公开(公告)号：USD446827S1

公开(公告)日：2001-08-21

申请号：US29136299

申请日：2001-01-30

Applicant: Youn-Fu You ,  Lung-Yin Lin

Designer： Youn-Fu You ,  Lung-Yin Lin

公开(公告)号：US10279311B2

公开(公告)日：2019-05-07

申请号：US13591167

申请日：2012-08-21

Applicant: Chih-I Peng ,  Hsiang-Pi Chang ,  Cary Chia-Chiung Lo ,  Teng-Chun Tsai ,  Kuo-Yin Lin ,  Chih-Yuan Yang

Inventor： Chih-I Peng ,  Hsiang-Pi Chang ,  Cary Chia-Chiung Lo ,  Teng-Chun Tsai ,  Kuo-Yin Lin ,  Chih-Yuan Yang

IPC: B24B37/04 ,  B24B37/30 ,  H01L21/67 ,  B01D53/26 ,  F24F3/16

Abstract: A chemical mechanical polishing (CMP) chamber is disclosed. The CMP chamber includes a chamber body, a door mounted on the chamber body and a chamber substructure being one selected from a group consisting of a moisture separator separating a moisture generated in the CMP chamber, a supplementary exhaust port, a transparent window mounted on the door, a sampling port mounted on the door, a sealing material including a metal frame, an o-ring for sealing the door and a combination thereof.

公开(公告)号：US09937536B2

公开(公告)日：2018-04-10

申请号：US13547275

申请日：2012-07-12

Applicant: Kuo-Yin Lin ,  Chih-I Peng ,  Kun-Tai Wu ,  Teng-Chun Tsai ,  Hsiang-Pi Chang ,  Cary Chia-Chiung Lo

Inventor： Kuo-Yin Lin ,  Chih-I Peng ,  Kun-Tai Wu ,  Teng-Chun Tsai ,  Hsiang-Pi Chang ,  Cary Chia-Chiung Lo

IPC: B08B9/093 ,  H01L21/67 ,  B24B37/34 ,  B08B5/02

CPC classification number: B08B9/093 ,  B08B5/02 ,  B24B37/34 ,  H01L21/67028

Abstract: Among other things, one or more techniques and/or systems are provided for cleaning a polishing module of a semiconductor polishing apparatus. Purge air flow can be supplied into the polishing module (e.g., directed towards a polishing unit, a shield, and/or other polishing components) to create turbulence air flow within the polishing module. An auxiliary exhaust can be invoked to exhaust one or more particulates removed from the polishing module by the turbulence air flow. A purge air flow cycle can be performed by cycling the purge air flow and the auxiliary exhaust between on and off states. One or more purge air flow cycles can be performed during a main air flow cycle where laminar air flow is supplied into the polishing module and exhausted using a main exhaust. In this way, one or more particulates can be cleaned from the polishing module.

公开(公告)号：USD743184S1

公开(公告)日：2015-11-17

申请号：US29508186

申请日：2014-11-04

Applicant: Ya-Yin Lin

Designer： Ya-Yin Lin

公开(公告)号：US08853770B2

公开(公告)日：2014-10-07

申请号：US12724771

申请日：2010-03-16

Applicant: Chih-Wei Hsu ,  Florin Udrea ,  Yih-Yin Lin

Inventor： Chih-Wei Hsu ,  Florin Udrea ,  Yih-Yin Lin

IPC: H01L29/76 ,  H01L29/40 ,  H01L29/06 ,  H01L29/78 ,  H01L29/872

CPC classification number: H01L29/407 ,  H01L29/0615 ,  H01L29/0661 ,  H01L29/404 ,  H01L29/66143 ,  H01L29/7811 ,  H01L29/7813 ,  H01L29/872 ,  H01L29/8725

Abstract: A termination structure is provided for a power transistor. The termination structure includes a semiconductor substrate having an active region and a termination region. The substrate has a first type of conductivity. A termination trench is located in the termination region and extends from a boundary of the active region toward an edge of the semiconductor substrate. A doped region having a second type of conductivity is disposed in the substrate below the termination trench. A MOS gate is formed on a sidewall adjacent the boundary. The doped region extends from below a portion of the MOS gate spaced apart from the boundary toward the edge of the semiconductor substrate. A termination structure oxide layer is formed on the termination trench covering a portion of the MOS gate and extends toward the edge of the substrate. A first conductive layer is formed on a backside surface of the semiconductor substrate and a second conductive layer is formed atop the active region, an exposed portion of the MOS gate, and extends to cover a portion of the termination structure oxide layer.

