公开(公告)号：US08092981B2

公开(公告)日：2012-01-10

申请号：US12345169

申请日：2008-12-29

Applicant: Hoon Kang ,  Jae-Sung Kim ,  Yang-Ho Jung ,  Hi-Kuk Lee ,  Yasuhiro Kameyama ,  Yuuji Mizuho ,  Jong-Cheol Kim ,  Se-Jin Choi

Inventor： Hoon Kang ,  Jae-Sung Kim ,  Yang-Ho Jung ,  Hi-Kuk Lee ,  Yasuhiro Kameyama ,  Yuuji Mizuho ,  Jong-Cheol Kim ,  Se-Jin Choi

IPC: G03F7/027 ,  G03F7/038 ,  G03F7/004 ,  G03F7/028 ,  H01L21/336 ,  H01L21/84

CPC classification number: H01L27/1288 ,  G03F7/0007 ,  G03F7/027 ,  G03F7/033 ,  H01L27/1214 ,  Y10S430/111

Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.

Abstract translation: 负性光致抗蚀剂组合物和阵列基板的制造方法。 负性光致抗蚀剂组合物包括含有乙烯不饱和键的乙烯不饱和化合物和光聚合引发剂的光固化性组合物，包含通过热交联的碱溶性树脂和有机溶剂的热固性组合物。 负性光致抗蚀剂组合物提高了稳定性，光敏性，进行显影操作后的可剥离性，并且降低了残留物以提高有机绝缘层的可靠性。 此外，负性光致抗蚀剂组合物提高了有机绝缘层的透射率，并且减少了颜色坐标的变化，从而提高了显示装置的显示质量。

公开(公告)号：US20110287360A1

公开(公告)日：2011-11-24

申请号：US13037212

申请日：2011-02-28

Applicant: Hi-Kuk LEE ,  Sang-Hyun YUN ,  Cha-Dong KIM ,  Jung-In PARK ,  Deok-Man KANG ,  Youn-Suk KIM ,  Sae-Tae OH

Inventor： Hi-Kuk LEE ,  Sang-Hyun YUN ,  Cha-Dong KIM ,  Jung-In PARK ,  Deok-Man KANG ,  Youn-Suk KIM ,  Sae-Tae OH

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/30 ,  G03F7/022 ,  G03F7/0236 ,  H01L27/1288 ,  H01L29/41733

Abstract: A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. andR1 is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 4 carbons, an alkenyl group having 2 to 4 carbons, a cycloalkyl group having 3 to 8 carbons, and an aryl group having 6 to 12 carbons, and R2 is selected from the group consisting of Cl, F, Br, and I.

Abstract translation: 提供光致抗蚀剂组合物。 光致抗蚀剂组合物包括碱溶性树脂; 含有含有由式1表示的重氮萘醌的第一化合物和含有由式2表示的重氮萘醌的第二化合物的光敏剂; 和溶剂。 R 1选自氢原子，碳原子数1〜4的烷基，碳原子数2〜4的烯基，碳原子数3〜8的环烷基，碳原子数6〜12的芳基， 并且R 2选自Cl，F，Br和I.

公开(公告)号：US20110269253A1

公开(公告)日：2011-11-03

申请号：US13179436

申请日：2011-07-08

Applicant: Seung-Ha CHOI ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

Inventor： Seung-Ha CHOI ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

IPC: H01L33/08

CPC classification number: H01L27/1288 ,  G02F1/133512 ,  G02F1/136209 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/78633

Abstract: A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

Abstract translation: 一种用于平板显示器的薄膜晶体管阵列面板包括：衬底，形成在衬底上的第一信号线，与第一信号线相交和绝缘的第二信号线;开关元件，具有连接到第一信号线 ，连接到第二信号线的第二端子，以及第三端子，连接到开关元件的第三端子的像素电极，以及平行于第二信号线延伸的第一和第二遮光部件， 并且部分地与第二信号线的相应边缘重叠，第一和第二遮光构件之间的间隔在大于1.5μm至小于4μm的范围内。 阵列面板可防止显示屏漏光，提高透光率，开口率和色彩再现性。

公开(公告)号：US08040444B2

公开(公告)日：2011-10-18

申请号：US11434487

申请日：2006-05-15

Applicant: Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

Inventor： Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

IPC: G02F1/1343 ,  G02F1/136

CPC classification number: G02F1/136213 ,  G02F1/13458 ,  G02F2001/136236 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A mask is provided. The mask includes a mask body, a first exposing part and a second exposing part. The first exposing part is on the mask body. The first exposing part includes a first light transmitting portion and second light transmitting portions. The first light transmitting portion exposes a portion of the photoresist film corresponding to the output terminal to a light of a first light amount. The second light transmitting portions exposes an adjacent portion of the photoresist film adjacent to the output terminal to a light of a second light amount smaller than the first light amount. The second exposing part is on the mask body. The second exposing part includes third light transmitting portions for partially exposing the photoresist film corresponding to the storage electrode to a light of a third light amount that is between the first and second light amounts.

