公开(公告)号：US07262951B2

公开(公告)日：2007-08-28

申请号：US10952259

申请日：2004-09-27

Applicant: Cliff Hou ,  Lee-Chung Lu ,  Chia-Lin Cheng

Inventor： Cliff Hou ,  Lee-Chung Lu ,  Chia-Lin Cheng

IPC: H01G4/228

CPC classification number: H01L23/5223 ,  H01L23/5286 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A de-coupling capacitor module using dummy conductive elements in an integrated circuit is disclosed. The de-coupling module comprises at least one circuit module having one or more active nodes, and at least one dummy conductive element unconnected to any active node, and separated from a high voltage conductor or a low voltage conductor by an insulation region to provide a de-coupling capacitance.

Abstract translation: 公开了一种在集成电路中使用虚设导电元件的去耦合电容器模块。 解耦模块包括具有一个或多个有源节点的至少一个电路模块和未连接到任何有源节点的至少一个虚拟导电元件，并且通过绝缘区域与高电压导体或低压导体分离，以提供 去耦合电容。

公开(公告)号：US20070181951A1

公开(公告)日：2007-08-09

申请号：US11349804

申请日：2006-02-08

Applicant: Chia-Lin Chen ,  Min-Jan Chen ,  Jau-Jey Wang

Inventor： Chia-Lin Chen ,  Min-Jan Chen ,  Jau-Jey Wang

IPC: H01L29/76 ,  H01L21/8238

CPC classification number: H01L21/823807 ,  H01L21/823814 ,  H01L21/823864 ,  H01L29/665 ,  H01L29/66636 ,  H01L29/7843 ,  H01L29/7848

Abstract: A PMOS device less affected by negative bias time instability (NBTI) and a method for forming the same are provided. The PMOS device includes a barrier layer over at least a portion of a gate structure, a gate spacer, and source/drain regions of a PMOS device. A stressed layer is then formed over the barrier layer. The barrier layer is preferably an oxide layer and is preferably not formed for NMOS devices.

Abstract translation: 提供了较少受负偏压时间不稳定性（NBTI）影响的PMOS器件及其形成方法。 PMOS器件在PMOS器件的栅极结构，栅极间隔物和源极/漏极区域的至少一部分上包括阻挡层。 然后在阻挡层上形成应力层。 阻挡层优选为氧化物层，优选不为NMOS器件形成。

公开(公告)号：US07251130B2

公开(公告)日：2007-07-31

申请号：US11162229

申请日：2005-09-01

Applicant: Chia-Lin Tsai

Inventor： Chia-Lin Tsai

IPC: H05K5/00

CPC classification number: G06F1/187 ,  G06F1/184

Abstract: A computer system with vertically offset hard disk drives has a space in one side for containing the two vertically offset hard disk drives held by a mobile rack in a vertically offset manner. The mobile rack fixes the two hard disk drives with two vertically offset screw sets. A holding frame in the space of the computer system has two vertically offset connectors that allow the two hard disk drives to be connected at the same time when the mobile rack is completely inserted into the holding frame.

Abstract translation: 具有垂直偏移硬盘驱动器的计算机系统在一侧具有用于容纳由移动机架以垂直偏移方式保持的两个垂直偏移硬盘驱动器的空间。 移动机架用两个垂直偏移螺丝组固定两个硬盘驱动器。 在计算机系统的空间中的保持框架具有两个垂直偏移连接器，其允许两个硬盘驱动器在移动机架完全插入保持框架的同时被连接。

公开(公告)号：US07232752B2

公开(公告)日：2007-06-19

申请号：US10603924

申请日：2003-06-24

Applicant: Shao-Chung Hu ,  Teng-Chun Tsai ,  Chia-Lin Hsu ,  Yung-Tsung Wei

Inventor： Shao-Chung Hu ,  Teng-Chun Tsai ,  Chia-Lin Hsu ,  Yung-Tsung Wei

IPC: H01L21/4763 ,  H01L21/302

CPC classification number: H01L21/3212 ,  H01L21/02074

Abstract: A method of removing contaminants from a silicon wafer after chemical-mechanical polishing (CMP). After a copper chemical-mechanical polishing and a subsequent barrier chemical-mechanical polishing operation, an aqueous solution of ozone in de-ionized water is applied to clean the silicon wafer so that contaminants on the wafer are removed. Alternatively, an ozone/de-ionized water buffer-polishing process is conducted after copper and barrier CMP and then the wafer is cleaned using a chemical solution or de-ionized water. Alternatively, an ozone/de-ionized water buffer-polishing process is conducted after both copper-CMP and barrier-CMP and then the wafer is cleaned using a chemical solution or de-ionized water.

