公开(公告)号：US06214517B1

公开(公告)日：2001-04-10

申请号：US09023801

申请日：1998-02-12

申请人： Kenichiro Sato ,  Toshiaki Aoai

发明人： Kenichiro Sato ,  Toshiaki Aoai

IPC分类号： G03F7004

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A positive type photoresist composition suitable for light in the wavelength region of 170 nm to 220 nm, high in sensitivity, excellent in adhesion and giving a good resist pattern profile, which comprises a resin having an ester group represented by the following general formula [I] in its molecule and a compound generating an acid by irradiation of an active light ray or radiation: wherein R1 represents a hydrogen atom, an alkyl group or a cycloalkyl group; and R2 and R3, which may be the same or different, each represents a hydrogen atom, an alkyl group, a cycloalkyl group or —A—R4, and R2 and R3 may combine together to form a ring, wherein R4 represents a hydrogen atom, an alkyl group or a cycloalkyl group, R4 and R2 or R3 may combine together to form a ring, and A represents an oxygen atom or a sulfur atom.

摘要翻译： 一种适用于170nm至220nm波长区域的光的正型光致抗蚀剂组合物，其灵敏度高，粘附性优异，并且具有良好的抗蚀剂图案轮廓，其包含具有由以下通式[I ]和通过活性光线或辐射的照射产生酸的化合物：其中R1表示氢原子，烷基或环烷基; 和可以相同或不同的R 2和R 3各自表示氢原子，烷基，环烷基或-A-R 4，并且R 2和R 3可以结合在一起形成环，其中R 4表示氢原子 ，烷基或环烷基，R 4和R 2或R 3可以结合在一起形成环，A表示氧原子或硫原子。

公开(公告)号：US5700620A

公开(公告)日：1997-12-23

申请号：US676917

申请日：1996-07-08

申请人： Shinji Sakaguchi ,  Toshiaki Aoai ,  Kenichiro Sato

发明人： Shinji Sakaguchi ,  Toshiaki Aoai ,  Kenichiro Sato

IPC分类号： G03F7/022 ,  G03F7/023

CPC分类号： G03F7/022

摘要： Disclosed is a radiation ray sensitive resin composition comprising a water-insoluble, alkali-soluble resin, a water-insoluble, alkali-soluble low-molecular compound and a radiation ray sensitive component, in which said radiation ray sensitive component contains a mixture composed of (A) a napthoquinonediazide sulfonic acid diester of water-insoluble, alkali-soluble low-molecular compounds having three and/or four phenolic hydroxyl groups and (B) a napthoquinonediazide sulfonic acid ester of a water-insoluble, alkali-soluble low-molecular compound having from 5 to 7 phenolic hydroxyl groups, in an amount of 30% or more of said radiation ray sensitive component. The composition is a positive type photoresist having a high resolution and small film thickness dependence. This has a broad latitude for development and leaves a small resist residue after development. This has high heat resistance and is therefore highly resistant to dry etching.

摘要翻译： 本发明公开了一种辐射线敏感性树脂组合物，其包含水不溶性碱溶性树脂，水不溶性碱溶性低分子化合物和放射线敏感性成分，其中所述辐射敏感成分含有由 （A）具有三个和/或四个酚羟基的水不溶性碱溶性低分子化合物的萘醌二叠氮磺酸二酯和（B）不溶于水的碱溶性低分子量的萘醌二叠氮化物磺酸酯 具有5至7个酚羟基的化合物，其量为所述辐射敏感组分的30％或更多。 该组合物是具有高分辨率和薄膜厚度依赖性的正型光致抗蚀剂。 这具有广泛的发展空间，在开发后留下了小的抗蚀剂残留物。 这具有高耐热性，因此高耐干腐蚀性。

