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195 条记录 (耗时 0.029 秒)

    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC EUV PROJECTION EXPOSURE APPARATUS
    92.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC EUV PROJECTION EXPOSURE APPARATUS 有权
    微波预处理曝光装置的投影目标

    公开(公告)号：US20110090559A1

    公开(公告)日：2011-04-21

    申请号：US12904513

    申请日：2010-10-14

    申请人： Siegfried Rennon ,  Hans-Juergen Mann ,  Thomas Schicketanz

    发明人： Siegfried Rennon ,  Hans-Juergen Mann ,  Thomas Schicketanz

    IPC分类号： G02B17/06

    CPC分类号： G02B1/10 ,  G02B5/00 ,  G02B5/08 ,  G02B5/085 ,  G02B5/0891 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/70958

    摘要： A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light.

    摘要翻译： 微光刻EUV投影曝光装置的投影物镜包括第一镜和第二镜。 第一反射镜包括镜面基板和由反射镜基板承载的反射涂层。 第二反射镜包括镜面基板和由反射镜基板承载的反射涂层。 第一和第二反射镜被配置为使得在EUV光的另外相等的照射下，在EUV光的作用下，第一反射镜的反射镜基板小于第二反射镜的反射镜基板。

    Projection optics for microlithography
    93.
    发明授权
    Projection optics for microlithography 有权
    微光刻投影光学

    公开(公告)号：US07929114B2

    公开(公告)日：2011-04-19

    申请号：US11969476

    申请日：2008-01-04

    申请人： Hans-Juergen Mann

    发明人： Hans-Juergen Mann

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B21/00 ,  G02B5/08 ,  G02B5/10

    CPC分类号： G03F7/702 ,  G02B17/0848 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275

    摘要： A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by such methods, are disclosed.

    摘要翻译： 一种用于微光刻的投影光学器件，其将物平面中的物场成像为图像平面中的图像场，其中所述投影光学器件包括至少一个弯曲镜，并且包括至少一个折射子单元以及相关系统， 公开了通过这些方法制备的方法和产品。

    PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS WITH NEGATIVE BACK FOCUS OF THE ENTRY PUPIL
    94.
    发明申请
    PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS WITH NEGATIVE BACK FOCUS OF THE ENTRY PUPIL 有权
    投影目标和投影曝光装置与入侵者的负面反射

    公开(公告)号：US20110063596A1

    公开(公告)日：2011-03-17

    申请号：US12949985

    申请日：2010-11-19

    申请人： Hans-Juergen Mann ,  Wolfgang Singer

    发明人： Hans-Juergen Mann ,  Wolfgang Singer

    IPC分类号： G03B27/54

    CPC分类号： G02B17/0615 ,  B82Y10/00 ,  G02B13/22 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

    摘要： The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.

    摘要翻译： 本公开涉及一种投影物镜，其可以包括其中形成物场的物平面，入射光瞳，通过在物体上镜像入射光瞳（VE）获得的镜像入射光瞳平面中的镜像入射光瞳（RE） 平面，图像平面，光轴，至少第一反射镜和第二反射镜。 投影物镜可以具有入射光瞳的负的后焦点，并且源自物场的中心点并且从物体平面向图像平面穿过物镜的主射线可以在光轴的至少一点 交叉点，其中所有交点交点的几何位置位于图像平面和镜像入射光瞳平面之间。

    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY
    95.
    发明申请
    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY 有权
    成像光学系统和投影曝光系统

    公开(公告)号：US20100231885A1

    公开(公告)日：2010-09-16

    申请号：US12767521

    申请日：2010-04-26

    申请人： Hans-Juergen Mann

    发明人： Hans-Juergen Mann

    IPC分类号： G03B27/54 ,  G02B17/06

    CPC分类号： G03F7/702 ,  G02B17/02 ,  G02B17/0652 ,  G03F7/70058 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70275

    摘要： An imaging optical system includes a plurality of mirrors that image an object field in an object plane into an image field in an image plane. At least one of the mirrors is obscured, and thus has a opening for imaging light to pass through. The fourth-last mirror in the light path before the image field is not obscured and provides, with an outer edge of the optically effective reflection surface thereof, a central shadowing in a pupil plane of the imaging optical system. The distance between the fourth-last mirror and the last mirror along the optical axis is at least 10% of the distance between the object field and the image field. An intermediate image, which is closest to the image plane, is arranged between the last mirror and the image plane. The imaging optical system can have a numerical aperture of 0.9. These measures, not all of which must be effected simultaneously, lead to an imaging optical system with improved imaging properties and/or reduced production costs.

