ENDOSCOPE CAP, ENDOSCOPE AND METHOD OF MANUFACTURING ENDOSCOPE CAP

    公开(公告)号:US20210113067A1

    公开(公告)日:2021-04-22

    申请号:US17133284

    申请日:2020-12-23

    Abstract: An endoscope cap with an elevator, which is easily attached to and detached from the distal end of the endoscope, may be provided. An endoscope cap attachable to and detachable from the endoscope, including a lever pivotally provided at a distal end of an insertion part of the endoscope and a pivot part making the lever pivot, comprises a bottomed cylindrical cover having an opening end, the opening end being attachable to and detachable from a distal end of the insertion part of the endoscope; a pedestal fixed to an inside of the cover and having an elevator attachment hole; and an elevator located inside the cover and having an elevator shaft inserted into the elevator attachment hole, the elevator being pivotable around the elevator shaft with respect to the pedestal.

    Imaging optical system
    102.
    发明授权

    公开(公告)号:US10976522B2

    公开(公告)日:2021-04-13

    申请号:US15722181

    申请日:2017-10-02

    Abstract: An imaging optical system includes a positive or negative first lens group, a diaphragm and a positive second lens group. The first lens group includes a positive lens element, provided closest to the object side, that has an aspherical surface on the object side thereof, the aspherical surface including a paraxial convex surface convexing toward the object side. This aspherical surface has a curvature that is positive along a meridional cross-section at the paraxial portion thereof, and the curvature of the meridional cross-section changes from a positive value to a negative value in an area within 75% of an effective aperture from the paraxial portion toward the periphery of the aspherical surface.

    MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20210088895A1

    公开(公告)日:2021-03-25

    申请号:US16970601

    申请日:2019-01-08

    Abstract: A mask blank in which a phase shift film provided on a transparent substrate includes at least a nitrogen-containing layer and an oxygen-containing layer, the nitrogen-containing layer contains silicon and nitrogen and the oxygen-containing layer contains silicon and oxygen, wherein, when the nitrogen-containing layer is subjected to X-ray photoelectron spectroscopy to obtain a maximum peak PSi_f of photoelectron intensity of a Si2p narrow spectrum and the transparent substrate is subjected to X-ray photoelectron spectroscopy to obtain a maximum peak PSi_s of photoelectron intensity of a Si2p narrow spectrum, the numerical value (PSi_f)/(PSi_s), which is produced by dividing the maximum peak PSi_f in the nitrogen-containing layer by the maximum peak PSi_s in the transparent substrate, is 1.09 or less.

    Mask blank, phase shift mask, method of manufacturing phase shift mask, and method of manufacturing semiconductor device

    公开(公告)号:US10942440B2

    公开(公告)日:2021-03-09

    申请号:US16327716

    申请日:2017-08-02

    Abstract: Provided is a mask blank including a phase shift film having a transmittance of 20% or more difficult to achieve in a phase shift film of a single layer made of a silicon nitride material, and the phase shift film is achieved by using a structure having two or more sets of a stacked structure, each set including a low transmission layer and a high transmission layer disposed in order from a transparent substrate side.
    The mask blank includes a phase shift film on a transparent substrate. The phase shift film has a function of transmitting exposure light of an ArF excimer laser at a transmittance of 20% or more. The mask blank has two or more sets of a stacked structure, each set including a low transmission layer and a high transmission layer. The low transmission layer is formed of a silicon nitride-based material. The high transmission layer is formed of a silicon oxide-based material. The high transmission layer provided at an uppermost position is thicker than the high transmission layer provided at a position other than the uppermost position. The low transmission layer is thicker than the high transmission layer provided at a position other than the uppermost position.

