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105 条记录 (耗时 0.042 秒)

    Combined polychromatic electromagnetic beam source system with application to ellipsometers, spectrophotometers and polarimeters
    92.
    发明授权
    Combined polychromatic electromagnetic beam source system with application to ellipsometers, spectrophotometers and polarimeters 有权
    组合多色电磁束源系统应用于椭偏仪，分光光度计和偏光仪

    公开(公告)号：US06268917B1

    公开(公告)日：2001-07-31

    申请号：US09479091

    申请日：2000-01-07

    申请人： Blaine D. Johs

    发明人： Blaine D. Johs

    IPC分类号： G01J400

    CPC分类号： G01J3/447 ,  G01J4/00 ,  G01J2003/2866 ,  G01N21/211

    摘要： Disclosed is a source of polychromatic electromagnetic radiation which, utilizing a beam combiner system, combines beams of polychromatic electromagnetic radiation from a plurality of sources to provide a relatively broad and flattened intensity characteristic vs. wavelength output spectrum, and its application in material system investigation systems, such as ellipsometers, spectrophotometers and polarimeters which comprise a polychromatic source of electromagnetic radiation.

    摘要翻译： 公开了多色的电磁辐射的源，其中，利用光束组合系统，结合了多色电磁辐射束从多个源，以提供相对宽广的和扁平强度特性与波长的输出频谱，其在材料体系调查系统中的应用 ，例如包括电磁辐射的多色源的椭圆计，分光光度计和偏振计。

    System and method of aligning a sample
    93.
    发明授权
    System and method of aligning a sample 有权
    校准样品的系统和方法

    公开(公告)号：US08064055B2

    公开(公告)日：2011-11-22

    申请号：US12378400

    申请日：2009-02-13

    申请人： Martin H. Liphardt ,  Blaine D. Johs

    发明人： Martin H. Liphardt ,  Blaine D. Johs

    IPC分类号： G01J4/00

    CPC分类号： G01B11/272 ,  G01J4/00 ,  G01N21/211

    摘要： A system and method of use thereof that enables determining and setting sample alignment based on the location of, and geometric attributes of a monitored image formed by reflection of an electromagnetic beam from a sample and into an image monitor, which beam is directed to be incident onto the sample along a locus which is substantially normal to the surface of the sample.

    摘要翻译： 一种其使用的系统及其使用方法，其能够基于由来自样本的电磁波的反射形成的监视图像的位置以及图像监视器的图像监视器的位置以及几何属性来确定和设置样本对准，该波束被定向为入射 沿着基本上垂直于样品表面的轨迹到样品上。

    Ellipsometric investigation of very thin films
    94.
    发明授权
    Ellipsometric investigation of very thin films 有权
    非常薄膜的椭圆测量研究

    公开(公告)号：US07483148B1

    公开(公告)日：2009-01-27

    申请号：US11724849

    申请日：2007-03-16

    申请人： Blaine D. Johs

    发明人： Blaine D. Johs

    IPC分类号： G01B11/02 ,  G01J4/00

    CPC分类号： G01N21/211 ,  G01N2021/213

    摘要： Use of spectroscopic data obtained by investigation of a witness sample having a relatively thick dielectric on a surface thereof during deposition of a thin film onto the witness sample and onto a process sample having no, or a relatively thin dielectric on its surface, in characterizing thin film deposited onto the process sample.

    摘要翻译： 在将薄膜沉积到可见样品上并在其表面上没有或相对薄的电介质的工艺样品上，在表面上利用通过研究具有相对厚的电介质的见证样品获得的光谱数据， 薄膜沉积在工艺样品上。

    Dielectric function of thin metal films determined by combined transmission spectroscopic ellipsometry and intensity measurements
    95.
    发明授权
    Dielectric function of thin metal films determined by combined transmission spectroscopic ellipsometry and intensity measurements 有权
    通过组合透射光谱椭偏仪和强度测量法确定薄金属膜的介电函数

    公开(公告)号：US07167241B1

    公开(公告)日：2007-01-23

    申请号：US10884718

    申请日：2004-07-04

    申请人： Blaine D. Johs ,  Gregory K. Pribil

    发明人： Blaine D. Johs ,  Gregory K. Pribil

    IPC分类号： G01J4/00 ,  G01B11/06

    CPC分类号： G01B11/0641 ,  G01N21/211

    摘要： Determination of thin metal film dielectric function and layer thicknesses using simultaneous transmission spectroscopic ellipsometric (SE) and transmission intensity (T) measurements obtained in-situ to break correlation between thickness and optical constants of very thin absorbing films, preferably using only A.C. Components of ellipsometric and intensity characterizing electromagnetic radiation which transmits through said substrate and enters a detector.