公开(公告)号：US5693452A

公开(公告)日：1997-12-02

申请号：US548721

申请日：1995-10-26

申请人： Toshiaki Aoai ,  Toru Fujimori

发明人： Toshiaki Aoai ,  Toru Fujimori

IPC分类号： G03F7/039 ,  C08F8/02 ,  C08L61/04 ,  C08L61/06 ,  G03F7/004 ,  H01L21/027

CPC分类号： C08F8/02 ,  G03F7/0045

摘要： A positive chemically amplified resist composition is disclosed, comprising (a) a compound which generates an acid upon irradiation with active light or radiant ray; (b) a resin insoluble in water but soluble in an aqueous alkali solution; and (c) a low molecular acid-decomposable dissolution inhibitor having a molecular weight of 3,000 or less and containing an acid-decomposable alkyl ester group represented by formula (I), and which increases its solubility in an alkali developer by the action of an acid, and having a sodium content and a potassium content each of 30 ppb or less. Also disclosed is a positive chemically amplified resist composition comprising the foregoing compound (a) and (d) a resin having an acid-decomposable alkyl ester group represented by formula (I), and which increases its solubility in an alkali developer by the action of an acid, and having a sodium content and a potassium content each of 30 ppb or less. Still further disclosed are methods for producing the compounds (c) and (d).

摘要翻译： 公开了一种正性化学放大抗蚀剂组合物，其包含（a）在用活性光或辐射线照射时产生酸的化合物; （b）不溶于水但可溶于碱性水溶液的树脂; 和（c）分子量为3000以下且含有式（I）所示的酸分解性烷基酯基的低分子酸可分解溶解抑制剂，其通过作用于 酸，并且具有30ppb以下的钠含量和钾含量。 还公开了一种正化学放大抗蚀剂组合物，其包含上述化合物（a）和（d）具有由式（I）表示的可酸分解的烷基酯基的树脂，并且其通过作用使其在碱性显影剂中的溶解度增加 酸，并且具有30ppb以下的钠含量和钾含量。 还公开了制备化合物（c）和（d）的方法。

公开(公告)号：US5609982A

公开(公告)日：1997-03-11

申请号：US357748

申请日：1994-12-16

申请人： Kenichiro Sato ,  Yasumasa Kawabe ,  Toshiaki Aoai ,  Shinji Sakaguchi

发明人： Kenichiro Sato ,  Yasumasa Kawabe ,  Toshiaki Aoai ,  Shinji Sakaguchi

IPC分类号： G03F7/022 ,  G03F7/023

CPC分类号： G03F7/022

摘要： The present invention provides a positive-working photoresist composition comprising an alkali-soluble resin and a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic ester of a specific water-insoluble alkali-soluble low molecular compound, wherein the high-performance liquid chromatography of the ester with an ultraviolet ray at 254 nm shows that the patterns corresponding to the diester components and complete ester component of the ester each fall within the specific range and a positive-working photoresist composition comprising a water-insoluble alkali-soluble resin, a water-insoluble alkali-soluble low molecular compound, and an ionization-sensitive radioactive compound which comprises a mixture of a naphthoquinone-diazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having three phenolic hydroxyl groups as an ionization-sensitive radioactive compound (A) and a naphthoquinonediazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having four phenolic hydroxyl groups as an ionization-sensitive radioactive compound (B) in an amount of 30% or more by weight based on the total amount of the ionization-sensitive radioactive compound.

摘要翻译： 本发明提供一种正性光致抗蚀剂组合物，其包含碱溶性树脂和特定的水不溶性碱溶性低分子化合物的1,2-萘醌二叠氮化物-5-（和/或-4-）磺酸酯，其中 使用254nm紫外线的酯的高效液相色谱显示对应于酯的二酯组分和完全酯组分的图案分别落在特定范围内，并且包含非水溶性的正性光致抗蚀剂组合物 碱溶性树脂，水不溶性碱溶性低分子化合物和电离敏感性放射性化合物，其包含具有三个酚羟基的水不溶性碱溶性低分子化合物的萘醌二叠氮烷磺酸二酯的混合物作为 电离敏感的放射性化合物（A）和不溶于水的碱溶性低分子化合物的萘醌二叠氮化物二酯 具有基于电离敏感性放射性化合物的总量为30重量％以上的量的四个酚羟基作为电离敏感性放射性化合物（B）的量。

