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    Method of reducing charging damage to integrated circuits during semiconductor manufacturing
    114.
    发明授权
    Method of reducing charging damage to integrated circuits during semiconductor manufacturing 有权
    在半导体制造过程中减少集成电路的充电损坏的方法

    公开(公告)号：US07176051B2

    公开(公告)日：2007-02-13

    申请号：US10908815

    申请日：2005-05-27

    Applicant: Ko-Ting Chen ,  Wen-Bin Lu ,  Chao-Hu Liang

    Inventor： Ko-Ting Chen ,  Wen-Bin Lu ,  Chao-Hu Liang

    IPC: H01L21/00 ,  H01L21/76

    CPC classification number: H01L21/823418 ,  H01L21/266 ,  H01L21/823481 ,  H01L27/0207

    Abstract: A semiconductor substrate having an integrated circuit die area surrounded by a scribe lane is provided. Within the integrated circuit die area, a first trench isolation region and a second trench isolation region are formed on the semiconductor substrate, wherein the first trench isolation region isolates a first active device region from a second active device region, and the second trench isolation region comprises a plurality of trench dummy features for reducing loading effect. A first gate electrode is formed on the first active device region and a second gate electrode on the second active device region. The first active device region is masked, while the second active device region and the trench dummy features are exposed. An ion implantation process is then performed to implant dopant species into the second active device region.

    Abstract translation: 提供具有被划线通道包围的集成电路管芯区域的半导体衬底。 在集成电路管芯区域内，在半导体衬底上形成第一沟槽隔离区域和第二沟槽隔离区域，其中第一沟槽隔离区域将第一有源器件区域与第二有源器件区域隔离，第二沟槽隔离区域 包括用于减小负载效应的多个沟槽虚拟特征。 在第一有源器件区上形成第一栅电极，在第二有源器件区上形成第二栅电极。 第一有源器件区域被掩蔽，而第二有源器件区域和沟槽虚拟特征被暴露。 然后执行离子注入工艺以将掺杂剂物质注入到第二有源器件区域中。

    METHOD OF REDUCING CHARGING DAMAGE TO INTEGRATED CIRCUITS DURING SEMICONDUCTOR MANUFACTURING
    115.
    发明申请
    METHOD OF REDUCING CHARGING DAMAGE TO INTEGRATED CIRCUITS DURING SEMICONDUCTOR MANUFACTURING 有权

    公开(公告)号：US20060270161A1

    公开(公告)日：2006-11-30

    申请号：US10908815

    申请日：2005-05-27

    Applicant: Ko-Ting Chen ,  Wen-Bin Lu ,  Chao-Hu Liang

    Inventor： Ko-Ting Chen ,  Wen-Bin Lu ,  Chao-Hu Liang

    IPC: H01L21/8234

    CPC classification number: H01L21/823418 ,  H01L21/266 ,  H01L21/823481 ,  H01L27/0207

    Abstract: A semiconductor substrate having an integrated circuit die area surrounded by a scribe lane is provided. Within the integrated circuit die area, a first trench isolation region and a second trench isolation region are formed on the semiconductor substrate, wherein the first trench isolation region isolates a first active device region from a second active device region, and the second trench isolation region comprises a plurality of trench dummy features for reducing loading effect. A first gate electrode is formed on the first active device region and a second gate electrode on the second active device region. The first active device region is masked, while the second active device region and the trench dummy features are exposed. An ion implantation process is then performed to implant dopant species into the second active device region.

    CMP composition containing surface-modified abrasive particles
    116.
    发明申请
    CMP composition containing surface-modified abrasive particles 审中-公开
    含有表面改性磨料颗粒的CMP组合物

    公开(公告)号：US20060096179A1

    公开(公告)日：2006-05-11

    申请号：US10982080

    申请日：2004-11-05

    Applicant: Bin Lu ,  Li Wu

    Inventor： Bin Lu ,  Li Wu

    IPC: C09K3/14

    CPC classification number: C09K3/1436 ,  B82Y30/00 ,  C01P2004/64 ,  C01P2004/84 ,  C09C1/3054 ,  C09C3/063 ,  C09C3/10 ,  C09G1/02 ,  C09K3/1445 ,  C09K3/1463

    Abstract: The invention provides a polishing composition comprising (a) particles of an abrasive comprising a first metal oxide and a second metal oxide adhered to at least a portion of a surface of the first metal oxide, (b) a water-soluble or water-emulsifiable polymer, wherein the water-soluble or water-emulsifiable polymer coats at least a portion of the second metal oxide such that the zeta potential of the abrasive is changed, and (c) water. The invention further provides a method of chemically-mechanically polishing a substrate through use of such a polishing composition.

