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111.
公开(公告)号:US11823972B2
公开(公告)日:2023-11-21
申请号:US16040746
申请日:2018-07-20
Applicant: Intel Corporation
Inventor: Feras Eid , Adel Elsherbini , Johanna Swan
IPC: H01L23/367 , H01L25/065 , H01L23/498 , H01L23/373
CPC classification number: H01L23/367 , H01L23/3737 , H01L23/49838 , H01L25/0657 , H01L2225/06513 , H01L2225/06517
Abstract: An integrated circuit assembly may be formed having a substrate, a first integrated circuit device electrically attached to the substrate, a second integrated circuit device electrically attached to the first integrated circuit device, and a heat dissipation device comprising at least one first thermally conductive structure proximate at least one of the first integrated circuit device, the second integrated circuit device, and the substrate; and a second thermally conductive structure disposed over the first thermally conductive structure(s), the first integrated circuit device, and the second integrated circuit device, wherein the first thermally conductive structure(s) have a lower electrical conductivity than an electrical conductivity of the second thermally conductive structure. The first thermally conductive structure(s) may be formed by an additive process or may be pre-formed and attached to at least one of the first integrated circuit device, the second integrated circuit device, and the substrate.
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112.
公开(公告)号:US11749649B2
公开(公告)日:2023-09-05
申请号:US17399185
申请日:2021-08-11
Applicant: Intel Corporation
Inventor: Adel Elsherbini , Johanna Swan , Shawna Liff , Patrick Morrow , Gerald Pasdast , Van Le
IPC: H01L25/065 , H01L23/538 , H01L23/522 , H01L23/00 , H01L25/00
CPC classification number: H01L25/0657 , H01L23/5226 , H01L23/5389 , H01L24/08 , H01L24/09 , H01L25/50 , H01L2224/08146 , H01L2224/0912
Abstract: Composite IC chip including a chiplet embedded within metallization levels of a host IC chip. The chiplet may include a device layer and one or more metallization layers interconnecting passive and/or active devices into chiplet circuitry. The host IC may include a device layer and one or more metallization layers interconnecting passive and/or active devices into host chip circuitry. Features of one of the chiplet metallization layers may be directly bonded to features of one of the host IC metallization layers, interconnecting the two circuitries into a composite circuitry. A dielectric material may be applied over the chiplet. The dielectric and chiplet may be thinned with a planarization process, and additional metallization layers fabricated over the chiplet and host chip, for example to form first level interconnect interfaces. The composite IC chip structure may be assembled into a package substantially as a monolithic IC chip.
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公开(公告)号:US11694951B2
公开(公告)日:2023-07-04
申请号:US17537406
申请日:2021-11-29
Applicant: Intel Corporation
Inventor: Veronica Strong , Aleksandar Aleksov , Brandon Rawlings , Johanna Swan
IPC: H01L29/40 , H01L23/498 , H01L21/48 , H01L23/48 , H01L23/538
CPC classification number: H01L23/49838 , H01L21/481 , H01L21/486 , H01L23/481 , H01L23/49827 , H01L23/5386
Abstract: A device package and a method of forming a device package are described. The device package includes an interposer with interconnects on an interconnect package layer and a conductive layer on the interposer. The device package has dies on the conductive layer, where the package layer includes a zero-misalignment two-via stack (ZM2VS) and a dielectric. The ZM2VS is directly coupled to the interconnect. The ZM2VS may further include the dielectric on a conductive pad, a first via on a first seed, and the first seed on a top surface of the conductive pad, where the first via extends through dielectric. The ZM2VS may also have a conductive trace on dielectric, and a second via on a second seed, the second seed is on the dielectric, where the conductive trace connects to first and second vias, where second via connects to an edge of conductive trace opposite from first via.
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114.
公开(公告)号:US11621208B2
公开(公告)日:2023-04-04
申请号:US16040748
申请日:2018-07-20
Applicant: Intel Corporation
Inventor: Feras Eid , Adel Elsherbini , Johanna Swan
IPC: H01L23/367 , H01L25/065 , H01L23/498
Abstract: An integrated circuit assembly may be formed having a substrate, a first integrated circuit device electrically attached to the substrate, a second integrated circuit device electrically attached to the first integrated circuit device, and a heat dissipation device comprising at least one first thermally conductive structure proximate at least one of the first integrated circuit device, the second integrated circuit device, and the substrate; and a second thermally conductive structure disposed over the first thermally conductive structure(s), the first integrated circuit device, and the second integrated circuit device, wherein the first thermally conductive structure(s) have a lower electrical conductivity than an electrical conductivity of the second thermally conductive structure. The first thermally conductive structure(s) may be formed by an additive process or may be pre-formed and attached to at least one of the first integrated circuit device, the second integrated circuit device, and the substrate.
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115.
公开(公告)号:US11581238B2
公开(公告)日:2023-02-14
申请号:US17318887
申请日:2021-05-12
Applicant: Intel Corporation
Inventor: Shawna Liff , Adel Elsherbini , Johanna Swan , Jimin Yao , Veronica Strong
IPC: H01L23/373 , H01L21/768 , H01L25/065 , H01L23/48
Abstract: A heat spreading material is integrated into a composite die structure including a first IC die having a first dielectric material and a first electrical interconnect structure, and a second IC die having a second dielectric material and a second electrical interconnect structure. The composite die structure may include a composite electrical interconnect structure comprising the first interconnect structure in direct contact with the second interconnect structure at a bond interface. The heat spreading material may be within at least a portion of a dielectric area through which the bond interface extends. The heat spreading material may be located within one or more dielectric materials surrounding the composite interconnect structure, and direct a flow of heat generated by one or more of the first and second IC dies.
