公开(公告)号：US6126703A

公开(公告)日：2000-10-03

申请号：US972150

申请日：1997-11-17

申请人： Masami Akimoto ,  Issei Ueda

发明人： Masami Akimoto ,  Issei Ueda

IPC分类号： B65G49/07 ,  H01L21/677

CPC分类号： H01L21/67778 ,  Y10S414/135 ,  Y10S414/136 ,  Y10T29/41

摘要： A processing system includes a plurality of types of internal processing machines that perform various processes on a semiconductor substrate and an interface section that delivers and receives the semiconductor substrate to and from an external exposure machine for performing an exposure process on the substrate subjected to a resist coating process, wherein the interface section includes a transfer unit for taking in the substrate subjected to a specific process from at least one of the internal processing machines and transferring the substrate and a substrate table unit for temporarily holding the substrate to transfer the substrate between the internal processing machine and the external exposure machine via the transfer unit. The substrate table unit has first and second tables that are laid one on top of the other and can move up and down and stop at a specific height, the first table allowing the substrate to be temporarily placed on it in transferring the substrate to the external exposure machine, and the second table allowing the substrate to be temporarily placed on it in receiving the substrate from the external exposure machine. The transfer unit transfers the substrate between the first and second tables and at least one of the processing machines.

摘要翻译： 处理系统包括在半导体衬底上执行各种处理的多种类型的内部处理机器，以及将外部曝光机进行曝光处理的半导体衬底与外部曝光机进行接收并接收的接口部， 其中所述界面部分包括用于从所述内部加工机械中的至少一个处理特定工艺的基板和用于转移所述基板的转移单元和用于暂时保持所述基板以将所述基板转移到所述基板之间的基板台单元 内部处理机和外部曝光机通过传送单元。 基板台单元具有第一台和第二台，其一个放置在另一个顶部上并且可以上下移动并在特定高度处停止，第一台允许将基板临时放置在其上以将基板传送到外部 曝光机和第二台，允许将衬底临时放置在其上以从外部曝光机接收衬底。 传送单元在第一和第二表与至少一个处理机之间传送基板。

公开(公告)号：US6126338A

公开(公告)日：2000-10-03

申请号：US243117

申请日：1999-02-03

申请人： Masami Akimoto

发明人： Masami Akimoto

IPC分类号： G03F7/16 ,  B05C11/08 ,  G03D5/06 ,  G03F7/30 ,  H01L21/02 ,  H01L21/027 ,  H01L21/677 ,  G03D5/00 ,  B65G49/07

CPC分类号： G03F7/3021 ,  G03D5/06 ,  Y10S414/135 ,  Y10S414/137

摘要： A resist coating-developing system includes two transporting devices each for transporting a substrate, a relay section arranged between the two transporting devices for temporarily retaining a substrate thereon, a coating unit to and from which a substrate is transferred by one of the two transporting devices, the coating unit subjecting the substrate transferred thereto to a resist coating process, and a developing unit to and from which a substrate is transferred by the other of the two transporting devices, the developing unit subjecting an exposed resist of the substrate transferred thereto to a developing process, wherein the coating unit and the developing unit are arranged opposite to each other with the two transporting devices and the relay section interposed therebetween.

摘要翻译： 抗蚀剂涂敷显影系统包括两个用于输送基板的输送装置，设置在两个输送装置之间的用于暂时保持基板的中继部分，一个涂布单元，由两个输送装置中的一个输送基板 将被转印到其上的基板进行抗蚀剂涂布处理的涂布单元，以及由两个输送装置中的另一个传送基板的显影单元，将转印到其上的基板的曝光的抗蚀剂进行曝光的显影单元 显影处理，其中涂布单元和显影单元彼此相对布置，两个输送装置和中继部分插入其间。

公开(公告)号：US6074154A

公开(公告)日：2000-06-13

申请号：US908056

申请日：1997-08-11

申请人： Issei Ueda ,  Masami Akimoto ,  Kazuhiko Ito ,  Mitiaki Matsushita ,  Masatoshi Kaneda ,  Yuji Matsuyama