    摘要翻译： 成像光学系统包括将物平面中的物场映像成像平面中的图像场的多个反射镜。 至少一个镜子被遮蔽，因此具有用于成像光通过的开口。 在图像场之前的光路中的第四后镜不被遮蔽，并且在其光学有效反射表面的外边缘处提供在成像光学系统的光瞳平面中的中心阴影。 沿着光轴的第四镜和最后镜之间的距离至少为物场和图像场之间的距离的10％。 最靠近图像平面的中间图像被布置在最后一个反射镜和图像平面之间。 成像光学系统的数值孔径可以为0.9。 这些措施，并不是所有这些都必须同时进行，导致成像光学系统具有改进的成像性能和/或降低生产成本。

    PROJECTION OBJECTIVE
    97.
    发明申请
    PROJECTION OBJECTIVE 审中-公开
    投影目标

    公开(公告)号：US20100134880A1

    公开(公告)日：2010-06-03

    申请号：US12687325

    申请日：2010-01-14

    申请人： Hans-Juergen Mann

    发明人： Hans-Juergen Mann

    IPC分类号： G02B17/00

    CPC分类号： G02B17/0663 ,  G02B13/22 ,  G02B13/26 ,  G03F7/70233 ,  G03F7/70833

    摘要： The disclosure relates to a projection objective for imaging an object field in an object plane having a field aspect ration (x/y) of at least 1.5 into an image field in an image plane. In general, the projection objective has at least two optically effective surfaces for guiding imaging light in a beam path between the object field and the image field. The projection objective can take up an installed space having a cuboid envelope that is spanned by a length dimension and two transverse dimensions.

    摘要翻译： 本公开涉及一种用于将具有至少1.5的场纵横比（x / y）至少为1.5的物平面中的物场的成像投影到图像平面中的图像场中的投影物镜。 通常，投影物镜具有至少两个用于在物场和像场之间的光束路径中引导成像光的光学有效表面。 投影物镜可以占据具有由长度尺寸和两个横向尺寸跨越的长方体包络的安装空间。

    METHOD AND APPARATUS FOR PRODUCING AN ELEMENT HAVING AT LEAST ONE FREEFORM SURFACE HAVING A HIGH ACCURACY OF FORM AND A LOW SURFACE ROUGHNESS
    98.
    发明申请
    METHOD AND APPARATUS FOR PRODUCING AN ELEMENT HAVING AT LEAST ONE FREEFORM SURFACE HAVING A HIGH ACCURACY OF FORM AND A LOW SURFACE ROUGHNESS 审中-公开
    用于生产具有高精度表面粗糙度和低表面粗糙度的至少一个FREEFORM表面的元件的方法和装置

    公开(公告)号：US20100033696A1

    公开(公告)日：2010-02-11

    申请号：US12563766

    申请日：2009-09-21

    申请人： Thure BOEHM ,  Stefan Burkart ,  Hans-Juergen Mann ,  Danny Chan ,  Holger Maltor

    发明人： Thure BOEHM ,  Stefan Burkart ,  Hans-Juergen Mann ,  Danny Chan ,  Holger Maltor

    IPC分类号： G03B27/68 ,  B24B1/00 ,  B24B41/06 ,  B32B3/00

    CPC分类号： B24B13/0043 ,  Y10T428/24355

    摘要： A method for producing an element having at least one arbitrarily freely formed surface (freeform surface) having a high accuracy of form and a low surface roughness. The freeform surface is obtained by at least one first processing step with a shaping material processing method in which at least an approximation to the desired freeform surface (target form) is effected, and at least one second step with a material processing method that smooths the surface, wherein at least during the second processing step of the smoothing material processing, the element (1) to be processed is elastically stressed by force introduction such that the freeform surface to be smoothed is processed by smoothing processes for spherical, plane or aspherical surfaces. A corresponding apparatus includes a mount receiving the element to be processed and a smoothing tool smoothing the freeform surface, wherein the receptacle has at least one actuator (6) for exerting a force on the element to be processed, such that the element to be processed can be elastically stressed into an intermediate shape (2″), such that the freeform surface to be smoothed can be processed with the smoothing tool by smoothing processes for spherical, plane or aspherical surfaces.

    摘要翻译： 一种具有至少一种具有高精度和低表面粗糙度的任意自由形成的表面（自由曲面）的元件的制造方法。 通过具有成形材料加工方法的至少一个第一加工步骤获得自由形式表面，其中至少实现对期望的自由曲面（目标形式）的近似，以及至少一个第二步骤，其具有使材料加工方法平滑的材料加工方法 表面，其中至少在平滑材料处理的第二处理步骤期间，待加工的元件（1）通过力引入而弹性应力，使得待平滑的自由曲面由球面，平面或非球面的平滑处理 。 相应的装置包括接收待处理元件的安装件和平滑自由曲面表面的平滑工具，其中容器具有至少一个致动器（6），用于在要处理的元件上施加力，使得要处理的元件 可以弹性地施加到中间形状（2“），使得可以通过平滑工具通过平滑球面，平面或非球面表面处理来平滑待平滑的自由曲面。