Infrared ellipsometer/polarimeter system, method of calibration, and use
thereof
    1.
    发明授权
    Infrared ellipsometer/polarimeter system, method of calibration, and use thereof 失效
    红外椭偏仪/偏振计系统,校准方法及其应用

    公开(公告)号:US5706212A

    公开(公告)日:1998-01-06

    申请号:US618820

    申请日:1996-03-20

    摘要: A sample system investigation system, such as an ellipsometer or polarimeter system, for use in investigating sample systems with electromagnetic wavelengths in the infrared range, and a calibration method for compensating nonidealities in multi-dimensional system rotated and non-rotated component representing matricies, are disclosed. An essentially achromatic compensator of dual-rhomb construction, which introduces a (3*LAMBDA/4) phase shift, but essentially no deviation in the direction of propagation of a polarized beam of electromagnetic wavelengths caused to pass therethrough, even when said compensator is caused to continuously rotate, is also disclosed.

    摘要翻译: 用于调查具有红外范围的电磁波长的样本系统的示波系统调查系统,例如椭偏仪或偏振计系统,以及用于补偿代表矩阵的多维系统旋转和非旋转分量中的非理想性的校准方法。 披露 基本上是双菱形结构的消色差补偿器,其引入(3 * LAMBDA / 4)相移,但是即使当所述补偿器被引起时,也引起通过其的电磁波长的偏振光束的传播方向基本上没有偏差 连续旋转,也被公开。

    Regression calibrated spectroscopic rotating compensator ellipsometer
system with photo array detector
    3.
    发明授权
    Regression calibrated spectroscopic rotating compensator ellipsometer system with photo array detector 失效
    具有光电检测器的回归校准光谱旋转补偿器椭偏仪系统

    公开(公告)号:US5872630A

    公开(公告)日:1999-02-16

    申请号:US912211

    申请日:1997-08-15

    摘要: A Spectroscopic Rotating Compensator Material System Investigation System including a Photo Array for simultaneously detecting a Multiplicity of Wavelengths is disclosed. The Spectroscopic Rotating Compensator Material System Investigation System is calibrated by a Mathematical Regression based technique involving, where desirable, Parameterization of Calibration Parameters. Calibration is possible utilizing a single two dimensional Data Set obtained with the Spectroscopic Rotating Compensator Material System Investigation System in a "Material System present" or in a Straight-through" configuration.

    摘要翻译: 公开了一种包括用于同时检测多波长的光阵列的光谱旋转补偿器材料系统调查系统。 光谱旋转补偿器材料系统调查系统通过基于数学回归的技术进行校准,该技术涉及校准参数的参数化。 使用在“材料系统存在”或“直通”配置中的光谱旋转补偿器材料系统调查系统获得的单个二维数据集可以进行校准。

    Spectroscopic ellipsometer and polarimeter systems
    6.
    发明授权
    Spectroscopic ellipsometer and polarimeter systems 有权
    光谱椭偏仪和偏光计系统

    公开(公告)号:US07616319B1

    公开(公告)日:2009-11-10

    申请号:US11890354

    申请日:2007-08-05

    IPC分类号: G01B9/02 G01J3/45 G01J4/00

    摘要: A rotating compensator spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, the system being functionally present in an environmental control chamber and therefore suitable for application in wide spectral range, (for example, 130-1700 nm). Preferred compensator design involves a substantially achromatic multiple element compensator systems wherein multiple total internal reflections enter retardance into an entered beam of electromagnetic radiation, and the elements thereof are oriented to minimize changes in the net retardance vs. the input beam angle resulting from changes in the position and/or rotation of the system of elements.

    摘要翻译: 具有电磁辐射的多色光束源的旋转补偿器光谱椭偏仪或偏振计系统,偏振器,用于支撑材料系统的分级器,分析器,分散光学器件和检测器系统,其包括多个检测器元件,该系统 功能上存在于环境控制室中,因此适用于宽光谱范围(例如,130-1700nm)。 优选的补偿器设计包括基本上消色差的多元件补偿器系统,其中多个全内反射进入到输入的电磁辐射束的延迟,并且其元件被定向为使净延迟相对于由于 元素系统的位置和/或旋转。

    Application of spectroscopic ellipsometry to in-situ real time fabrication of multiple layer alternating high/low refractive index filters
    10.
    发明授权
    Application of spectroscopic ellipsometry to in-situ real time fabrication of multiple layer alternating high/low refractive index filters 有权
    光谱椭偏仪在多层交替高/低折射率滤波器的原位实时制造中的应用

    公开(公告)号:US06940595B1

    公开(公告)日:2005-09-06

    申请号:US10194881

    申请日:2002-07-15

    IPC分类号: G01J4/00

    CPC分类号: G01J4/00

    摘要: Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence.

    摘要翻译: 公开了倾斜入射角,反射和/或透射模式分光椭偏仪PSI和/或DELTA(包括其组合和/或数学等价物)与波长数据的应用以监测和/或控制多层高/ 低折射率带通,带阻和变化的衰减相对于波长滤波器,单独地或与透射非椭圆电磁波转折点相比,在基本上正常的入射角获得的层数据。