Abstract translation: 化学机械抛光（CMP）后从硅晶片去除污染物的方法。 在铜化学机械抛光和随后的屏障化学 - 机械抛光操作之后，施加去离子水中的臭氧水溶液以清洁硅晶片，从而去除晶片上的污染物。 或者，在铜和阻挡CMP之后进行臭氧/去离子水缓冲抛光工艺，然后使用化学溶液或去离子水清洁晶片。 或者，在铜CMP和阻挡CMP两者之后进行臭氧/去离子水缓冲抛光工艺，然后使用化学溶液或去离子水清洁晶片。

公开(公告)号：US07193497B2

公开(公告)日：2007-03-20

申请号：US10757399

申请日：2004-01-15

Applicant: Ming Yeh ,  Heng Cheng Chou ,  Chen-Feng Wu ,  Chien-Chia Lin

Inventor： Ming Yeh ,  Heng Cheng Chou ,  Chen-Feng Wu ,  Chien-Chia Lin

IPC: H01F27/30

CPC classification number: H01F38/12 ,  F23Q3/00 ,  H01F5/04 ,  H01F27/306

Abstract: An ignition coil. The ignition coil includes a casing, a bobbin, and a core. The bobbin includes a body, a primary coil surrounding the body, a secondary coil surrounding the body, a plurality of first terminals embedded in the body, and two secondary coils embedded in the body. The bobbin is disposed inside the casing. The primary coil is connected to the second terminal, and the secondary coil is connected to the first terminal. Each first terminal is abutted by the body and the casing respectively so that each first terminal is maintained in a predetermined position on the body. The core is disposed inside the bobbin.

Abstract translation: 点火线圈。 点火线圈包括壳体，线轴和芯。 线轴包括主体，围绕主体的初级线圈，围绕主体的次级线圈，嵌入在主体中的多个第一端子和嵌入在主体中的两个次级线圈。 筒管设置在壳体内。 初级线圈连接到第二端子，次级线圈连接到第一端子。 每个第一端子分别与主体和壳体抵接，使得每个第一端子保持在主体上的预定位置。 芯部设置在线轴内。

公开(公告)号：US07184173B2

公开(公告)日：2007-02-27

申请号：US10185807

申请日：2002-06-27

Applicant: Chia-Lin Chu ,  Gokalp Bayramoglu ,  Henry M. D'Souza ,  Tam Q. Duong

Inventor： Chia-Lin Chu ,  Gokalp Bayramoglu ,  Henry M. D'Souza ,  Tam Q. Duong

IPC: G06K15/00

CPC classification number: H04N1/6097 ,  H04N1/6033

Abstract: A system for characterizing color is provided. The system includes a color patch identification system that receives image data, such as image data of a color wedge, and generates color patch data, such as for two or more patches that make up the color wedge. A color patch characterization system receives the color patch data and generates color density data, such as by calculating the average color density of each color patch.

Abstract translation: 提供了一种表征颜色的系统。 该系统包括接收诸如彩色楔形图像数据的图像数据的色标识别系统，并且生成色块数据，例如构成色楔的两个或更多个补丁。 色标表征系统接收色标数据并产生色浓度数据，例如通过计算每个色标的平均色密度。

公开(公告)号：US07184172B2

公开(公告)日：2007-02-27

申请号：US10184468

申请日：2002-06-27

Applicant: Chia-Lin Chu ,  Gokalp Bayramoglu ,  Henry M. D'Souza ,  Tam Q. Duong

Inventor： Chia-Lin Chu ,  Gokalp Bayramoglu ,  Henry M. D'Souza ,  Tam Q. Duong

IPC: G06K15/00

CPC classification number: H04N1/6097 ,  H04N1/6033

Abstract: A method for controlling printer color is provided. The method includes receiving cartridge color density data, such as from analysis of a test patch printed by the cartridge, and reference cartridge data, such as from analysis of a test patch printed and measured in accordance with a color standard. The color density data of the cartridge test patch is then mapped to the color density data of the reference cartridge test patch to generate mapped color density data, such as a look-up table that provides a dot activation for the cartridge that generates the same color density for a known dot activation for the reference cartridge. The mapped color density data is then used to control color density for printing a set of image data.