    METHOD FOR MANUFACTURING DISK-SHAPED GLASS BLANK AND METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISK

    公开(公告)号:US20210061699A1

    公开(公告)日:2021-03-04

    申请号:US16960849

    申请日:2019-01-28

    Inventor: Shuhei AZUMA

    Abstract: A glass blank is cut out from a glass plate by forming a crack starting portion inside the glass plate by moving a first laser beam relative to the glass plate such that a focal position of the laser beam is located in an inner portion of the glass plate in its thickness direction and the focal position forms a circle when viewed from a surface of the glass plate, then causing cracks to develop from the crack starting portion toward main surfaces of the glass plate, and splitting the glass plate to separate, from the glass plate, a glass blank that includes a separation surface having an arithmetic average surface roughness Ra smaller than 0.01 μm and a roundness not larger than 15 μm. Thereafter, main surfaces of the glass blank are ground or polished.

    PROCESSOR FOR ELECTRONIC ENDOSCOPE AND ELECTRONIC ENDOSCOPE SYSTEM

    公开(公告)号:US20200345205A1

    公开(公告)日:2020-11-05

    申请号:US16642601

    申请日:2018-11-02

    Abstract: A processor for an electronic endoscope includes: a region detection unit configured to detect an enhancement processing target region to be enhanced from pixel information of a captured image of a living tissue; and an enhancement processing unit configured to perform enhancement processing on the enhancement processing target region detected by the region detection unit. The region detection unit is configured to repeat a candidate extraction process of extracting a focused pixel as a candidate for an enhancement processing target region when a signal level value of the focused pixel is smaller than signal level values of two farthest pixels located on both sides farthest from the focused pixel in any one of a plurality of pixel array directions in a region surrounded by a frame surrounding a region with the focused pixel as a center while changing a size of the frame.

    LEAK TESTER
    107.
    发明申请
    LEAK TESTER 审中-公开

    公开(公告)号:US20200337527A1

    公开(公告)日:2020-10-29

    申请号:US16854490

    申请日:2020-04-21

    Inventor: Ichiro MORITOMO

    Abstract: A leak tester of the present disclosure includes: an air pump for supplying air into the endoscope device; a pressure sensor that detects a pressure inside the endoscope device, and a control unit that controls operation of the air pump and the pressure sensor. The control unit executes: a first process of judging whether an internal pressure of the endoscope device has dropped by a first pressure value within a first time span after start of a wet test; a second process of judging whether the internal pressure has further dropped by a second pressure value different from the first pressure value within a second time span different from the first time span in a case where the internal pressure has dropped by the first pressure value in the first process; and a process of judging pass or fail in the wet test.

    Single use endoscope device
    108.
    发明授权

    公开(公告)号:US10806330B2

    公开(公告)日:2020-10-20

    申请号:US16499805

    申请日:2018-05-31

    Abstract: A single use endoscope device which is inserted inside a subject includes: a distal end portion which includes at least an imaging element; an operation unit which operates an operation of the endoscope device; a curved portion which can be curved inside the subject by operating the operation unit; a fractured portion which detaches the distal end portion from the curved portion; and a soft portion which is extended from the operation unit to the curved portion. The distal end portion, the curved portion and the soft portion are inserted in the subject, the operation unit, the curved portion, and the soft portion are discarded after use of the endoscope device, and the distal end portion and at least the imaging element included in the distal end portion are reused.

    SUBSTRATE EQUIPPED WITH MULTI-LAYER REFLECTION FILM, REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, AND SEMICONDUCTOR DEVICE MANUFACTURING PROCESS

    公开(公告)号:US20200310239A1

    公开(公告)日:2020-10-01

    申请号:US16754306

    申请日:2018-10-16

    Abstract: A substrate with a multilayer reflective film, a reflective mask blank, a reflective mask and a method of manufacturing a semiconductor device can prevent contamination of the surface of the multilayer reflective film even in the case of having formed reference marks on the multilayer reflective film. A substrate with a multilayer reflective film contains a substrate, a multilayer reflective film that reflects EUV light formed on the substrate, and a protective film formed on the multilayer reflective film. Reference marks are formed to a concave shape on the surface of the protective film. A surface layer of the reference marks contains an element that is the same as at least one of the elements contained in the protective film. A shrink region, where at least a portion of the plurality of films contained in the multilayer reflective film are shrunk, is formed at the bottom of the reference marks.

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