摘要:
An apparatus for detecting error of a transfer system that is adapted for detecting an error of a transfer system transferring a substrate loaded upon fabricating of a flat panel display device in a real time is disclosed. In the apparatus, an emitter generates a light and radiates the light into a transfer system. A receiver receives light reflected from the transfer system. A controller controls light radiation from the emitter, and measures the time such that a reflective light of the transfer system is received from an emitting point of the emitter to the receiver. The controller also detects a displacement of the transfer system using the measured time, a designated reference distance and a reference time. A display displays the displacement of the transfer system detected by the controller.
摘要:
A method and associated algorithms for identifying and distinguishing geometric feature signals from defect signals in the NDE of longitudinal structures. The method includes the steps of collecting an interrogation signal (including reflected components) from a longitudinal structure under evaluation and comparing it with a selected reference signal from a known geometric feature maintained in a database. The comparison involves a determination of the signals phase. Same phase signals identify the source as a geometric feature, while opposite phase signals identify the source as a defect. The comparison involves the steps of gating each of the signals and creating an array of correlation values between points on each. The correlation values are analyzed and a determination (based on comparing maximum and minimum correlation values) is made of the signal phases. A reliability factor may be determined by comparison of the correlation values and the maximum and minimum thereof.
摘要:
A method for manufacturing a semiconductor device is provided. The method includes the steps of forming an interlayer insulating layer on a semiconductor substrate, selectively patterning the interlayer insulating layer to form a contact hole, depositing a first metal on an inner surface of the contact hole, submerging the semiconductor substrate on which the first metal is deposited into an electrochemical plating (ECP) solution bath in which a second metal is dissolved, dissolving the first metal in the ECP solution bath, plating the first and second metals dissolved in the ECP solution bath at the same time to gap-fill an alloy of the first and second metals in the contact hole, and removing the alloy using the interlayer insulating layer as an end point in a CMP process to form an alloy interconnection.
摘要:
A method of fabricating a liquid crystal display device includes forming an active pattern and a data line on a substrate, forming a first insulating layer on the data line, forming a second insulating layer on the substrate, forming a gate electrode on the second insulating layer above the active pattern, forming a third insulating layer on the substrate, forming first and second contact holes through the second and third insulating layers to expose first and second portions of the active pattern, and forming a third contact hole through the first, second, and third insulating layers exposing a portion of the data line, respectively, and forming source and drain electrodes on the third insulating layer, the source electrode connected to the first exposed portion of the active pattern through the first contact hole and connected to the first exposed portion of the data line through the third contact hole, and the drain electrode connected to the second exposed portion of the active pattern through the second contact hole.
摘要:
Provided are a semiconductor device and a method of manufacturing the same. The method includes the steps of: forming a first silicon layer on a semiconductor substrate; patterning the first silicon layer formed on the semiconductor substrate, and exposing a channel region; forming a second silicon layer on the semiconductor substrate in which the channel region is exposed; removing the first silicon layer, and forming source and drain regions; and forming a third silicon layer in the source and drain regions. According to the manufacturing method, it is possible to minimize defects in a silicon interface by forming the source and drain using only a selective epitaxial growth method without a dry-etching process. Also, since stress is concentrated to a silicon channel region, hole mobility and driving current characteristics are considerably improved.
摘要:
Disclosed herein are core-shell type nanoparticles comprising nanoparticle cores made of a metal or semiconductor, and shells made of crystalline metal oxide formed on the surfaces of the nanoparticle cores, as well as a preparation method thereof. According to the disclosed invention, the core-shell nanoparticles, consisting of metallic or semiconductor cores and crystalline metal oxide shells, can be prepared by epitaxially growing metal oxide on the surfaces of the metallic or semiconductor nanoparticle cores. By virtue of the crystalline metal oxide shells, the core nanoparticle made of metal or semiconductor can ensure excellent chemical and mechanical stability, and the core-shell nanoparticles can show new properties resulting from the interaction between the metal cores and the metal oxide crystal shells.
摘要:
An image sensor includes the steps of forming a sublayer including a photodiode, a transistor and a metal line on a substrate, forming a pattern layer on the sublayer to be overlapped with the photodiode and to having a curved surface, and forming a combined color filter and microlens on the pattern layer to have a curved surface.
摘要:
A garbage collection unit and a garbage collection method in an embedded environment are provided. In the method, a memory is divided into a young generation area including first and second areas and an old generation area including a predetermined number of blocks, the young generation area is divided into two areas, the garbage collection is performed alternately in the first and second areas of the young generation area, and the garbage collection in the old generation area is performed gradually in units of individual frames including a predetermined number of blocks. Accordingly, time delay due to garbage collection can be minimized, thereby guaranteeing a real-time operation.
摘要:
A thin type reforming apparatus used for a fuel cell is provided. In the thin type reforming apparatus, a substrate has a passage formed therein, and a fuel inlet introduces fuel to the passage. An evaporator is disposed within the substrate downstream of the fuel inlet, and includes a bubble remover for imparting a flow resistance to the fuel in a liquid state, removing bubbles and vaporizing the fuel. A reformer has a passage formed downstream of the evaporator, and reforms the fuel to hydrogen gas through a heat absorbing reaction. A CO remover has a passage formed downstream of the reformer and removes CO gas included in the hydrogen gas through a heat radiating reaction. A cover covers an upper portion of the substrate and sealing the passages from an outside.