力轴承，具有至少一个垫，用于沿着导向表面引导可动体，至少一个垫 在第一位置附接到可移动体，以及线性电动机，具有用于移动可移动体的可移动部分和相对静止部分，线性电动机的可动部分在第二位置附接到可移动体。 可移动体在第一位置和第二位置中的至少一个处具有中空结构。 中空结构具有外壳结构或肋结构。
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2.发明授权Stage device, an exposure apparatus and a device manufacturing method using the same 有权舞台装置，曝光装置和使用其的装置制造方法公开(公告)号：US06266133B1
公开(公告)日：2001-07-24
申请号：US09299590
申请日：1999-04-27
IPC分类号： G03B2758
CPC分类号： G03F7/70691 , G03B27/58 , G03B27/62 , G03F7/70358
摘要： A stage device includes a movable body, movable along a guide surface, for moving an element mounted on the movable body, a static pressure bearing, having at least one pad, for guiding the movable body along the guide surface, the at least one pad being attached to the movable body at a first position, and a linear motor, having a movable part and a relatively stationary part, for moving the movable body, the movable part of the linear motor being attached to the movable body at a second position. The movable body has a hollow structure at at least one of the first position and the second position. The hollow structure has an enclosure structure or a rib structure.
摘要翻译： 舞台装置包括可移动体，其可沿引导表面移动，用于移动安装在可移动体上的元件，静压力轴承，具有至少一个垫，用于沿着导向表面引导可动体，至少一个垫 在第一位置附接到可移动体，以及线性电动机，具有用于移动可移动体的可移动部分和相对静止部分，线性电动机的可动部分在第二位置附接到可移动体。 可移动体在第一位置和第二位置中的至少一个处具有中空结构。 中空结构具有外壳结构或肋结构。
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公开(公告)号：US07379162B2
公开(公告)日：2008-05-27
申请号：US11002900
申请日：2004-12-03
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/70716 , G03F7/70866
摘要： A substrate holding apparatus contacts an undersurface of a substrate and holds the substrate. At least a portion of a top surface of the substrate is to be immersed in liquid. The apparatus includes a chuck unit to attract the substrate and a preventing system to prevent the liquid from reaching the undersurface of the substrate.
摘要翻译： 基板保持装置接触基板的下表面并保持基板。 将衬底的顶表面的至少一部分浸入液体中。 该装置包括吸引基板的卡盘单元和防止液体到达基板的下表面的防止系统。
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4.发明授权公开(公告)号：US07312848B2
公开(公告)日：2007-12-25
申请号：US11378511
申请日：2006-03-17
CPC分类号： G03F7/70725 , G03F7/70875
摘要： This invention discloses an apparatus having a base and a movable body which is driven to move along the base. The apparatus includes a generator configured to generate a driving signal for the movable body, a temperature adjusting mechanism configured to adjust temperature of the base, and a controller configured to control a manipulated variable for the temperature control mechanism based on the generated driving signal.
摘要翻译： 本发明公开了一种具有基座和可移动体的装置，该移动体被驱动沿着底座移动。 该装置包括：发电机，其被配置为产生用于可移动体的驱动信号;温度调节机构，被配置为调节基座的温度;以及控制器，被配置为基于所产生的驱动信号来控制温度控制机构的操纵变量。
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公开(公告)号：US07236228B2
公开(公告)日：2007-06-26
申请号：US10880525
申请日：2004-07-01
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
CPC分类号： G03F7/70991 , F16L9/19 , G03F7/70716 , H02G11/006
摘要： An exposure apparatus includes a projection device for projecting a pattern drawn on a surface of a master, a stage apparatus which moves at least a substrate of the master and a substrate relative to the projection device, and an exposure device for repeatedly exposing the substrate to the pattern of the master. A plurality of pipes connected to movable units of the stage apparatus are joined to each other at partial outer surfaces of the pipes and constitute an integrated pipe array. Electrical cables or signal line cables connected to the movable unit pass through hollow portions of some of the pipes serving as the integrated pipe array.
