Formation of group III-V nitride films on sapphire substrates with
reduced dislocation densities
    4.
    发明授权
    Formation of group III-V nitride films on sapphire substrates with reduced dislocation densities 失效
    在蓝宝石衬底上形成具有降低的位错密度的III-V族氮化物膜

    公开(公告)号:US6064078A

    公开(公告)日:2000-05-16

    申请号:US83137

    申请日:1998-05-22

    摘要: A single layer of atoms of a selected valence is deposited between a substrate and a group III-V nitride film to improve the quality of the nitride film and of subsequently deposited nitride films on the substrate. The interlayer provides local charge neutrality at the interface, thereby promoting two-dimensional growth of the nitride film and reduced dislocation densities. When the substrate is sapphire, the interlayer should include atoms of group II elements and possibly group III elements. The structure can include a group III-V nitride buffer layer on the interlayer to further enhance the quality of the group III-V nitride films. The structures can be used in blue light emitting optoelectronic devices.

    摘要翻译: 选择的价态的单层原子沉积在衬底和III-V族氮化物膜之间以提高氮化物膜的质量和随后在衬底上沉积的氮化物膜的质量。 中间层在界面处提供局部电荷中性,从而促进氮化膜的二维生长和降低的位错密度。 当衬底是蓝宝石时,中间层应包括II族元素的原子和可能的III族元素。 该结构可以包括中间层上的III-V族氮化物缓冲层,以进一步提高III-V族氮化物膜的质量。 该结构可用于蓝光发光光电器件。

    III-nitride light emitting devices grown on templates to reduce strain
    5.
    发明授权
    III-nitride light emitting devices grown on templates to reduce strain 有权
    在模板上生长的III族氮化物发光器件以减少应变

    公开(公告)号:US07951693B2

    公开(公告)日:2011-05-31

    申请号:US11615808

    申请日:2006-12-22

    IPC分类号: H01L21/20

    摘要: In a III-nitride light emitting device, the device layers including the light emitting layer are grown over a template designed to reduce strain in the device, in particular in the light emitting layer. Reducing the strain in the light emitting device may improve the performance of the device. The template may expand the lattice constant in the light emitting layer over the range of lattice constants available from conventional growth templates. Strain is defined as follows: a given layer has a bulk lattice constant abulk corresponding to a lattice constant of a free standing material of a same composition as that layer and an in-plane lattice constant ain-plane corresponding to a lattice constant of that layer as grown in the structure. The amount of strain in a layer is |(ain-plane−abulk)|/abulk. In some embodiments, the strain in the light emitting layer is less than 1%.

    摘要翻译: 在III族氮化物发光器件中,包括发光层的器件层在设计成减小器件中特别是在发光层中的应变的模板上生长。 降低发光器件中的应变可以提高器件的性能。 模板可以在常规生长模板可获得的晶格常数的范围内扩展发光层中的晶格常数。 应变定义如下:给定层具有对应于与该层相同组成的自由材料的晶格常数的块状晶格常数吸收和对应于该层的晶格常数的面内晶格常数ain-平面 如在结构中生长。 一层中的应变量为|(ain-plane-abulk)| / abulk。 在一些实施方案中,发光层中的应变小于1%。

    III-nitride light emitting devices grown on templates to reduce strain
    6.
    发明授权
    III-nitride light emitting devices grown on templates to reduce strain 有权
    在模板上生长的III族氮化物发光器件以减少应变

    公开(公告)号:US07547908B2

    公开(公告)日:2009-06-16

    申请号:US11615834

    申请日:2006-12-22

    IPC分类号: H01L29/06

    CPC分类号: H01L33/007 H01L31/184

    摘要: In a III-nitride light emitting device, the device layers including the light emitting layer are grown over a template designed to reduce strain in the device, in particular in the light emitting layer. Reducing the strain in the light emitting device may improve the performance of the device. The template may expand the lattice constant in the light emitting layer over the range of lattice constants available from conventional growth templates. Strain is defined as follows: a given layer has a bulk lattice constant abulk corresponding to a lattice constant of a free standing material of a same composition as that layer and an in-plane lattice constant ain-plane corresponding to a lattice constant of that layer as grown in the structure. The amount of strain in a layer is |(ain-plane−abulk)|/abulk. In some embodiments, the strain in the light emitting layer is less than 1%.

    摘要翻译: 在III族氮化物发光器件中,包括发光层的器件层在设计成减小器件中特别是在发光层中的应变的模板上生长。 降低发光器件中的应变可以提高器件的性能。 模板可以在常规生长模板可获得的晶格常数的范围内扩展发光层中的晶格常数。 应变定义如下:给定层具有对应于与该层相同组成的自由材料的晶格常数的块状晶格常数吸收和对应于该层的晶格常数的面内晶格常数ain-平面 如在结构中生长。 一层中的应变量为|(ain-plane-abulk)| / abulk。 在一些实施方案中,发光层中的应变小于1%。

    III-Nitride Light Emitting Devices Grown on Templates to Reduce Strain
    9.
    发明申请
    III-Nitride Light Emitting Devices Grown on Templates to Reduce Strain 有权
    III型氮化物发光器件生长在模板上以减少应变

    公开(公告)号:US20080149961A1

    公开(公告)日:2008-06-26

    申请号:US11615834

    申请日:2006-12-22

    IPC分类号: H01L33/00

    CPC分类号: H01L33/007 H01L31/184

    摘要: In a III-nitride light emitting device, the device layers including the light emitting layer are grown over a template designed to reduce strain in the device, in particular in the light emitting layer. Reducing the strain in the light emitting device may improve the performance of the device. The template may expand the lattice constant in the light emitting layer over the range of lattice constants available from conventional growth templates. Strain is defined as follows: a given layer has a bulk lattice constant abulk corresponding to a lattice constant of a free standing material of a same composition as that layer and an in-plane lattice constant ain-plane corresponding to a lattice constant of that layer as grown in the structure. The amount of strain in a layer is |(ain-plane−abulk)/abulk. In some embodiments, the strain in the light emitting layer is less than 1%.

    摘要翻译: 在III族氮化物发光器件中,包括发光层的器件层在设计成减小器件中特别是在发光层中的应变的模板上生长。 降低发光器件中的应变可以提高器件的性能。 模板可以在常规生长模板可获得的晶格常数的范围内扩展发光层中的晶格常数。 应变定义如下:给定层具有对应于与该层相同组成的自由材料的晶格常数和体内晶格常数a的体晶格常数a 对应于在该结构中生长的该层的晶格常数。 一层中的应变量是|(一个平面内的)本体体积。 在一些实施方案中,发光层中的应变小于1%。