Abstract translation: 为功率晶体管提供终端结构。 端接结构包括具有有源区和端接区的半导体衬底。 衬底具有第一类导电性。 终端沟槽位于终端区域中并且从有源区域的边界朝向半导体衬底的边缘延伸。 具有第二类型的导电性的掺杂区域设置在终端沟槽下方的衬底中。 在与边界相邻的侧壁上形成MOS栅极。 掺杂区域从与栅极间隔开的部分MOS栅极向半导体衬底的边缘延伸。 端接结构氧化物层形成在覆盖MOS栅极的一部分并朝向衬底边缘延伸的端接沟槽上。 第一导电层形成在半导体衬底的背侧表面上，并且第二导电层形成在有源区顶部，MOS栅极的暴露部分之上，并延伸以覆盖端接结构氧化物层的一部分。

公开(公告)号：US08736797B2

公开(公告)日：2014-05-27

申请号：US13491369

申请日：2012-06-07

Applicant: Ching-Mao Wu ,  Szu-Yin Lin

Inventor： Ching-Mao Wu ,  Szu-Yin Lin

IPC: G02F1/1335

CPC classification number: G02B5/3016

Abstract: A biaxial retardation film is disclosed, including a substrate, wherein the substrate includes an alignment film thereon or an alignment-treated surface; and an optically anisotropic coating on the substrate, wherein the optically anisotropic coating includes a top layer and a bottom layer, wherein the bottom layer is a parallel aligned liquid crystal layer along an alignment direction of the substrate, and the top layer is a vertically aligned hexagonal pillar array liquid crystal layer, wherein three-dimensional refractive indices of the optically anisotropic coating satisfy a relationship nx>nz>ny. The disclosure also provides a fabrication method thereof.

Abstract translation: 公开了一种双轴延迟膜，包括基板，其中所述基板在其上包括取向膜或取向处理表面; 和光学各向异性涂层，其中所述光学各向异性涂层包括顶层和底层，其中所述底层是沿着所述衬底的取向方向的平行排列的液晶层，并且所述顶层是垂直对齐的 六方柱阵列液晶层，其中光学各向异性涂层的三维折射率满足nx> nz> ny的关系。 本公开还提供了其制造方法。

公开(公告)号：US20140014136A1

公开(公告)日：2014-01-16

申请号：US13547275

申请日：2012-07-12

Applicant: Kuo-Yin Lin ,  Chih-I Peng ,  Kun-Tai Wu ,  Teng-Chun Tsai ,  Hsiang-Pi Chang ,  Cary Chia-Chiung Lo

Inventor： Kuo-Yin Lin ,  Chih-I Peng ,  Kun-Tai Wu ,  Teng-Chun Tsai ,  Hsiang-Pi Chang ,  Cary Chia-Chiung Lo

IPC: B08B9/093

CPC classification number: B08B9/093 ,  B08B5/02 ,  B24B37/34 ,  H01L21/67028

Abstract: Among other things, one or more techniques and/or systems are provided for cleaning a polishing module of a semiconductor polishing apparatus. Purge air flow can be supplied into the polishing module (e.g., directed towards a polishing unit, a shield, and/or other polishing components) to create turbulence air flow within the polishing module. An auxiliary exhaust can be invoked to exhaust one or more particulates removed from the polishing module by the turbulence air flow. A purge air flow cycle can be performed by cycling the purge air flow and the auxiliary exhaust between on and off states. One or more purge air flow cycles can be performed during a main air flow cycle where laminar air flow is supplied into the polishing module and exhausted using a main exhaust. In this way, one or more particulates can be cleaned from the polishing module.

Abstract translation: 除其他之外，还提供了一种或多种技术和/或系统来清洁半导体抛光装置的抛光模块。 吹扫空气流可以被提供到抛光模块中（例如，指向抛光单元，屏蔽件和/或​​其它抛光部件），以在抛光模块内产生湍流空气流。 可以调用辅助排气以排出通过湍流空气流从抛光模块移除的一个或多个颗粒。 吹扫空气流循环可以通过在打开和关闭状态之间循环吹扫空气流和辅助排气来进行。 在主空气流循环期间可以执行一个或多个吹扫空气流循环，其中层流气流被供应到抛光模块中并且使用主排气排出。 以这种方式，可以从抛光模块清洁一个或多个颗粒。