发明人： Issei Ueda ,  Masami Akimoto ,  Kazuhiko Ito ,  Mitiaki Matsushita ,  Masatoshi Kaneda ,  Yuji Matsuyama

IPC分类号： B65G49/07 ,  G03F7/20 ,  H01L21/677

CPC分类号： G03F7/70691 ,  H01L21/67772 ,  Y10S414/136 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate transfer system comprising a cassette table for mounting a cassette which has an opening portion for loading and unloading a substrate and a cover detachably provided to the opening portion, process portion for processing the substrate housed in a cassette on the cassette table, a transfer arm mechanism for taking out the substrate from the cassette table, transferring it to process units G1 to G5, and returning a processed substrate to the cassette on the cassette table, partition members provided between the transfer arm mechanism and the cassette table, for separating an atmosphere on the side of the transfer arm mechanism from that on the side of the cassette table, a passage formed in the partition member so as to face the opening portion of the cassette on the cassette table, for passing the substrate taken out from the cassette on the cassette table by the transfer arm mechanism and returning the substrate to the cassette on the cassette table, cassette moving mechanisms for moving the opening portion of the cassette on the cassette table closer to the passage or to be farther from the passage, and a cover removing mechanism for detaching the cover from the opening portion or attaching the cover to the opening portion of the cassette.

公开(公告)号：US6024502A

公开(公告)日：2000-02-15

申请号：US959839

申请日：1997-10-29

申请人： Masami Akimoto ,  Yoichi Deguchi

发明人： Masami Akimoto ,  Yoichi Deguchi

IPC分类号： H01L21/00 ,  G03D7/00 ,  G03D5/00

CPC分类号： H01L21/67178 ,  H01L21/6715 ,  Y10S414/135

摘要： Disclosed is an apparatus for processing a substrate in which a processing consisting of a plurality of process steps is applied to a substrate to be processed. The apparatus comprises a transfer zone extending in a vertical direction, a plurality of process groups arranged to surround the transfer zone for processing the substrate, each process group consisting of a plurality of process units stacked one upon the other, and each process unit having an opening communicating with the transfer zone for transferring the substrate into and out of the process unit, a main arm mechanism movably mounted in the transfer zone for transferring the substrate into and out of the process unit through the opening, and down flow forming means for forming a down flow of a clean air within the transfer zone. At least one of the plural process groups includes a plurality of thermal units for heating or cooling the substrate, a transfer unit for transferring the substrate into and out of the transfer zone, and a gas process unit for processing the substrate with a gas, the opening of the gas process unit being positioned lower than the openings of the thermal units and the transfer unit.

摘要翻译： 公开了一种用于处理基板的装置，其中将由多个处理步骤组成的处理应用于待处理的基板。 该装置包括沿垂直方向延伸的转移区域，多个处理组，其布置成围绕用于处理衬底的转移区域，每个处理组由多个堆叠在一起的多个处理单元组成，每个处理单元具有 与转移区连通的开口，用于将基板输送到处理单元中;主臂机构，可移动地安装在转移区域中，用于通过开口将基板输入和移出处理单元;以及下流形成装置，用于形成 转移区内清洁空气的向下流动。 多个处理组中的至少一个包括用于加热或冷却基板的多个热单元，用于将基板输送到转移区域中的转移单元和用于用气体处理基板的气体处理单元， 气体处理单元的开口定位成比热单元和转印单元的开口低。

公开(公告)号：US5975097A

公开(公告)日：1999-11-02

申请号：US917619

申请日：1997-08-26

申请人： Akira Yonemizu ,  Hiroyuki Kudou ,  Masami Akimoto

发明人： Akira Yonemizu ,  Hiroyuki Kudou ,  Masami Akimoto

IPC分类号： H01L21/304 ,  H01L21/00 ,  B08B3/02

CPC分类号： H01L21/67173 ,  H01L21/67051 ,  Y10S134/902

摘要： A processing apparatus of this invention has an openable window portion for transferring a target processing substrate, and an inlet port for introducing the outer atmosphere. Further, the processing apparatus includes a closed processing chamber for performing predetermined processing for the target processing substrate transferred via the window portion, an exhaust means for evacuating the interior of the processing chamber, and an opening/closing mechanism for closing the inlet port, and opening the inlet port when the pressure in the processing chamber is negative.

