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公开(公告)号：US07079331B2
公开(公告)日：2006-07-18
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译： 本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。 分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在 分束器元件
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公开(公告)号：US20050248858A1
公开(公告)日：2005-11-10
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译： 本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的壳体中的至少一个支撑元件。 分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在 分束器元件
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公开(公告)号：US06842294B2
公开(公告)日：2005-01-11
申请号：US10118479
申请日：2002-04-08
申请人： Hubert Holderer , Ulrich Weber , Alexander Kohl , Toralf Gruner , Christoph Zaczek , Jens Ullmann , Martin Weiser , Bernhard Gellrich , Hartmut Muenker
发明人： Hubert Holderer , Ulrich Weber , Alexander Kohl , Toralf Gruner , Christoph Zaczek , Jens Ullmann , Martin Weiser , Bernhard Gellrich , Hartmut Muenker
IPC分类号： G02B17/08 , G03F7/20 , H01L21/027 , G02B3/00 , G02B17/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225
摘要： A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.
摘要翻译： 反射折射物镜包括多个透镜和至少两个偏转镜，其具有彼此具有特定角度，特别是90°的反射表面。 两个偏转镜被布置成其反射表面位于可以设置物镜中的位置的公共基座构件上。
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公开(公告)号：US20080100930A1
公开(公告)日：2008-05-01
申请号：US12002694
申请日：2007-12-17
申请人： Hubert Holderer , Werner Lang , Alexander Kohl , Bernhard Gellrich , Hartmut Brandenburg , Johannes Rau , Armin Schoeppach
发明人： Hubert Holderer , Werner Lang , Alexander Kohl , Bernhard Gellrich , Hartmut Brandenburg , Johannes Rau , Armin Schoeppach
CPC分类号： G03F7/70591 , G02B27/62 , G03F7/70258
摘要： An optical measuring system is provided with a measuring machine that has at least one measuring element for determining locations and at least one measuring element for determining angles. At least one common reference surface is provided for the location-determining measuring element and the angle-determining measuring element.
摘要翻译： 光学测量系统设置有测量机，该测量机具有用于确定位置的至少一个测量元件和用于确定角度的至少一个测量元件。 为位置确定测量元件和角度确定测量元件提供至少一个公共参考表面。
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公开(公告)号：US20050264786A1
公开(公告)日：2005-12-01
申请号：US11101235
申请日：2005-04-07
申请人： Martin Brunotte , Jurgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
发明人： Martin Brunotte , Jurgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
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公开(公告)号：US07170585B2
公开(公告)日：2007-01-30
申请号：US11101235
申请日：2005-04-07
申请人： Martin Brunotte , Jürgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
发明人： Martin Brunotte , Jürgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
摘要翻译： 用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。 后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。 曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。 靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。
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公开(公告)号：US20050134967A1
公开(公告)日：2005-06-23
申请号：US10906737
申请日：2005-03-03
申请人： Martin Brunotte , Jurgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
发明人： Martin Brunotte , Jurgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
摘要翻译： 用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。 后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。 曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。 靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。
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公开(公告)号：US06879379B2
公开(公告)日：2005-04-12
申请号：US10714573
申请日：2003-11-14
申请人： Martin Brunotte , Jürgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
发明人： Martin Brunotte , Jürgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
摘要翻译： 用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。 后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。 曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。 靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。
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公开(公告)号：US07710542B2
公开(公告)日：2010-05-04
申请号：US11936768
申请日：2007-11-07
申请人： Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译： 用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。 线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。 至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。
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公开(公告)号：US20090141258A1
公开(公告)日：2009-06-04
申请号：US12363065
申请日：2009-01-30
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。 剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。 线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。
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