Abstract:
A photocathode structure containing a photocathode material, comprising a plate of single crystal gallium indium phosphide having major surfaces and relative proportions of gallium and indium such that the lattice parameter thereof is substantially the same as that of said photocathode material, and, an epitaxial layer of photocathode material located on a first said major surface of said crystal, the thickness of said layer of photocathode material being of the order of the diffusion length of electrons therein and at least part of a second said major surface of the gallium indium phosphide plate being substantially free from contact by solid material.
Abstract:
An increase in the quantum efficiency of a III-V photocathode is achieved by doping its semiconductor material with an acceptor and nitrogen, a column-V isoelectronic element, that introduces a spatially localized energy level just below the conduction band similar to a donor level to which optical transitions can occur. This increases the absorption coefficient, .alpha., without compensation of the acceptor dopant. A layer of a suitable I-V, I-VI or I-VII compound is included as an activation layer on the electron emission side to lower the work function of the photocathode.
Abstract:
Transmission mode negative electron affinity gallium arsenide (GaAs) photthodes and dynodes with a technique for the fabrication thereof, utilizing multilayers of GaAs and gallium aluminum arsenide (GaAlAs) wherein the GaAs layers serve as the emitting layer and as an intermediate construction layer, and the GaAlAs layers serve as a passivating window and as an etch stop layer.
Abstract:
A photon sensing device utilizing a III-V negative electron affinity photthode grown on a window substrate support which simultaneously serves as a support and growth surface for the epitaxial growth of suitable cathode layers as well as the input window for the device.
Abstract:
A method of producing a tunnel emitter photocathode consisting of heating a semiconductor layer and then depositing a layer of aluminum oxide on one side thereof at a rapid rate and then baking out the wafer in a hydrogen gas atmosphere. After depositing electrical contacts on each side of the wafer, a metallic emitter layer is evaporated over the aluminum oxide layer with the metallic emitter layer treated with a low work function material such as cesium and oxygen to further increase the emission efficiency.
Abstract:
A gradient of potential energy was established in the active layer of a III-V photocathode for enhancing free electron diffusion toward the emissive surface of the cathode. The energy gradient was provided by decreasing the bandgap energy across the active layer which caused the conduction level to slope downwards from the substrate to the emissive surface through progressive changes in the concentration of the III-V elements forming the active layer. Alternatively, a nonuniform concentration of active layer dopant-heavy on the substrate side and light on the emissive side of the active layer-established a built-in electric field across the active layer. The graded bandgap and/or dopant levels promote free electron drift toward the outer surface of the active layer. Layers of cesium, cesium oxide, or both, were provided over the active layer to lower the work function of the photocathode emissive surface.