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    Electron gun, illumination apparatus using the electron gun, and electron beam exposure apparatus using the illumination apparatus
    125.
    发明授权
    Electron gun, illumination apparatus using the electron gun, and electron beam exposure apparatus using the illumination apparatus 失效
    电子枪，使用电子枪的照明装置和使用该照明装置的电子束曝光装置

    公开(公告)号：US06670620B1

    公开(公告)日：2003-12-30

    申请号：US09461835

    申请日：1999-12-16

    Applicant: Masahiko Okunuki

    Inventor： Masahiko Okunuki

    IPC: H01J3730

    CPC classification number: H01J37/063 ,  H01J3/029

    Abstract: An electron gun, having an electron source, a Wehnelt electrode, and acceleration electrodes, includes a control device for changing a field distribution formed by a first acceleration electrode of the acceleration electrodes to control characteristics of a final cross-over formed, by electrons from a first cross-over, at the final stage of the electric gun. The first cross-over is performed when the electrons emitted from the electron source are focused by the field distribution formed by the electron source, the Wehnelt electrode, and a second acceleration electrode of the acceleration electrodes.

    Abstract translation: 具有电子源，Wehnelt电极和加速电极的电子枪包括用于改变由加速电极的第一加速电极形成的场分布的控制装置，以控制形成的最终交叉的特性，由电子 在电动枪的最后阶段是第一次交叉。 当从电子源发射的电子被由电子源，Wehnelt电极和加速电极的第二加速电极形成的场分布聚焦时，执行第一次交叉。

    Field emission electron source, electron gun and cathode ray tube device using the same
    126.
    发明申请
    Field emission electron source, electron gun and cathode ray tube device using the same 失效
    场发射电子源，电子枪和阴极射线管装置使用

    公开(公告)号：US20030098410A1

    公开(公告)日：2003-05-29

    申请号：US10293539

    申请日：2002-11-12

    Applicant: Matsushita Electric Industrial Co., Ltd

    Inventor： Keisuke Koga ,  Toru Kawase ,  Masahide Yamauchi ,  Koji Fujii ,  Takashi Itoh

    IPC: H01J005/16

    CPC classification number: H01J3/021 ,  H01J3/029 ,  H01J29/46 ,  H01J29/481 ,  H01J29/488

    Abstract: A field emission electron source includes: a field emission array portion composed of an insulation layer with a plurality of apertures, which is formed on a substrate, an extraction electrode formed on the insulation layer, and a plurality of cathodes formed respectively on the substrate in the plurality of apertures; a cathode base for fixing the field emission array portion; and an electron lens portion composed of a plurality of electrode members having a function of accelerating and converging an electron beam emitted from the field emission array portion. An emission axis of the electron beam emitted from the field emission array portion has a predetermined angle with respect to an optical axis of the electron lens portion. Thus, the field emission array portion can be protected from impact caused by ions generated in the electron lens portion, thereby improving the life of a field emission electron source.

    Abstract translation: 场发射电子源包括：场致发射阵列部分，其由具有多个孔的绝缘层组成，形成在衬底上，形成在绝缘层上的引出电极和分别形成在衬底上的多个阴极 多个孔; 用于固定场致发射阵列部分的阴极基座; 以及电子透镜部分，其由具有加速和会聚从场发射阵列部分发射的电子束的功能的多个电极部件组成。 从场发射阵列部分发射的电子束的发射轴相对于电子透镜部分的光轴具有预定的角度。 因此，可以防止场发射阵列部分免受在电子透镜部分中产生的离子的影响，从而提高场发射电子源的寿命。

    Electron gun, cathode ray tube and image display device
    127.
    发明申请
    Electron gun, cathode ray tube and image display device 审中-公开
    电子枪，阴极射线管和图像显示装置

    公开(公告)号：US20020021075A1

    公开(公告)日：2002-02-21

    申请号：US09885009

    申请日：2001-06-21

    Inventor： Hirofumi Nakamura ,  Hideki Miyazaki ,  Keizo Mori ,  Kouji Shibusa

    IPC: H01J029/50

    CPC classification number: H01J3/029 ,  H01J29/488

    Abstract: To provide an electron gun that can improve the focus characteristics of a cathode ray tube by reducing the working area of the cathode, a cathode ray tube equipped with this electron gun that has favorable focus characteristics, and an image display device comprising this cathode ray tube that can achieve favorable images. An area on the electron emission surface of the cathode K that meets the beam hole (11A) of the first grid (11) forms an electron gun in closest proximity to the first grid (11). Provide a cathode ray tube equipped with this electron gun and further provide an image display device formed by this cathode raytube.