公开(公告)号：US5576143A

公开(公告)日：1996-11-19

申请号：US985262

申请日：1992-12-03

申请人： Toshiaki Aoai ,  Tadayoshi Kokubo

发明人： Toshiaki Aoai ,  Tadayoshi Kokubo

IPC分类号： G03F7/004 ,  G03C1/492

CPC分类号： G03F7/0045 ,  Y10S430/156

摘要： A positive type or negative type light-sensitive composition providing high sensitivity and high resolution in the manufacture of a semiconductor device, and contains:(a) a compound which has at least one group capable of decomposing by acid and a solubility that is increased in an alkaline developing solution,(b) a compound which generates acid by an irradiation with actinic rays or radiation,(c) a compound which generates a base at 50.degree. C. or higher, and(d) a resin which is insoluble in water and soluble in an alkaline aqueous solution.

摘要翻译： 在半导体器件的制造中提供高灵敏度和高分辨率的正型或负型光敏组合物，其包含：（a）具有至少一个能够被酸分解的基团和溶解度增加的化合物 碱性显影液，（b）通过光化射线或辐射照射产生酸的化合物，（c）在50℃以上产生碱的化合物，和（d）不溶于水的树脂 并溶于碱性水溶液。

公开(公告)号：US5554481A

公开(公告)日：1996-09-10

申请号：US361697

申请日：1994-12-22

申请人： Yasumasa Kawabe ,  Kenichiro Satoh ,  Toshiaki Aoai

发明人： Yasumasa Kawabe ,  Kenichiro Satoh ,  Toshiaki Aoai

IPC分类号： C08G8/20 ,  G03F7/022 ,  G03F7/023

CPC分类号： C08G8/20 ,  G03F7/022 ,  G03F7/023

摘要： A positive working photoresist composition sensitive to radiation, having high resolving power, high sensitivity, and excellent storage stability, and further forming a pattern capable of accurately reproducing a mask size in a wide range of photomask line width. The present invention has been obtained by a composition containing at least one of a 1,2-napthoquinonediazido-5-sulfonic acid ester of a polyhydroxy compound and a 1,2-napthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound in combination with at least one alkali-soluble resin.

摘要翻译： 对辐射敏感的正性光致抗蚀剂组合物，具有高分辨能力，高灵敏度和优异的储存稳定性，并进一步形成能够在宽范围的光掩模线宽度下精确地再现掩模尺寸的图案。 本发明是通过含有多羟基化合物的1,2-萘醌二叠氮基-5-磺酸酯和多羟基化合物的1,2-萘醌二叠氮基-4-磺酸酯中的至少一种的组合物而得到的， 至少一种碱溶性树脂。

公开(公告)号：US5216105A

公开(公告)日：1993-06-01

申请号：US550446

申请日：1992-07-10

申请人： Toshiaki Aoai ,  Kazuyoshi Mizutani

发明人： Toshiaki Aoai ,  Kazuyoshi Mizutani

IPC分类号： C08G77/22 ,  C08G77/382 ,  G03F7/075

CPC分类号： C08G77/22 ,  C08G77/382 ,  G03F7/0757 ,  Y10S430/122 ,  Y10S430/126

摘要： A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.

公开(公告)号：US4950582A

公开(公告)日：1990-08-21

申请号：US176196

申请日：1988-03-31

申请人： Toshiaki Aoai ,  Keitaro Aoshima ,  Yasuo Okamoto

发明人： Toshiaki Aoai ,  Keitaro Aoshima ,  Yasuo Okamoto

IPC分类号： G03C1/72 ,  C08G18/38 ,  C08G18/83 ,  G03F7/021 ,  G03F7/022 ,  G03F7/023 ,  G03F7/035 ,  G03F7/095

CPC分类号： C08G18/83 ,  C08G18/3857 ,  G03F7/0217 ,  G03F7/0233 ,  G03F7/035 ,  G03F7/095 ,  Y10S430/107

摘要： A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The light-sensitive composition is excellent in developing properties in an aqueous alkaline developer and coating properties. In addition, the images obtained from the composition are good in wear resistance and exhibit high adhesion to the substrate. Thus, the composition is very suitable for use in making IC circuits, photomasks and PS plates which provide lithographic printing plates exhibiting high printing durability.