Abstract translation: 提供面罩。 面罩包括面罩主体，第一曝光部和第二曝光部。 第一曝光部分在面罩主体上。 第一曝光部分包括第一透光部分和第二透光部分。 第一光透射部分将与输出端子相对应的光致抗蚀剂膜的一部分暴露于第一光量的光。 第二透光部分使邻近输出端子的光致抗蚀剂膜的相邻部分暴露于小于第一光量的第二光量的光。 第二曝光部位在面罩主体上。 第二曝光部分包括用于将对应于存储电极的光致抗蚀剂膜部分地曝光到处于第一和第二光量之间的第三光量的光的第三透光部分。

公开(公告)号：US08004636B2

公开(公告)日：2011-08-23

申请号：US12220145

申请日：2008-07-22

Applicant: Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

Inventor： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

IPC: G02F1/1333 ,  G02F1/136 ,  G02F1/1343

CPC classification number: H01L27/1288 ,  G02F1/133512 ,  G02F1/136209 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/78633

Abstract: A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

Abstract translation: 一种用于平板显示器的薄膜晶体管阵列面板包括：衬底，形成在衬底上的第一信号线，与第一信号线相交和绝缘的第二信号线;开关元件，具有连接到第一信号线 ，连接到第二信号线的第二端子，以及第三端子，连接到开关元件的第三端子的像素电极，以及平行于第二信号线延伸的第一和第二遮光部件， 并且部分地与第二信号线的相应边缘重叠，第一和第二遮光构件之间的间隔在大于1.5μm至小于4μm的范围内。 阵列面板可防止显示屏漏光，提高透光率，开口率和色彩再现性。

公开(公告)号：US20110157569A1

公开(公告)日：2011-06-30

申请号：US12926920

申请日：2010-12-17

Applicant: Dong Seok Baek ,  Sang Don Jang ,  Ho Seok Choi ,  Hi Kuk Lee ,  Oui Serg Kim

Inventor： Dong Seok Baek ,  Sang Don Jang ,  Ho Seok Choi ,  Hi Kuk Lee ,  Oui Serg Kim

IPC: G03B27/52

CPC classification number: G03B27/52 ,  G03B27/72 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/7085

Abstract: Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical system, and a control method thereof. The maskless exposure apparatus includes the measurement optical system including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical system.

Abstract translation: 示例性实施例涉及一种无掩模曝光装置，其使用使用测量光学系统获取的多个光束的强度信息，中心位置信息，聚焦信息和/或形状信息的至少一个信息来生成和/或校正曝光数据， 及其控制方法。 无掩模曝光装置包括测量光学系统，包括光传感器和图像传感器，以及控制单元，其被配置为使用由测量光学系统获取的信息来生成和/或校正曝光数据。

公开(公告)号：US07951631B2

公开(公告)日：2011-05-31

申请号：US12200525

申请日：2008-08-28

Applicant: Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee

Inventor： Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee

IPC: H01L21/00 ,  G03F1/00

CPC classification number: H01L27/1288 ,  G03F1/50 ,  G03F7/70791 ,  H01L27/1214

Abstract: A halftone mask includes a transparent substrate, a light-blocking layer, a first semi-transparent layer and a second semi-transparent layer. The transparent substrate includes a light-blocking area, a light-transmitting area, a first halftone area transmitting first light, and a second halftone area transmitting second light that is less than the first light. The light-blocking layer is formed in the light-blocking area to fully block light from being transmitted. The first and second semi-transparent layers are formed on the transparent substrate. At least one of the first and second semi-transparent layers is formed in the first halftone area, and the first and second semi-transparent layers are overlapped with each other on the second halftone area.

Abstract translation: 半色调掩模包括透明基板，遮光层，第一半透明层和第二半透明层。 透明基板包括遮光区域，透光区域，透射第一光的第一半色调区域和透射比第一光线小的第二光的第二半色调区域。 遮光层形成在遮光区域中，以完全阻止光的透射。 第一和第二半透明层形成在透明基板上。 第一半透明层和第二半透明层中的至少一个形成在第一半色调区域中，并且第一半透明层和第二半透明层在第二半色调区域上彼此重叠。

公开(公告)号：US20100203449A1

公开(公告)日：2010-08-12

申请号：US12685545

申请日：2010-01-11

Applicant: Yeong-Beom Lee ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

Inventor： Yeong-Beom Lee ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

IPC: G03F7/20 ,  G03F7/004

CPC classification number: H01L27/1288 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/40 ,  H01L27/1214

