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    NETWORK MODEL INTEGRATION DEVICE, NETWORK MODEL INTEGRATION SYSTEM, NETWORK MODEL INTEGRATION METHOD, AND COMPUTER PROGRAM PRODUCT
    102.
    发明申请
    NETWORK MODEL INTEGRATION DEVICE, NETWORK MODEL INTEGRATION SYSTEM, NETWORK MODEL INTEGRATION METHOD, AND COMPUTER PROGRAM PRODUCT 有权
    网络模型集成设备，网络模型集成系统，网络模型集成方法和计算机程序产品

    公开(公告)号：US20130185644A1

    公开(公告)日：2013-07-18

    申请号：US13876283

    申请日：2011-03-31

    Applicant: Hiroaki Kitano ,  Yukiko Matsuoka ,  Samik Ghosh

    Inventor： Hiroaki Kitano ,  Yukiko Matsuoka ,  Samik Ghosh

    IPC: H04L12/24

    CPC classification number: H04L41/22 ,  G06F17/30958 ,  G06F19/12 ,  G06F19/26 ,  G06F19/28

    Abstract: The present invention involves retrieving edges that do not constitute a designated network model which is a network model designated by a user and are linked to nodes that constitute the designated network model, displaying retrieval results that include the retrieved edges and network model IDs corresponding to the edges in a selectable manner, and generating an integrated network model in which, when the retrieval results are selected by the user, the edges that are included in the selected retrieval results and the nodes that do not constitute the designated network model and are linked to the edges, are integrated into the designated network model.

    Abstract translation: 本发明涉及检索不构成作为由用户指定的网络模型的指定网络模型的边缘，并且链接到构成指定网络模型的节点，显示包括检索到的边缘的检索结果和对应于该网络模型ID的网络模型ID 边缘，并且生成集成网络模型，其中当用户选择检索结果时，包括在所选择的检索结果中的边缘和不构成指定网络模型的节点被链接到 边缘被集成到指定的网络模型中。

    Aberration correction apparatus that corrects spherical aberration of charged particle apparatus
    103.
    发明申请
    Aberration correction apparatus that corrects spherical aberration of charged particle apparatus 有权
    校正带电粒子装置的球面像差的畸变校正装置

    公开(公告)号：US20090230317A1

    公开(公告)日：2009-09-17

    申请号：US12379442

    申请日：2009-02-23

    Applicant: Yoichi Hirayama ,  Takaho Yoshida

    Inventor： Yoichi Hirayama ,  Takaho Yoshida

    IPC: H01J3/14

    CPC classification number: H01J3/12 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/28

    Abstract: To provide an aberration correction configuration that can realize both an aberration correction function for a long focus and an aberration correction function for a short focus. While having a conventional aberration correction apparatus configuration that has two rotationally symmetric lenses arranged between two multiple lenses, three rotationally symmetric lenses are disposed between an objective lens and a multiple lens instead of the conventional arrangement in which two rotationally symmetric lenses are disposed therebetween. When using the objective lens with a long focal length, aberrations are corrected using two rotationally symmetric lenses among three rotationally symmetric lenses disposed between the objective lens and the multiple lens. When using the objective lens with a short focal length, e.g. for high resolution observation, aberrations are corrected using two rotationally symmetric lenses of a different combination to those used for a long focus, among the three rotationally symmetric lenses disposed between the objective lens and the multiple lens.

    Abstract translation: 提供能够实现长焦点的像差校正功能和短焦点的像差校正功能的像差校正配置。 虽然具有布置在两个多个透镜之间的两个旋转对称透镜的常规像差校正装置配置，但是在物镜和多个透镜之间设置三个旋转对称透镜，而不是其中设置两个旋转对称透镜的传统布置。 当使用具有长焦距的物镜时，在设置在物镜和多透镜之间的三个旋转对称透镜之中使用两个旋转对称透镜校正像差。 当使用具有短焦距的物镜时，例如， 对于高分辨率观察，在物镜和多透镜之间设置的三个旋转对称透镜之中，使用与用于长焦距的不同组合的两个旋转对称透镜来校正像差。

    Method of fabricating a through glass via on a suspended nanocrystalline diamond
    104.
    发明授权
    Method of fabricating a through glass via on a suspended nanocrystalline diamond 有权

    公开(公告)号：US12227446B2

    公开(公告)日：2025-02-18

    申请号：US17606380

    申请日：2020-04-14

    Applicant: OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY SCHOOL CORPORATION

    Inventor： Stoffel Dominique Janssens ,  David Vazquez-Cortes ,  Alessandro Giussani ,  Eliot Martin Fried

    IPC: C03C17/22 ,  C03C15/00 ,  C03C23/00 ,  C03C25/6208

    Abstract: Low-cost and robust platforms are key for the development of next-generation 3D micro- and nanodevices. To fabricate such platforms, nanocrystalline diamond (NCD) is a highly appealing material due to its biocompatibility, robustness, and mechanical, electrical, electrochemical, and optical properties, while glass substrates with through vias are ideal interposers for 3D integration due to the excellent properties of glass. A low-cost process—free of photolithography and transfer printing—for fabricating arrays of TGVs that are sealed with suspended portions of an ultra-thin NCD film on one side is presented. These highly transparent structures may serve as a platform for the development of microwells for single-cell culture and analysis, 3D integrated devices such as microelectrodes, and quantum technologies. It is also possible to replace the NCD with silicon nitride or silicon carbide, allowing for the development of complex heterogeneous structures on a small scale.

    RAPID HYBRID CHEMICAL VAPOR DEPOSITION FOR PEROVSKITE SOLAR MODULES
    110.
    发明申请
    RAPID HYBRID CHEMICAL VAPOR DEPOSITION FOR PEROVSKITE SOLAR MODULES 有权

    公开(公告)号：US20210383978A1

    公开(公告)日：2021-12-09

    申请号：US17339005

    申请日：2021-06-04

    Applicant: Okinawa Institute of Science and Technology School Corporation

    Inventor： Yabing Qi ,  Longbin Qiu ,  Sisi He ,  Luis Katsuya Ono

    IPC: H01G9/00 ,  H01G9/20 ,  H01L51/00 ,  H01L51/42 ,  C23C16/02 ,  C23C16/30 ,  C23C16/46

    Abstract: Systems and methods for performing a rapid hybrid chemical vapor deposition are described herein. In an embodiment, first type of precursor materials is deposited on a substrate. The substrate is placed in a receptacle of a heating device, the heating device configured to provide heat to at least a portion of the receptacle. A second type of precursor materials is placed in the receptacle of the heating device such that the organic compound is closer to a gas source of the heating device than the substrate. A gas flow is created through the receptacle of the heating device. The heating component is used to cause of a portion of the receptacle comprising the substrate and the second type of precursor materials. During the heating process, at least a portion of the second type of precursor materials is deposited on at least a portion of the first type of precursor materials on the substrate.

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