MOCVD growth of InGaN quantum well laser structures on a grooved lower waveguiding layer
    92.
    发明授权
    MOCVD growth of InGaN quantum well laser structures on a grooved lower waveguiding layer 有权
    InGaN量子阱激光器结构在沟槽下波导层上的MOCVD生长

    公开(公告)号:US06285698B1

    公开(公告)日:2001-09-04

    申请号:US09160324

    申请日:1998-09-25

    IPC分类号: H01S500

    摘要: Group III-V nitride semiconductors are used as light emitters for optoelectronic devices. To provide the desired range of bandgaps and band offsets in heterostructure devices, InGaN layers have to be grown. InGaN layers are difficult to grow because poor lattice mismatch between group III-V nitride alloys. Thus, a plurality of gratings or grooves are formed in the group III-V nitride layer in order to relieve strain between the group III-V nitride layer and the active region. The plurality of gratings allows segregation of In in a manner that optimizes the wavelength of light produced.

    摘要翻译: III-V族氮化物半导体用作光电器件的发光体。 为了在异质结构器件中提供期望的带隙和带偏移范围,必须生长InGaN层。 InGaN层难以生长,因为III-V族氮化物合金之间的晶格失配不良。 因此,为了减轻III-V族氮化物层和活性区域之间的应变,在III-V族氮化物层中形成多个光栅或沟槽。 多个光栅允许以优化产生的光的波长的方式分离In。