公开(公告)号：US20090213356A1

公开(公告)日：2009-08-27

申请号：US12390676

申请日：2009-02-23

申请人： Toralf Gruner ,  Michael Totzeck

发明人： Toralf Gruner ,  Michael Totzeck

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  B82Y10/00 ,  G03F7/70008 ,  G21K2201/061 ,  H05G2/00

摘要： An illumination system for a microlithographic projection exposure apparatus includes an EUV light source which generates an emission beam of linearly polarized EUV illumination light. An illumination optics guides the emission beam along an optical axis which causes an illumination field in a reticle plane to be illuminated by the emission beam. The illumination system also includes an illumination subunit of the illumination system. The illumination subunit includes at least the EUV light source and a polarization setting device for setting a defined polarization of the EUV emission beam of the illumination subunit.

摘要翻译： 用于微光刻投影曝光装置的照明系统包括产生线偏极化EUV照明光的发射光束的EUV光源。 照明光学器件沿着光轴引导发射光束，其使得光栅平面中的照明场被发射光束照射。 照明系统还包括照明系统的照明子单元。 照明子单元至少包括EUV光源和用于设定照明子单元的EUV发射光束的限定极化的偏振设置装置。

公开(公告)号：US20090153831A1

公开(公告)日：2009-06-18

申请号：US12361842

申请日：2009-01-29

申请人： Olaf Conradi ,  Toralf Gruner

发明人： Olaf Conradi ,  Toralf Gruner

IPC分类号： G03B27/72

CPC分类号： G03F7/70891 ,  G03F7/70258

摘要： The disclosure relates to a method for compensating image errors, generated by intensity distributions in optical systems, such as in projection lens arrays of microlithography systems, and to respective optical systems, such as projection lens arrays of microlithography systems.

摘要翻译： 本公开涉及一种用于补偿由光学系统中的强度分布产生的图像误差的方法，例如在微光刻系统的投影透镜阵列中，以及相应的光学系统，例如微光刻系统的投影透镜阵列。

公开(公告)号：US07408616B2

公开(公告)日：2008-08-05

申请号：US10949396

申请日：2004-09-27

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/42

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US07355791B2

公开(公告)日：2008-04-08

申请号：US11251300

申请日：2005-10-14

申请人： Vladimir Kamenov ,  Toralf Gruner

发明人： Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02B5/30

CPC分类号： G03F7/70225 ,  G02B5/3091 ,  G02B17/02 ,  G02B17/08 ,  G02B17/0892 ,  G03F7/70241 ,  G03F7/70958 ,  G03F7/70966

摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.

摘要翻译： 光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。 晶体的晶格具有不同的取向，例如 通过相互补偿减少集团的整体延迟。 至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。 这降低了幅度，但并没有显着地改变固有双折射的取向。 通过选择适当的倾斜角度，可以实现光学系统的更好的性能。 例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。

公开(公告)号：US20080019013A1

公开(公告)日：2008-01-24

申请号：US11864193

申请日：2007-09-28

申请人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

发明人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

IPC分类号： G02B3/00

CPC分类号： G03F7/70966 ,  B24B13/00 ,  G02B1/02 ,  G02B3/00

摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

公开(公告)号：US07292388B2

公开(公告)日：2007-11-06

申请号：US10983569

申请日：2004-11-08

申请人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

发明人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

IPC分类号： G02B13/14

CPC分类号： G03F7/70966 ,  B24B13/00 ,  G02B1/02 ,  G02B3/00

摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

公开(公告)号：US07126765B2

公开(公告)日：2006-10-24

申请号：US11029788

申请日：2005-01-05

申请人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

发明人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

IPC分类号： G02B17/00 ,  G02B13/14

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

公开(公告)号：US07079331B2

公开(公告)日：2006-07-18

申请号：US11109316

申请日：2005-04-19

申请人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

发明人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

IPC分类号： G02B7/02 ,  G02B27/10 ,  G02B27/14 ,  G02B7/18 ,  G02F1/01

CPC分类号： G03F7/70825 ,  G02B7/008 ,  G02B7/1805 ,  G03F7/70891

摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.

摘要翻译： 本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。 分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在 分束器元件

公开(公告)号：US20050254773A1

公开(公告)日：2005-11-17

申请号：US11185066

申请日：2005-07-20

申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

IPC分类号： G02B7/00 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G02B6/00

CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振独立扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

公开(公告)号：US20050180023A1

公开(公告)日：2005-08-18

申请号：US11071699

申请日：2005-03-02

申请人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

发明人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02B1/02 ,  G02B5/30 ,  G02B13/14 ,  G03F7/20 ,  G02B3/00

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/705 ,  G03F7/70966 ,  Y10S359/90

摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.

摘要翻译： 数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。 在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。 从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。 在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。 使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。 透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。