    Abstract translation: 为了提供能够通过减小阴极的工作面积来改善阴极射线管的聚焦特性的电子枪，具有良好的聚焦特性的装有该电子枪的阴极射线管和包括该阴极射线管的图像显示装置 可以实现有利的图像。 阴极K的与第一栅极（11）的光束孔（11A）相遇的电子发射表面上的区域形成最靠近第一格栅（11）的电子枪。 提供配备有该电子枪的阴极射线管，并进一步提供由该阴极射线管形成的图像显示装置。

    Electron beam gun
    128.
    发明授权
    Electron beam gun 失效
    电子束枪

    公开(公告)号：US6051917A

    公开(公告)日：2000-04-18

    申请号：US910129

    申请日：1997-08-12

    Applicant: Mamoru Nakasuji

    Inventor： Mamoru Nakasuji

    IPC: H01J37/06 ,  H01J3/02 ,  H01L21/027

    CPC classification number: H01J3/029 ,  H01J2223/065

    Abstract: Electron guns are disclosed that produce low-brightness and high-emittance electron beams that are suitable for use in an electron-beam reduction-lithography apparatus. A preferred embodiment comprises a cathode, a Wehnelt electrode, an anode, and at least one control electrode placed between the cathode and the anode. Each of these components defines a spherical surface all having a common center point and all thus being concentric with one another. During operation, the anode has a grounded electrical potential while the cathode and the Wehnelt electrode each have a potential of about -100 KV. If the applied voltage to the control electrode is adjusted within a range of -99 to -90 KV, the brightness can be controlled to within a range of 1.times.10.sup.3 to 2.times.10.sup.4 A/cm.sup.2.sr.

    Abstract translation: 公开了产生适用于电子束还原光刻设备的低亮度和高发射电子束的电子枪。 优选实施例包括阴极，Wehnelt电极，阳极以及放置在阴极和阳极之间的至少一个控制电极。 这些部件中的每一个都限定了一个全部具有公共中心点的球形表面，并且所有球面都彼此同心。 在操作期间，阳极具有接地电位，而阴极和Wehnelt电极各自具有约-100KV的电位。 如果将控制电极的施加电压调整在-99〜-90KV的范围内，则可以将亮度控制在1×103〜2×104A / cm2.sr的范围内。

    System making it possible to control the shape of a charged particle beam
    130.
    发明授权
    System making it possible to control the shape of a charged particle beam 失效
    系统使得可以控制带电粒子束的形状

    公开(公告)号：US5336973A

    公开(公告)日：1994-08-09

    申请号：US999227

    申请日：1992-12-31

    Applicant: Thierry Leroux ,  Christophe Py

    Inventor： Thierry Leroux ,  Christophe Py

    IPC: H01J1/304 ,  H01J3/02 ,  H01J3/18 ,  H01J3/30 ,  H01J29/46

    CPC classification number: H01J3/022 ,  H01J3/029

    Abstract: A system for controlling the shape of a charged particle beam. The particle beam is emitted from a source (58) of the said particles. Said source is associated with a collecting electrode which collects the particles. The system comprises at least one resistive zone (56) and at least two control electrodes (52, 54). The resistive zone and the control electrodes are arranged substantially at the same level as the source. The control electrodes are also placed on either side of the resistive zone and serve to polarize the latter. The electrical resistance profile of the resistive zone is chosen in such a way that it has the potential distribution so that it is possible to obtain the desired shape of the beam from the source when the control electrodes are appropriately polarized.

    Abstract translation: 一种用于控制带电粒子束形状的系统。 粒子束从所述粒子的源（58）发射。 所述源与收集颗粒的收集电极相关联。 该系统包括至少一个电阻区（56）和至少两个控制电极（52,54）。 电阻区和控制电极基本上设置在与源相同的水平。 控制电极也放置在电阻区的两侧，并用于使电极区域极化。 电阻区域的电阻分布以这样一种方式选择，使得其具有电势分布，使得当控制电极被适当地极化时，可以从源获得期望的光束形状。

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