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    Heat treatment method and heat treatment apparatus for heating substrate by irradiating substrate with light
    101.
    发明授权
    Heat treatment method and heat treatment apparatus for heating substrate by irradiating substrate with light 有权
    热处理方法和通过用光照射基板来加热基板的热处理装置

    公开(公告)号：US09343313B2

    公开(公告)日：2016-05-17

    申请号：US13417498

    申请日：2012-03-12

    申请人： Kazuhiko Fuse ,  Shinichi Kato ,  Kenichi Yokouchi

    发明人： Kazuhiko Fuse ,  Shinichi Kato ,  Kenichi Yokouchi

    IPC分类号： H01L21/263 ,  H01L21/324 ,  H01L21/268 ,  H01L21/67 ,  H01L21/687 ,  F27B17/00 ,  H01L21/265

    CPC分类号： H01L21/2253 ,  F27B17/0025 ,  H01L21/02694 ,  H01L21/26513 ,  H01L21/2686 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/67248 ,  H01L21/68707 ,  H01L21/68742

    摘要： First irradiation which causes an emission output from a flash lamp to reach its maximum value over a time period in the range of 1 to 20 milliseconds is performed to increase the temperature of a front surface of a semiconductor wafer from a preheating temperature to a target temperature for a time period in the range of 1 to 20 milliseconds. This achieves the activation of the impurities. Subsequently, second irradiation which gradually decreases the emission output from the maximum value over a time period in the range of 3 to 50 milliseconds is performed to maintain the temperature of the front surface within a ±25° C. range around the target temperature for a time period in the range of 3 to 50 milliseconds. This prevents the occurrence of process-induced damage while suppressing the diffusion of the impurities.

    摘要翻译： 执行使闪光灯的发射输出在1至20毫秒的范围内达到其最大值的第一次照射，以将半导体晶片的前表面的温度从预热温度升高到目标温度 在1到20毫秒的范围内的时间段。 这实现了杂质的活化。 随后，进行从3-50毫秒的范围内的最大值的最大值逐渐降低的第二次照射，将前表面的温度保持在目标温度±25℃左右的范围内 时间段在3到50毫秒的范围内。 这防止了杂质的扩散抑制了工艺引起的损伤的发生。

    Heat treatment apparatus and method for heating substrate by photo-irradiation
    102.
    发明授权
    Heat treatment apparatus and method for heating substrate by photo-irradiation 有权
    热处理装置及通过光照射加热基板的方法

    公开(公告)号：US08559799B2

    公开(公告)日：2013-10-15

    申请号：US12563409

    申请日：2009-09-21

    申请人： Hideo Nishihara ,  Shinichi Kato

    发明人： Hideo Nishihara ,  Shinichi Kato

    IPC分类号： F26B19/00

    CPC分类号： H01L21/67115 ,  H01L21/26513 ,  H01L21/2686

    摘要： Two-step photo-irradiation heat treatment is performed so that a total photo-irradiation time is not more than one second and that a first step of photo-irradiation of a semiconductor wafer is performed with a light-emission output that averages out at a first light-emission output and a second step of photo-irradiation of the semiconductor wafer is performed in accordance with an output waveform that peaks at a second light-emission output that is higher than both average and maximum light-emission outputs in the first step. Performing preliminary photo-irradiation with a relatively low light-emission output in the first step and then performing intense photo-irradiation with a higher peak in the second step enables the surface temperature of a semiconductor wafer to increase further with a smaller amount of energy than in conventional cases, while preventing the semiconductor wafer from shattering.

    摘要翻译： 进行两步光照射热处理，使得总的光照射时间不超过1秒，并且利用平均在a的光发射输出进行半导体晶片的光照射的第一步骤 第一发光输出和半导体晶片的光照射的第二步骤根据在第二发光输出处峰值的输出波形进行，该输出波形高于第一步骤中的平均和最大发光输出 。 在第一步骤中以相对低的发光输出进行初步光照射，然后在第二步骤中用较高的峰进行强光照射使得半导体晶片的表面温度能够以更少量的能量进一步增加， 在常规情况下，同时防止半导体晶片破碎。

    Semiconductor testing method and semiconductor tester
    105.
    发明授权
    Semiconductor testing method and semiconductor tester 有权
    半导体测试方法和半导体测试仪

    公开(公告)号：US08067752B2

    公开(公告)日：2011-11-29

    申请号：US12764992

    申请日：2010-04-22

    申请人： Tohru Ando ,  Yasuhiko Nara ,  Tsutomu Saito ,  Shinichi Kato ,  Takeshi Sunaoshi

    发明人： Tohru Ando ,  Yasuhiko Nara ,  Tsutomu Saito ,  Shinichi Kato ,  Takeshi Sunaoshi

    IPC分类号： H01J49/00 ,  G06K9/00 ,  G06K9/62

    CPC分类号： G01N23/225 ,  H01J2237/2817 ,  H01J2237/2826

    摘要： A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.

