MEMORY AND STORAGE ON A SINGLE CHIP
    101.
    发明公开

    公开(公告)号:US20240130143A1

    公开(公告)日:2024-04-18

    申请号:US17968744

    申请日:2022-10-18

    CPC classification number: H01L27/2481 H01L45/06 H01L45/143 H01L45/1683

    Abstract: A single memory chip including both memory and storage capabilities on the single chip and accompanying process for forming a memory array including both capabilities is disclosed. In particular, the single chip may incorporate the use of two different chalcogenide materials deposited thereon to implement the memory and storage capabilities. Chalcogenide materials provide flexibility on cell performance, such as by changing the chalcogenide material composition. For the single memory chip, one type of chalcogenide material may be utilized to create memory cells and another type of chalcogenide material may be utilized to create storage cells. The process for forming the memory array includes forming first and second openings in a starting structure and performing a series of etching and deposition steps on the structure to form the memory and storage cells using the two different chalcogenide compositions. The memory and storage cells are independently addressable via wordline and bitline selection.

    Three dimensional memory array
    104.
    发明授权

    公开(公告)号:US11587979B2

    公开(公告)日:2023-02-21

    申请号:US17144669

    申请日:2021-01-08

    Abstract: The present disclosure includes three dimensional memory arrays, and methods of processing the same. A number of embodiments include a plurality of conductive lines separated from one other by an insulation material, a plurality of conductive extensions arranged to extend substantially perpendicular to the plurality of conductive lines, and a storage element material formed around each respective one of the plurality of conductive extensions and having two different contacts with each respective one of the plurality of conductive lines, wherein the two different contacts with each respective one of the plurality of conductive lines are at two different ends of that respective conductive line.

    Techniques for forming self-aligned memory structures

    公开(公告)号:US11417841B2

    公开(公告)日:2022-08-16

    申请号:US16539932

    申请日:2019-08-13

    Abstract: Methods, systems, and devices for techniques for forming self-aligned memory structures are described. Aspects include etching a layered assembly of materials including a first conductive material and a first sacrificial material to form a first set of channels along a first direction that creates a first set of sections. An insulative material may be deposited within each of the first set of channels and a second sacrificial material may be deposited onto the first set of sections and the insulating material. A second set of channels may be etched into the layered assembly of materials along a second direction that creates a second set of sections, where the second set of channels extend through the first and second sacrificial materials. Insulating material may be deposited in the second set of channels and the sacrificial materials removed leaving a cavity. A memory material may be deposited in the cavity.

    TECHNIQUES FOR PROGRAMMING A MEMORY CELL

    公开(公告)号:US20220189551A1

    公开(公告)日:2022-06-16

    申请号:US17685219

    申请日:2022-03-02

    Abstract: Techniques are provided for programming a self-selecting memory cell that stores a first logic state. To program the memory cell, a pulse having a first polarity may be applied to the cell, which may result in the memory cell having a reduced threshold voltage. During a duration in which the threshold voltage of the memory cell may be reduced (e.g., during a selection time), a second pulse having a second polarity (e.g., a different polarity) may be applied to the memory cell. Applying the second pulse to the memory cell may result in the memory cell storing a second logic state different than the first logic state.

    Arrays of memory cells and methods of forming an array of elevationally-outer-tier memory cells and elevationally-inner-tier memory cells

    公开(公告)号:US11302748B2

    公开(公告)日:2022-04-12

    申请号:US16575743

    申请日:2019-09-19

    Abstract: A method of forming an array of memory cells, where the array comprises an elevationally-inner tier of memory cells comprising spaced-inner-tier-lower-first-conductive lines and inner-tier-programmable material directly there-above, an elevationally-outer tier of memory cells comprising spaced-outer-tier-lower-first-conductive lines and outer-tier-programmable material directly there-above, and spaced-upper-second-conductive lines that are electrically shared by the outer-tier memory cells and the inner-tier memory cells, comprises depositing conductor material for all of the shared-spaced-upper-second-conductive lines. All of the conductor material for all of the shared-spaced-upper-second-conductive lines is patterned using only a single masking step. Other method embodiments and arrays of memory cells independent of method of manufacture are disclosed.

    Mixed cross point memory
    109.
    发明授权

    公开(公告)号:US11120870B2

    公开(公告)日:2021-09-14

    申请号:US16998240

    申请日:2020-08-20

    Abstract: Methods, systems, and devices for multi-deck memory arrays are described. A multi-deck memory device may include a memory array with a cell having a self-selecting memory element and another array with a cell having a memory storage element and a selector device. The device may be programmed to store multiple combinations of logic states using cells of one or more decks. Both the first deck and second deck may be coupled to at least two access lines and may have one access line that is a common access line, coupling the two decks. Additionally, both decks may overlie control circuitry, which facilitates read and write operations. The control circuitry may be configured to write a first state or a second state to one or both of the memory decks via the access lines.

    THREE-DIMENSIONAL MEMORY ARRAY
    110.
    发明申请

    公开(公告)号:US20210273015A1

    公开(公告)日:2021-09-02

    申请号:US17320785

    申请日:2021-05-14

    Abstract: An example three-dimensional (3-D) memory array includes a first plurality of conductive lines separated from one other by an insulation material, a second plurality of conductive lines, and a plurality of pairs of conductive pillars arranged to extend substantially perpendicular to the first plurality of conductive lines and the second plurality of conductive lines. The conductive pillars of each respective pair are coupled to a same conductive line of the second plurality of conductive lines. A storage element material is formed partially around the conductive pillars of each respective pair.

Patent Agency Ranking