Abstract: A method of fabricating a thin film transistor substrate and a negative photoresist composition used therein are provided, which can reduce pattern inferiority. The method of fabricating a thin film transistor substrate includes forming a conductive film composed of a conductive material on a substrate, forming an etch pattern composed of a negative photoresist composition on the conductive film, and forming a conductive pattern by etching the conductive film using the etch pattern as an etching mask, wherein the negative photoresist composition includes 10-50 parts by weight of novolak resin including a hydroxyl group that is soluble in an alkali developing solution, 0.5-10 parts by weight of a first photo acid generator represented by the following formula (1), 0.5-10 parts by weight of a second photo acid generator represented by the following formula (2), 1-20 parts by weight of a cross-linking agent, and 10-90 parts by weight of a solvent:

Abstract translation: 提供了制造其中使用的薄膜晶体管基板和负型光致抗蚀剂组合物的方法，其可以降低图案劣化。 制造薄膜晶体管基板的方法包括在基板上形成由导电材料构成的导电膜，在导电膜上形成由负性光致抗蚀剂组合物构成的蚀刻图案，并使用该导电膜蚀刻导电膜形成导电图案 蚀刻图案作为蚀刻掩模，其中负性光致抗蚀剂组合物包含10-50重量份的包含可溶于碱显影液的羟基的酚醛清漆树脂，0.5-10重量份由 按照下式（1），将0.5-10重量份由下式（2）表示的第二光酸反应产物，1-20重量份的交联剂和10-90重量份的溶剂 ：

公开(公告)号：US07695779B2

公开(公告)日：2010-04-13

申请号：US11404531

申请日：2006-04-14

Applicant: Jin-ho Ju ,  Dong-ki Lee ,  Hi-kuk Lee ,  Shi-yul Kim ,  Jae-ho Lee

Inventor： Jin-ho Ju ,  Dong-ki Lee ,  Hi-kuk Lee ,  Shi-yul Kim ,  Jae-ho Lee

IPC: C09K19/56

CPC classification number: G02F1/133711 ,  G02F1/133788 ,  Y10T428/1005

Abstract: An organic composition having liquid-crystal alignment characteristics includes a photosensitive compound and a binder resin represented by Formula 1 below: wherein each R1 is independently hydrogen or a methyl group; R2 is an alkyl group of 4-16 carbon atoms; R3 is an alkyl group of 1-7 carbon atoms, a cyclooxyalkyl group of 1-7 carbon atoms, a benzyl group, or a phenyl group; l, m, and n represent molar ratios of polymerization units and are respectively from about 0.01 to about 0.50, from about 0.10 to about 0.60, and from about 0.03 to about 0.50.

Abstract translation: 具有液晶取向特性的有机组合物包括光敏化合物和由下式1表示的粘合剂树脂：其中每个R 1独立地是氢或甲基; R2是4-16个碳原子的烷基; R3是1-7个碳原子的烷基，1-7个碳原子的环氧烷基，苄基或苯基; l，m和n表示聚合单元的摩尔比，分别为约0.01至约0.50，约0.10至约0.60和约0.03至约0.50。

公开(公告)号：US20090224259A1

公开(公告)日：2009-09-10

申请号：US12398555

申请日：2009-03-05

Applicant: Yang-Ho JUNG ,  Hoon KANG ,  Jae-Sung KIM ,  Hi-Kuk LEE

Inventor： Yang-Ho JUNG ,  Hoon KANG ,  Jae-Sung KIM ,  Hi-Kuk LEE

IPC: H01L31/0216 ,  H01L21/04

CPC classification number: H01L27/1248 ,  H01L27/1288

Abstract: A display substrate includes a gate wiring, a data wiring, a switching element, an organic layer, and a pixel electrode. The gate wiring contacts a first transparent conductive layer formed on the gate wiring. The data wiring crosses the gate wiring. The data wiring contacts a second transparent conductive layer formed on the data wiring. The switching element is connected to the gate and data wirings. The organic layer is formed on a base substrate having the switching element formed thereon. The organic layer has first and second trenches corresponding to the first and second transparent conductive layers, respectively. The pixel electrode is formed in a pixel area of the organic layer.

Abstract translation: 显示基板包括栅极布线，数据布线，开关元件，有机层和像素电极。 栅极布线接触形成在栅极布线上的第一透明导电层。 数据线穿过栅极接线。 数据布线接触形成在数据布线上的第二透明导电层。 开关元件连接到栅极和数据布线。 有机层形成在其上形成有开关元件的基底基板上。 有机层分别具有对应于第一和第二透明导电层的第一和第二沟槽。 像素电极形成在有机层的像素区域中。