    摘要翻译： 一种半导体测试方法，其能够快速计算其中用鼠标绘制看似水平或垂直线的半导体单元，并且执行与较近轴线对准的光栅旋转。 之后，水平移动台，对应该设置图像的位置上的图像执行图案匹配，并且调整角度。 舞台沿着X轴和Y轴均匀移动，实现了像直线一样的目的地移动。 与舞台的平滑移动同步，通过标尺将单元围成矩形框，并且以数值显示单元数。

    Sewing machine for stitching a stippling pattern
    106.
    发明授权
    Sewing machine for stitching a stippling pattern 有权
    缝纫机缝制点纹图案

    公开(公告)号：US08061285B2

    公开(公告)日：2011-11-22

    申请号：US12455006

    申请日：2009-05-27

    申请人： Takeshi Kongo ,  Hiromi Motoyama ,  Shinichi Kato

    发明人： Takeshi Kongo ,  Hiromi Motoyama ,  Shinichi Kato

    IPC分类号： D05B21/00

    CPC分类号： D05B19/10 ,  D05C5/00 ,  D05D2305/34

    摘要： The convex portions 25 are formed as arranged in contact or substantially in contact with the points A1˜A7 of first group respectively that are provided on the upper side limit line 76 and the concave portions 26 are formed as arranged with a predetermined space provided away from the points a1˜a7 of first group respectively that are provided on the lower side limit line 77. On the other hand, the concave portions 26 are formed as arranged with a predetermined space provided away from the points of second group respectively that are provided on the upper side limit line 76 and the convex portions 25 are formed as arranged in contact or substantially in contact with the points b1˜b4 of second group respectively that are provided on the lower side limit line 77. Thus the upper and lower side limit lines 76, 77 that are arranged opposite to each other have the points A and a of first group and the points B and b of second group provided thereon respectively while the convex portions 25 and the concave portions 26 are formed as arranged in reversed relation in connection with the upper and lower side limit lines 76 and 77.

    摘要翻译： 凸部25形成为分别与设置在上侧限制线76上的第一组的点A1〜A7大致接触或基本接触，并且凹部26形成为具有远离设置的预定空间 分别设置在下侧限制线77上的第一组的点a1〜a7。另一方面，凹部26形成为分别设置有远离第二组的点设置的预定空间， 上侧限制线76和凸部25分别与设置在下侧限制线77上的第二组的点b1〜bb接触或基本接触地形成。因此，上侧和下侧限制线 76,77彼此相对设置有分别设置在其上的第一组的点A和A以及第二组的点B和b，而凸部25 并且凹部26形成为与上下限制线76和77相关地布置成相反的关系。

    Organic electro-luminescence display device
    108.
    发明授权
    Organic electro-luminescence display device 有权
    有机电致发光显示装置

    公开(公告)号：US07804241B2

    公开(公告)日：2010-09-28

    申请号：US12289670

    申请日：2008-10-31

    申请人： Hironori Toyoda ,  Hajime Murakami ,  Shinichi Kato ,  Masahiro Tanaka

    发明人： Hironori Toyoda ,  Hajime Murakami ,  Shinichi Kato ,  Masahiro Tanaka

    IPC分类号： H05B33/00

    CPC分类号： H01L51/5259 ,  H01L27/3246 ,  H01L51/5072 ,  H01L51/5212 ,  H01L51/5228 ,  H01L2251/5315

    摘要： An organic electro-luminescence display device emits light by applying a voltage by an image signal between an upper electrode (23) and a lower electrode which sandwich an organic electro-luminescence layer. The organic electro-luminescence layer comprises an electron transporting layer, a light emitting layer, and a hole transporting layer. The electron transporting layer includes an organic material and cesium, and has a moisture absorbing characteristic. A structure in which the same materials as the electron transporting layer are used and which has a different constituent composition and a greater amount of cesium is used as a desiccant (40) and placed in a region which does not overlap the organic electro-luminescence layer, to effectively remove moisture inside the organic electro-luminescence display device.

    摘要翻译： 有机电致发光显示装置通过在夹持有机电致发光层的上部电极（23）和下部电极之间施加图像信号的电压来发光。 有机电致发光层包括电子传输层，发光层和空穴传输层。 电子传输层包括有机材料和铯，并且具有吸湿特性。 使用与电子传输层相同的材料并且具有不同的构成组成和更大量的铯的结构作为干燥剂（40）并且放置在不与有机电致发光层重叠的区域 以有效地除去有机电致发光显示装置内的水分。

    Semiconductor Testing Method and Semiconductor Tester
    109.
    发明申请
    Semiconductor Testing Method and Semiconductor Tester 有权
    半导体测试方法和半导体测试仪

    公开(公告)号：US20100200749A1

    公开(公告)日：2010-08-12

    申请号：US12764992

    申请日：2010-04-22

    申请人： Tohru ANDO ,  Yasuhiko Nara ,  Tsutomu Saito ,  Shinichi Kato ,  Takeshi Sunaoshi

    发明人： Tohru ANDO ,  Yasuhiko Nara ,  Tsutomu Saito ,  Shinichi Kato ,  Takeshi Sunaoshi

    IPC分类号： H01J37/26 ,  G01N23/22 ,  G06K9/00

    CPC分类号： G01N23/225 ,  H01J2237/2817 ,  H01J2237/2826

    摘要： A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.

    摘要翻译： 一种半导体测试方法，其能够快速计算其中用鼠标绘制看似水平或垂直线的半导体单元，并且执行与较近轴线对准的光栅旋转。 之后，水平移动台，对应该设置图像的位置上的图像执行图案匹配，并且调整角度。 舞台沿着X轴和Y轴均匀移动，实现了像直线一样的目的地移动。 与舞台的平滑移动同步，通过标尺将单元围成矩形框，并且以数值显示单元数。