公开(公告)号：US20130228243A1

公开(公告)日：2013-09-05

申请号：US13409279

申请日：2012-03-01

Applicant: Cheng-Nan Yang ,  Lung-Yin Lin

Inventor： Cheng-Nan Yang ,  Lung-Yin Lin

IPC: F17D1/04

CPC classification number: F17C1/00 ,  F17C2205/0323 ,  Y10T137/3084 ,  Y10T137/6133 ,  Y10T137/8376

Abstract: A device includes a filling valve, a sleeve, an absorbing member, and a gas control unit. The filling valve can be engaged for filling liquid gas. The sleeve includes a fluid passing section that enables liquid gas outside to flow therein. The absorbing member can absorb liquid gas and is disposed in the sleeve. The gas control unit includes a main body, a gas inlet and flow rate adjusting mechanism, and a gas outlet mechanism. The gas inlet and flow rate adjusting mechanism includes an adjustably movable valve and a first air seal. The first air seal is mounted between the adjustably movable valve and the main body to prevent liquid gas from passing therebetween. The adjustably movable valve is in fluid communication with the gas outlet mechanism such that vaporized gas emitted from the absorbing member is discharged from the device from the gas outlet mechanism.

Abstract translation: 一种装置包括填充阀，套筒，吸收件和气体控制单元。 填充阀可以接合以填充液体气体。 套筒包括使液体气体能够在其中流动的流体通过部分。 吸收构件可以吸收液体气体并且设置在套筒中。 气体控制单元包括主体，气体入口和流量调节机构以及气体出口机构。 气体入口和流量调节机构包括可调节的阀和第一空气密封。 第一空气密封件安装在可调节阀和主体之间，以防止液体气体通过。 可调节移动阀与气体出口机构流体连通，使得从吸收构件发出的汽化气体从气体出口机构从装置排出。

公开(公告)号：USD670681S1

公开(公告)日：2012-11-13

申请号：US29407042

申请日：2011-11-22

Applicant: Chia-Yuan Chang ,  Ting-Han Huang ,  Kang-Wen Lin ,  Chih-Yin Lin ,  Ya-Chyi Chou ,  Kao-Yu Hsu

Designer： Chia-Yuan Chang ,  Ting-Han Huang ,  Kang-Wen Lin ,  Chih-Yin Lin ,  Ya-Chyi Chou ,  Kao-Yu Hsu

公开(公告)号：US20120224188A1

公开(公告)日：2012-09-06

申请号：US13409096

申请日：2012-02-29

Applicant: Yen-Yin Lin ,  Yuan-Yao Lin ,  Shi-Wei Zhu ,  An-Chung Chiang ,  Mang-Shiang Lee ,  Ching-Huei Wu

Inventor： Yen-Yin Lin ,  Yuan-Yao Lin ,  Shi-Wei Zhu ,  An-Chung Chiang ,  Mang-Shiang Lee ,  Ching-Huei Wu

IPC: G01B11/14

CPC classification number: G06F3/0421

Abstract: The present invention relates to a laser-optical position detecting module with a laser light source, comprising: laser mode conversing assembly, having a laser source capable of emitting a time-modulated laser beam; a laser mode conversing unit, used to expand the time-modulated laser beam to a two-dimension sensing plane; a drive control unit, adopted for driving the laser source to emit the time-modulated laser beam; and a detector matrix, used for detecting the. The laser mode conversing unit has a phase delay device and a passive optical device capable of reflecting the light; so that, through the laser mode conversing unit, the laser-optical position detecting module can expand the light emitted by the laser source to the two-dimension sensing plane without using any other mechanical scanning; moreover, it make the energy of the light emitted by the laser source not easily decays, so as to maintain the accuracy of light detection.

Abstract translation: 本发明涉及一种具有激光光源的激光光学位置检测模块，包括：激光模式转换组件，具有能够发射时间调制的激光束的激光源; 激光模式转换单元，用于将时间调制的激光束扩展到二维感测平面; 驱动控制单元，用于驱动激光源发射时间调制的激光束; 和用于检测的检测器矩阵。 激光模式转换单元具有能够反射光的相位延迟装置和无源光学装置; 使得通过激光模式转换单元，激光 - 光学位置检测模块可以将激光源发射的光扩展到二维感测平面而不使用任何其它机械扫描; 此外，它使得激光源发射的光的能量不容易衰减，从而保持光检测的准确性。