Abstract translation: 提供了一种用于控制打印机颜色的方法。 该方法包括接收墨盒颜色浓度数据，例如从分析由墨盒打印的测试补丁和参考墨盒数据，例如从根据颜色标准印刷和测量的测试贴片的分析。 然后将盒式测试贴片的色浓度数据映射到参考盒测试贴片的色浓度数据，以生成映射颜色浓度数据，例如为产生相同颜色的盒提供点激活的查找表 用于参考盒的已知点激活的密度。 然后使用映射的颜色浓度数据来控制用于打印一组图像数据的颜色浓度。

公开(公告)号：US20070032077A1

公开(公告)日：2007-02-08

申请号：US11161530

申请日：2005-08-08

Applicant: Tzung-Yu Hung ,  Chien-Chung Huang ,  Chao-Ching Hsieh ,  Chia-Lin Hsu

Inventor： Tzung-Yu Hung ,  Chien-Chung Huang ,  Chao-Ching Hsieh ,  Chia-Lin Hsu

IPC: H01L21/44

CPC classification number: H01L21/76828 ,  H01L21/76864 ,  H01L21/76877 ,  H01L21/76883

Abstract: A method for manufacturing a metal plug is described. A substrate with an opening is provided. Then, a barrier layer is formed on a surface of the opening. Thereafter, a metallic layer is formed over the substrate so that the opening is also filled. Next, a planarization process is performed to remove the metallic layer outside the opening. One main feature of the present invention is the performance of at least a high temperature treatment after the metallic layer is formed. Due to the high temperature treatment, internal stress between different layers is released.

Abstract translation: 对金属插头的制造方法进行说明。 提供具有开口的基板。 然后，在开口的表面上形成阻挡层。 此后，在基板上形成金属层，使得开口也被填充。 接下来，进行平面化处理以去除开口外部的金属层。 本发明的一个主要特征是在形成金属层之后进行至少高温处理。 由于高温处理，不同层之间的内部应力被释放。

公开(公告)号：US20060279494A1

公开(公告)日：2006-12-14

申请号：US11160174

申请日：2005-06-13

Applicant: I-Hwei Yen ,  Chia-Lin Liu ,  Shih-Min Wu ,  Chi-Neng Mo

Inventor： I-Hwei Yen ,  Chia-Lin Liu ,  Shih-Min Wu ,  Chi-Neng Mo

IPC: G09G3/34

CPC classification number: G09G3/002 ,  G09G2320/0271 ,  G09G2320/048 ,  G09G2320/0666 ,  G09G2320/0673 ,  H04N9/69

Abstract: A color compensation system for a display including least one display panel and a light source is provided. The system includes a memory, a modulator and a controller. The memory stores a number of sets of gamma look up tables (LUTs) consisting of a color data. The modulator is electrically connected with the memory and the display panel. The controller is electrically connected with the memory and the light source. When the light source is turned on, the controller counts the use time of the light source. When the use time reaches a first predetermined value, the controller selects one of the sets of gamma look up tables (LUTs) in the memory and provides the color data of the set of gamma look up table to the modulator, and the modulator provides a driving voltage to the display panel by using the color data.

Abstract translation: 提供一种用于包括至少一个显示面板和光源的显示器的色彩补偿系统。 该系统包括存储器，调制器和控制器。 存储器存储由颜色数据组成的多组伽马查找表（LUT）。 调制器与存储器和显示面板电连接。 控制器与存储器和光源电连接。 当光源打开时，控制器对光源的使用时间进行计数。 当使用时间达到第一预定值时，控制器选择存储器中的一组伽马查找表（LUT）中的一个，并将该伽马查询表的颜色数据提供给调制器，并且调制器提供 通过使用颜色数据将电压驱动到显示面板。

公开(公告)号：US07118974B2

公开(公告)日：2006-10-10

申请号：US10831871

申请日：2004-04-26

Applicant: Chia-Lin Chen ,  Chien-Hao Chen ,  Mo-Chiun Yu

Inventor： Chia-Lin Chen ,  Chien-Hao Chen ,  Mo-Chiun Yu

IPC: H01L21/336

CPC classification number: H01L21/823857 ,  H01L21/28202 ,  H01L21/31662 ,  H01L21/32 ,  H01L21/823462 ,  H01L21/823481 ,  H01L21/823878 ,  Y10S438/981

Abstract: A method of forming multiple gate oxide thicknesses on active areas that are separated by STI isolation regions on a substrate. A first layer of oxide is grown to a thickness of about 50 Angstroms and selected regions are then removed. A second layer of oxide is grown that is thinner than first growth oxide. For three different gate oxide thicknesses, selected second oxide growth regions are nitridated with a N2 plasma which increases the dielectric constant of a gate oxide and reduces the effective oxide thickness. To achieve four different gate oxide thicknesses, nitridation is performed on selected first growth oxides and on selected second growth oxide regions. Nitridation of gate oxides also prevents impurity dopants from migrating across the gate oxide layer and reduces leakage of standby current. The method also reduces corner loss of STI regions caused by HF etchant.