摘要翻译： 曝光装置包括用于投影在主表面上绘制的图案的投影装置，相对于投影装置移动至少基板和基板的平台装置，以及用于将基板重复曝光的曝光装置 主人的模式。 连接到舞台装置的可移动单元的多个管道在管的部分外表面处彼此接合，并构成一体的管阵列。 连接到可移动单元的电缆或信号线电缆穿过用作集成管阵列的一些管道的中空部分。
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公开(公告)号：US07315347B2
公开(公告)日：2008-01-01
申请号：US11006629
申请日：2004-12-08
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
CPC分类号： G03F7/70891
摘要： An exposure apparatus includes a light source, an illumination optical system for illuminating an original with light from the light source, and a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate. In addition, a radiation member is disposed opposite to a subject of temperature adjustment which corresponds to at least one of an optical element of the illumination optical system, an optical element of the projection optical system and the original, and a control system controls a temperature of the radiation member in accordance with a state or exposure of the subject of temperature adjustment.
摘要翻译： 曝光装置包括光源，用于利用来自光源的光照射原件的照明光学系统和用于将由照明光学系统照明的原稿的图案投射到基板上的投影光学系统。 此外，辐射构件与温度调节对象相对设置，对应于照明光学系统的光学元件，投影光学系统的光学元件和原件中的至少一个，并且控制系统控制温度 的辐射构件根据温度调节对象的状态或曝光。
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公开(公告)号：US07301602B2
公开(公告)日：2007-11-27
申请号：US11094311
申请日：2005-03-31
CPC分类号： G03F7/70858 , G03B27/58 , G03F7/70716
摘要： A moving element to be propelled across a stator includes a coil unit, including coils, for generating a force to propel the moving unit, and a cooling unit for cooling the coil unit. A thermal conductive member, arranged between the cooling unit and the coil unit, transmits heat away from the coil unit. In addition, a housing unit houses the coil unit, the cooling unit and the thermal conductive member.
摘要翻译： 要跨越定子推进的移动元件包括用于产生推动移动单元的力的线圈单元，以及用于冷却线圈单元的冷却单元。 布置在冷却单元和线圈单元之间的导热构件将热量从线圈单元传递出去。 此外，壳体单元容纳线圈单元，冷却单元和导热构件。
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公开(公告)号：US07061580B2
公开(公告)日：2006-06-13
申请号：US10824989
申请日：2004-04-15
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
CPC分类号： G03F7/706 , G03F7/70258
摘要： An exposure apparatus includes a reflective element for reflecting and introducing light from a light source to a plate, at least one first driver for providing the reflective element with a force and/or a displacement in at least one directions, and at least one second driver for providing the reflective element with a force and/or a displacement in at least one directions, wherein the first and second drives are connected in series to each other.
摘要翻译： 曝光装置包括用于将光从光源反射和引入到板的反射元件，至少一个用于在至少一个方向上提供反射元件和/或位移的第一驱动器，以及至少一个第二驱动器 用于在至少一个方向上提供反射元件的力和/或位移，其中第一和第二驱动器彼此串联连接。
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9.发明申请Stage device, exposure apparatus using the unit, and device manufacturing method 有权舞台装置，使用该装置的曝光装置和装置制造方法公开(公告)号：US20060113040A1
公开(公告)日：2006-06-01
申请号：US11286780
申请日：2005-11-23
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
CPC分类号： G03F7/70733 , G03F7/70816
摘要： A stage device includes a plurality of bases positioned adjacent each other with a space therebetween, a plurality of stages movable along surfaces of the bases, and a plurality of gas bearings provided in each of the stages. The gas bearings extend in a direction in which the bases are adjacently arranged.
摘要翻译： 舞台装置包括多个彼此相邻定位的基座，其间具有空间，可沿基座的表面移动的多个台阶以及设置在每个台阶中的多个气体轴承。 气体轴承在基座相邻布置的方向上延伸。
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公开(公告)号：US20050140947A1
公开(公告)日：2005-06-30
申请号：US11006629
申请日：2004-12-08
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70891
摘要： Disclosed is an exposure apparatus which includes a light source, an illumination optical system for illuminating an original with light from the light source, a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate, a radiation member disposed to be opposed to a subject of temperature adjustment which corresponds to at least one of an optical element of the illumination optical system, an optical element of the projection optical system and the original, and a control system for controlling a temperature of the radiation member in accordance with a state of exposure of the subject of temperature adjustment.
摘要翻译： 公开了一种曝光装置，其包括光源，用于利用来自光源的光照射原稿的照明光学系统，用于将由照明光学系统照明的原稿的图案投影到基板上的投影光学系统， 辐射部件设置成与对应于照明光学系统的光学元件，投影光学系统的光学元件和原件中的至少一个的温度调节对象相对，以及用于控制投影光学系统的温度的控制系统 辐射构件根据受试者的暴露温度调节状态。
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