摘要翻译： 本发明的处理装置具有用于传送目标处理基板的可打开的窗口部分和用于引入外部空气的入口。 此外，处理装置包括用于对通过窗口部分传送的目标处理基板进行预定处理的封闭处理室，用于抽出处理室内部的排气装置和用于关闭入口的打开/关闭机构，以及 当处理室中的压力为负时打开入口。

公开(公告)号：US5974682A

公开(公告)日：1999-11-02

申请号：US921016

申请日：1997-08-29

申请人： Masami Akimoto

发明人： Masami Akimoto

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  F26B19/00

CPC分类号： H01L21/67173 ,  H01L21/67109 ,  H01L21/67178 ,  H01L21/67781

摘要： The process system of the present invention has a cooling process portion, a siding portion, and transfer means. The cooling process portion is responsible for applying cooling process to a heated substrate. The siding portion is positioned in an upper side of the cooling process portion and used for temporarily storing the substrate before being subjected to the cooling process. The transfer means loads/unloads the substrate into/from the cooling process portion and the siding portion.

摘要翻译： 本发明的处理系统具有冷却处理部分，壁板部分和转印装置。 冷却过程部分负责将冷却过程应用于加热的基底。 所述壁板部位于所述冷却工序部的上侧，用于在进行冷却工序之前暂时存储所述基板。 传送装置将基板装入/卸载冷却处理部分和壁板部分。

公开(公告)号：US5972110A

公开(公告)日：1999-10-26

申请号：US921716

申请日：1997-09-02

申请人： Masami Akimoto

发明人： Masami Akimoto

IPC分类号： H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  B05C5/00

CPC分类号： H01L21/67754 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/141

摘要： A resist processing system includes a plurality of processing units each having a plurality of compartments stacked one upon the other in a vertical direction, a solution processing device arranged in a compartment positioned in a lower portion of the processing unit for applying a process solution to a substrate W while rotating the substrate, a heating device arranged in a compartment positioned in an upper portion of the processing unit for heating the substrate, a cooling device arranged in an intermediate compartment positioned between the compartment having the heating device arranged therein and the compartment having the solution processing device arranged therein for cooling the substrate, and a main arm mechanism arranged in each of the processing units and provided with a plurality of holders for transferring the substrate W into and out of each compartment, the holder being movable into and out of each of the compartments included in the processing unit, movable in a Z-axis direction, and swingable about the Z-axis by an angle .theta..

摘要翻译： 抗蚀剂处理系统包括多个处理单元，每个处理单元具有在垂直方向上彼此堆叠的多个隔室;布置在位于处理单元的下部的隔室中的溶液处理装置，用于将处理溶液施加到 衬底W，同时旋转衬底;布置在位于处理单元的上部的隔室中用于加热衬底的加热装置;布置在位于具有布置在其中的具有加热装置的隔室之间的中间室中的冷却装置， 布置在其中用于冷却基板的溶液处理装置和布置在每个处理单元中的主臂机构，并且设置有多个保持器，用于将基板W输入和移出每个隔室，保持器可移动和移出 包括在处理单元中的每个隔间可以在Z轴上移动 方向，并且可绕Z轴摆动角度θ。

公开(公告)号：US5928390A

公开(公告)日：1999-07-27

申请号：US787862

申请日：1997-01-23

申请人： Hidetami Yaegashi ,  Takayuki Toshima ,  Masami Akimoto ,  Eiji Yamaguchi ,  Junichi Kitano ,  Takayuki Katano ,  Hiroshi Shinya ,  Naruaki Iida

发明人： Hidetami Yaegashi ,  Takayuki Toshima ,  Masami Akimoto ,  Eiji Yamaguchi ,  Junichi Kitano ,  Takayuki Katano ,  Hiroshi Shinya ,  Naruaki Iida