    摘要翻译： 使用现场获得的同时透射光谱椭偏（SE）和透射强度（T）测量来确定薄金属膜介电函数和层厚度，以破坏非常薄的吸收膜的厚度和光学常数之间的相关性，优选仅使用椭圆的交流分量 以及表征通过所述衬底并进入检测器的电磁辐射的强度。

    Infrared ellipsometer/polarimeter system, method of calibration, and use thereof
    96.
    发明授权
    Infrared ellipsometer/polarimeter system, method of calibration, and use thereof 失效
    红外椭偏仪/偏振计系统，校准方法及其应用

    公开(公告)号：US5706212A

    公开(公告)日：1998-01-06

    申请号：US618820

    申请日：1996-03-20

    申请人： Daniel W. Thompson ,  Blaine D. Johs

    发明人： Daniel W. Thompson ,  Blaine D. Johs

    IPC分类号： G01J3/28 ,  G01J4/00 ,  G01N21/21 ,  G01J3/447

    CPC分类号： G01J4/00 ,  G01N21/211 ,  G01J2003/2866

    摘要： A sample system investigation system, such as an ellipsometer or polarimeter system, for use in investigating sample systems with electromagnetic wavelengths in the infrared range, and a calibration method for compensating nonidealities in multi-dimensional system rotated and non-rotated component representing matricies, are disclosed. An essentially achromatic compensator of dual-rhomb construction, which introduces a (3*LAMBDA/4) phase shift, but essentially no deviation in the direction of propagation of a polarized beam of electromagnetic wavelengths caused to pass therethrough, even when said compensator is caused to continuously rotate, is also disclosed.

    摘要翻译： 用于调查具有红外范围的电磁波长的样本系统的示波系统调查系统，例如椭偏仪或偏振计系统，以及用于补偿代表矩阵的多维系统旋转和非旋转分量中的非理想性的校准方法。 披露 基本上是双菱形结构的消色差补偿器，其引入（3 * LAMBDA / 4）相移，但是即使当所述补偿器被引起时，也引起通过其的电磁波长的偏振光束的传播方向基本上没有偏差 连续旋转，也被公开。

    Method of determining substrate etch depth
    98.
    发明授权
    Method of determining substrate etch depth 有权
    确定衬底蚀刻深度的方法

    公开(公告)号：US07705995B1

    公开(公告)日：2010-04-27

    申请号：US11153052

    申请日：2005-06-15

    申请人： Blaine D. Johs ,  Jeffrey S. Hale

    发明人： Blaine D. Johs ,  Jeffrey S. Hale

    IPC分类号： G01B11/02

    CPC分类号： G01B11/22

    摘要： A method of monitoring, in real time, the depth to which a process sample is etched by an etching procedure involving investigating a sample substrate that has a patterned surface which, when electromagnetic radiation in an appropriate wavelength range is caused to reflect from, demonstrates lateral interference effects, such that when a frequency transform is applied to spectroscopic reflection data, three distinguishable peaks occur, at least for some range of pattern depth in the sample surface.

    摘要翻译： 一种通过蚀刻过程实时监测工艺样品被蚀刻的深度的方法，该蚀刻程序涉及调查具有图案化表面的样品基底，当在适当波长范围内的电磁辐射被反射时，该样品基底显示横向 干扰效应，使得当对光谱反射数据进行频率变换时，至少在样品表面的图案深度的某一范围内，出现三个可区分的峰。

    Ellipsometric investigation of thin films
    100.
    发明授权
    Ellipsometric investigation of thin films 有权
    薄膜的椭偏仪研究

    公开(公告)号：US07193709B1

    公开(公告)日：2007-03-20

    申请号：US10765732

    申请日：2004-01-27

    申请人： Blaine D. Johs ,  Thomas E. Tiwald

    发明人： Blaine D. Johs ,  Thomas E. Tiwald

    IPC分类号： G01J4/00

    CPC分类号： G01N21/211 ,  G01N2021/213

    摘要： Use of differences in spectroscopic spectra resulting from multiple sample investigation, or sequential investigation of the same sample in evaluation of sample characterizing parameters such as ultra-thin film thickness.

    摘要翻译： 使用多个样品调查产生的光谱中的差异，或对样品特征参数如超薄膜厚度的评估中相同样品的顺序研究。