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116.
公开(公告)号:US11551551B2
公开(公告)日:2023-01-10
申请号:US16233922
申请日:2018-12-27
Applicant: Intel Corporation
Inventor: Nadine Dabby , Johanna Swan , Annie Foong , Karla Saur , Hassnaa Moustafa , Rita H. Wouhaybi , Linda Hurd , Rajashree Baskaran
IPC: G08G1/0968 , H04W4/44 , G01C21/34 , G01C21/28 , G08G1/0962 , G08G1/0965 , G08G1/0967 , H04W4/024 , G08G1/09 , G05D1/00
Abstract: Techniques are disclosed herein for providing guidance for autonomous vehicles in areas of low network connectivity, such as rural areas. According to an embodiment, a guidance system receives a request to exchange data with a vehicle within a specified radius thereof over a wireless connection (e.g., a radio frequency protocol-based connection). The data is stored by the guidance system and is indicative of navigation information within the specified radius. The guidance system transmits the stored data to the vehicle. The guidance system also receives, from the vehicle, data indicative of navigation information for a path previously passed by the vehicle.
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公开(公告)号:US20220399249A1
公开(公告)日:2022-12-15
申请号:US17346895
申请日:2021-06-14
Applicant: Intel Corporation
Inventor: Georgios Dogiamis , Qiang Yu , Feras Eid , Adel Elsherbini , Kimin Jun , Johanna Swan , Shawna Liff
IPC: H01L23/473 , H01L23/13 , H01L23/538 , H05K7/20 , H01L25/065
Abstract: An integrated circuit (IC) package may be fabricated having an interposer, one or more microfluidic channels through the interposer, a first IC chip attached to a first side of the interposer, and a second IC chip attached to a second side of the interposer, where the first side of the interposer includes first bond pads coupled to first bond pads of the first IC chip, and the second side of the interposer includes second bond pads coupled to first bond pads of the second IC chip. In an embodiment of the present description, a liquid cooled three-dimensional IC (3DIC) package may be formed with the IC package, where at least two IC devices may be stacked with a liquid cooled interposer. In a further embodiment, the liquid cooled 3DIC package may be electrically attached to an electronic board. Other embodiments are disclosed and claimed.
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公开(公告)号:US11302599B2
公开(公告)日:2022-04-12
申请号:US15957437
申请日:2018-04-19
Applicant: Intel Corporation
Inventor: Feras Eid , Adel Elsherbini , Johanna Swan
IPC: H01L23/367 , H01L23/498 , H01L23/00 , H01L25/065 , H01L25/00 , H01L21/48 , H01L23/13
Abstract: A heat dissipation device may be formed as a thermally conductive structure having at least one thermal isolation structure extending at least partially through the thermally conductive structure. The heat dissipation device may be thermally connected to a plurality of integrated circuit devices, such that the at least one thermal isolation structure is positioned between at least two integrated circuit devices. The heat dissipation device allows for heat transfer away from each of the plurality of integrated circuit devices, such as in a z-direction within the thermally conductive structure, while substantially preventing heat transfer in either the x-direction and/or the y-direction within the thermally isolation structure, such that thermal cross-talk between integrated circuit devices is reduced.
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公开(公告)号:US20220037281A1
公开(公告)日:2022-02-03
申请号:US17500824
申请日:2021-10-13
Applicant: Intel Corporation
Inventor: Adel Elsherbini , Patrick Morrow , Johanna Swan , Shawna Liff , Mauro Kobrinksy , Van Le , Gerald Pasdast
IPC: H01L23/00 , H01L23/528 , H01L23/522 , H01L25/18 , H01L25/00 , H01L21/768 , H01L21/82 , H01L23/48
Abstract: A composite integrated circuit (IC) device structure comprising a host chip and a chiplet. The host chip comprises a first device layer and a first metallization layer. The chiplet comprises a second device layer and a second metallization layer that is interconnected to transistors of the second device layer. A top metallization layer comprising a plurality of first level interconnect (FLI) interfaces is over the chiplet and host chip. The chiplet is embedded between a first region of the first device layer and the top metallization layer. The first region of the first device layer is interconnected to the top metallization layer by one or more conductive vias extending through the second device layer or adjacent to an edge sidewall of the chiplet.
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公开(公告)号:US20210398895A1
公开(公告)日:2021-12-23
申请号:US16907797
申请日:2020-06-22
Applicant: Intel Corporation
Inventor: Adel Elsherbini , Feras Eid , Georgios Dogiamis , Beomseok Choi , Henning Braunisch , William Lambert , Krishna Bharath , Johanna Swan
IPC: H01L23/50 , H05K1/18 , H01L23/367 , H01L23/31 , H01L23/48 , H01L23/00 , H01L25/065 , H01L21/48 , H01L21/56 , H01L25/00
Abstract: An integrated circuit assembly may be fabricated having an electronic substrate, an integrated circuit device having a first surface, an opposing second surface, at least one side extending between the first surface and the second surface, and at least one through-substrate via extending into the integrated circuit device from the second surface, wherein the first surface of the integrated circuit device is electrically attached to the electronic substrate; and at least one power delivery route electrically attached to the second surface of the integrated circuit device and to the electronic substrate, wherein the at least one power delivery route is conformal to the side of the integrated circuit device and the first surface of the electronic substrate.
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