IPC分类号： H01L21/00 ,  H01L21/68 ,  B23P21/00 ,  B65G49/07 ,  H01L21/027

CPC分类号： H01L21/67178 ,  H01L21/67196 ,  H01L21/67225 ,  H01L21/67742 ,  Y10T29/41

摘要： A processing apparatus comprises a plurality of process unit groups each including a plurality of process units for subjecting an object to a series of processes, the process units being arranged vertically in multiple stages, an object transfer space being defined among the process unit groups, and a transfer mechanism for transferring the object, the transfer mechanism having a transfer member vertically movable in the object transfer space, the transfer member being capable of transferring the object to each of the process units. The processing apparatus further comprises a mechanism for forming a downward air flow in the object transfer space, a mechanism for controlling the quantity of the downward air flow, and a mechanism for controlling the pressure in the object transfer space. Thus, a variation in condition of the object transfer space is reduced.

摘要翻译： 处理装置包括多个处理单元组，每个处理单元组包括用于对象进行一系列处理的多个处理单元，处理单元以多级垂直排列，在处理单元组之间定义对象传送空间，以及 用于传送物体的传送机构，传送机构具有可在物体传送空间中垂直移动的传送部件，传送部件能够将物体传送到每个处理单元。 处理装置还包括用于在物体传送空间中形成向下的空气流的机构，用于控制向下的空气流量的机构，以及用于控制物体传送空间中的压力的​​机构。 因此，物体传送空间的状态的变化减小。

公开(公告)号：US5858112A

公开(公告)日：1999-01-12

申请号：US818880

申请日：1997-03-17

申请人： Akira Yonemizu ,  Masami Akimoto

发明人： Akira Yonemizu ,  Masami Akimoto

IPC分类号： B08B1/04 ,  H01L21/00 ,  H01L21/306 ,  B08B1/00 ,  B08B3/04

CPC分类号： H01L21/67092 ,  B08B1/007 ,  B08B1/04 ,  H01L21/30625 ,  H01L21/67046 ,  H01L21/67051 ,  Y10S134/902

摘要： A substrate cleaning method in which the substrate is rotated and cleaned utilizing a brush which is brought into contact with the substrate. In accordance with one presently preferred aspect, the substrate is held between a stepped portion and a stopper portion at the fringe of the substrate, thereby preventing movement of the substrate as it is rotated and the brush is brought into contact with the substrate. In accordance with another aspect, a freely rotatable brush is brought into contact with the substrate so that the brush can rotate with the rotating substrate, and damage to the substrate can be minimized.

摘要翻译： 一种基板清洗方法，其中使用与基板接触的刷子旋转和清洁基板。 根据目前优选的一个方面，基板被保持在基板的边缘处的阶梯部分和止动部分之间，从而防止了基板旋转时的移动，并且刷子与基板接触。 根据另一方面，使可自由旋转的刷子与基板接触，使得刷子可以与旋转的基板一起旋转，并且可以使对基板的损坏最小化。

公开(公告)号：US5772764A

公开(公告)日：1998-06-30

申请号：US729028

申请日：1996-10-09

申请人： Masami Akimoto

发明人： Masami Akimoto

IPC分类号： B05B12/14 ,  B05C11/08 ,  B05D1/40 ,  G03F7/16 ,  H01L21/027 ,  B05B13/02 ,  B05B7/16 ,  B05B13/04 ,  B05B15/02

CPC分类号： B05C11/08 ,  G03F7/162 ,  B05B12/14

摘要： A coating apparatus comprises a spin chuck for holding and rotating a substrate, a header unit movable along a linear line connecting a position just above a center-of-rotation of the substrate, to a home position of the unit, a plurality of nozzles included in the header unit for discharging coating liquids to the substrate held on the spin chuck, the first nozzles having their respective nozzle ports arranged in line along the linear line, and a plurality of coating liquid supply means for supplying the coating liquids to the first nozzles, respectively.

摘要翻译： 涂覆装置包括用于保持和旋转衬底的旋转卡盘，可沿着连接刚好在衬底的旋转中心的位置的线性线移动到主体的主体位置的头部单元，包括多个喷嘴 在用于将涂布液喷射到保持在旋转卡盘上的基板的头部单元中，第一喷嘴具有沿线性线排列成各自的喷嘴端口，以及多个涂布液供给装置，用于将涂布液供给到第一喷嘴 ， 分别。