    Abstract translation: 本发明提供了一种抛光组合物，其包含（a）研磨剂颗粒，其包含附着到第一金属氧化物表面的至少一部分上的第一金属氧化物和第二金属氧化物，（b）水溶性或水可乳化的 聚合物，其中所述水溶性或水可乳化的聚合物涂覆所述第二金属氧化物的至少一部分，使得所述研磨剂的ζ电位改变，和（c）水。 本发明还提供了通过使用这种抛光组合物对衬底进行化学机械抛光的方法。

    Method and system for multi-path video delivery and distribution
    117.
    发明申请
    Method and system for multi-path video delivery and distribution 审中-公开
    多路径视频传输和分发的方法和系统

    公开(公告)号：US20060078046A1

    公开(公告)日：2006-04-13

    申请号：US10964853

    申请日：2004-10-13

    Applicant: Bin Lu

    Inventor： Bin Lu

    IPC: H04N11/04 ,  H04N11/02 ,  H04N7/12 ,  H04B1/66

    CPC classification number: H04N19/423 ,  H04N19/12 ,  H04N19/162 ,  H04N19/172 ,  H04N19/61 ,  H04N19/63

    Abstract: A system and method for processing and transmitting signals. The system includes a first encoder configured to receive a digital video signal and encode the digital video signal based on a first encoding format, a second encoder configured to receive the digital video signal and encode the digital video signal based on a second encoding format, and a control system configured to receive a first encoded digital video signal and a second encoded digital video signal and output an third encoded digital video signal.

    Abstract translation: 一种用于处理和传输信号的系统和方法。 该系统包括：第一编码器，被配置为接收数字视频信号并且基于第一编码格式对数字视频信号进行编码，第二编码器被配置为基于第二编码格式接收数字视频信号和对数字视频信号进行编码;以及 配置为接收第一编码数字视频信号和第二编码数字视频信号并输出​​第三编码数字视频信号的控制系统。

    Thermally isolated granular media for heat assisted magnetic recording
    118.
    发明申请
    Thermally isolated granular media for heat assisted magnetic recording 审中-公开
    用于热辅助磁记录的隔热颗粒介质

    公开(公告)号：US20050202287A1

    公开(公告)日：2005-09-15

    申请号：US10797204

    申请日：2004-03-10

    Applicant: Bin Lu ,  Dieter Weller ,  Ganping Ju

    Inventor： Bin Lu ,  Dieter Weller ,  Ganping Ju

    IPC: B05D5/12 ,  G11B5/72

    CPC classification number: G11B5/7325 ,  G11B5/65 ,  G11B5/851

    Abstract: A method of fabricating a magnetic storage medium comprises: forming an underlayer on a heat sink layer; co-sputtering a magnetic material and a thermally insulating nonmagnetic material to form a recording layer on the underlayer, wherein the recording layer includes grains of the magnetic material in a matrix of the thermally insulating nonmagnetic material; and heating the recording layer to align an easy axis of magnetization of the magnetic material in a direction perpendicular to the underlayer. A magnetic storage medium fabricated using the method is also provided.

    Abstract translation: 制造磁性存储介质的方法包括：在散热层上形成底层; 共同溅射磁性材料和绝热非磁性材料，以在底层上形成记录层，其中记录层包括在绝热非磁性材料的基体中的磁性材料颗粒; 并且加热记录层以使磁性材料的易磁化轴在垂直于底层的方向上对准。 还提供了使用该方法制造的磁存储介质。

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