摘要翻译： 光敏性组合物包含至少一种具有N-磺酰胺基，N-磺酰基脲基或N-氨基磺酰胺基的水不溶性和水溶性的碱溶性聚氨酯树脂。 感光性组合物在碱性显影剂的水性和显色性中的显影性优异。 此外，由组合物获得的图像具有良好的耐磨性，并且对基材表现出高粘合性。 因此，该组合物非常适用于制造提供具有高印刷耐久性的平版印刷版的IC电路，光掩模和PS板。

公开(公告)号：US4741985A

公开(公告)日：1988-05-03

申请号：US871343

申请日：1986-06-06

申请人： Toshiaki Aoai ,  Kazuo Maemoto ,  Akihiko Kamiya ,  Toshiyuki Sekiya

发明人： Toshiaki Aoai ,  Kazuo Maemoto ,  Akihiko Kamiya ,  Toshiyuki Sekiya

IPC分类号： C08F8/00 ,  G03F7/021 ,  G03C1/52

CPC分类号： C08F8/00 ,  G03F7/0215

摘要： A light-sensitive composition comprising a diazonium compound and a polymer having the recurring units represented by the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group; R.sub.2 represents an unsubstituted alkyl group; R.sub.3 represents an aliphatic or aromatic hydrocarbon group having a carboxyl group; R.sub.4 represents an aliphatic or aromatic hydrocarbon group which has at least one hydroxyl or nitrile group and which may be further substituted; n.sub.1, n.sub.2, n.sub.3, n.sub.4 and n.sub.5 represent the molar percents of the respective recurring units, provided that n.sub.1 is from about 5 to about 85 mol %, n.sub.2 is from 0 to about 60 mol %, n.sub.3 is from 0 to about 20 mol %, n.sub.4 is from about 3 to about 60 mol % and n.sub.5 is from greater than 0 to about 60 mol %.

摘要翻译： 一种感光性组合物，其包含重氮化合物和具有由以下通式（I）表示的重复单元的聚合物：其中R 1表示氢原子或取代或未取代的烷基; R2表示未取代的烷基; R3表示具有羧基的脂族或芳族烃基; R4表示具有至少一个羟基或腈基并且可以进一步被取代的脂族或芳族烃基; n1，n2，n3，n4和n5表示各个重复单元的摩尔百分数，条件是n1为约5至约85摩尔％，n2为0至约60摩尔％，n3为0至约20摩尔 ％，n4为约3至约60mol％，n5为大于0至约60mol％。

公开(公告)号：US4536464A

公开(公告)日：1985-08-20

申请号：US550420

申请日：1983-11-10

申请人： Akira Nagashima ,  Akira Hasegawa ,  Toshiaki Aoai ,  Teruo Nagano

发明人： Akira Nagashima ,  Akira Hasegawa ,  Toshiaki Aoai ,  Teruo Nagano

IPC分类号： C08G8/20 ,  C08K5/28 ,  G03C1/72 ,  G03F7/008 ,  G03F7/023 ,  G03C1/60 ,  G03C1/54 ,  G03F7/08

CPC分类号： G03F7/0236 ,  C08G8/20 ,  C08K5/28 ,  G03C1/72

摘要： The photosensitive composition suitable as a posi-posi photosensitive composition for photosensitive lithographic printing plates is composed of a high molecular compound shown by following general formula I or II and an o-naphthoquinonediazide compound; ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms and R.sub.2 and R.sub.3 each is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.When the photosensitive composition is used as a photosensitive layer of a photosensitive lithographic printing plate and the plate is developed by rubbing with a sponge containing a developer, the photosensitive composition at the exposed areas is completely removed leaving no patches of the composition.

摘要翻译： 适合作为光敏平版印刷版的磷光敏组合物的光敏组合物由以下通式I或II所示的高分子化合物和邻萘醌二叠氮化合物组成; 其中R 1是氢原子，具有1至8个碳原子的烷基，R 2和R 3各自是氢原子或具有1至4个碳原子的烷基。 当感光性组合物用作感光性平版印刷版的感光层时，通过用含有显影剂的海绵进行摩擦而使印版显影，曝光区域的感光性组合物被完全除去，不存在组合物的斑块。