公开(公告)号：US11127586B2

公开(公告)日：2021-09-21

申请号：US16725975

申请日：2019-12-23

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Che-Cheng Chang ,  Chih-Han Lin ,  Horng-Huei Tseng

IPC: H01L21/02 ,  H01L29/78 ,  H01L29/66 ,  H01L21/306 ,  H01L29/06

Abstract: A method includes forming a dielectric layer over a fin structure, forming a dummy gate crossing over the dielectric layer, forming a spacer on a sidewall of the dummy gate, etching the dielectric layer and the fin structure, such that the dielectric layer and the fin structure are recessed from an outer sidewall of the spacer, and etching the fin structure, such that the fin structure is recessed from an end surface of the dielectric layer.

公开(公告)号：US11107813B2

公开(公告)日：2021-08-31

申请号：US16391173

申请日：2019-04-22

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chih-Han Lin

IPC: H01L27/092 ,  H01L21/8234 ,  H01L27/088 ,  H01L29/49 ,  H01L29/66 ,  H01L21/8238 ,  H01L21/3213

Abstract: A semiconductor device includes first and second Fin FETs and a separation plug made of an insulating material and disposed between the first and second Fin FETs. The first Fin FET includes a first fin structure extending in a first direction, a first gate dielectric formed over the first fin structure and a first gate electrode formed over the first gate dielectric and extending in a second direction perpendicular to the first direction. The second Fin FET includes a second fin structure, a second gate dielectric formed over the second fin structure and a second gate electrode formed over the first gate dielectric and extending in the second direction. When viewed from above, an end shape the separation plug has a concave curved shape, while an end of the first gate electrode abutting the separation plug has a convex curved shape.

公开(公告)号：US20210242093A1

公开(公告)日：2021-08-05

申请号：US16871514

申请日：2020-05-11

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shih-Yao Lin ,  Chih-Han Lin ,  Shu-Uei Jang ,  Ya-Yi Tsai ,  Shu-Yuan Ku

IPC: H01L21/8238 ,  H01L27/092 ,  H01L29/49 ,  H01L21/28 ,  H01L29/66

Abstract: A device includes a semiconductor substrate and a first gate stack over the semiconductor substrate, the first gate stack being between a first gate spacer and a second gate spacer. The device further includes a second gate stack over the semiconductor substrate between the first gate spacer and the second gate spacer and a dielectric material separating the first gate stack from the second gate stack. The dielectric material is at least partially between the first gate spacer and the second gate spacer, a first width of an upper portion of the dielectric material is greater than a second width of a lower portion of the dielectric material, and a third width of an upper portion of the first gate spacer is less than a fourth width of a lower portion of the first gate spacer.

公开(公告)号：US11018261B2

公开(公告)日：2021-05-25

申请号：US16886792

申请日：2020-05-29

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Cheng Chang ,  Chih-Han Lin ,  Horng-Huei Tseng

IPC: H01L29/76 ,  H01L29/78 ,  H01L29/66 ,  H01L29/06

Abstract: A substrate is patterned to form trenches and a semiconductor fin between the trenches. Insulators are formed in the trenches and a dielectric layer is formed to cover the semiconductor fin and the insulators. A dummy gate strip is formed on the dielectric layer. Spacers are formed on sidewalls of the dummy gate strip. The dummy gate strip and the dielectric layer underneath are removed until sidewalls of the spacers, a portion of the semiconductor fin and portions of the insulators are exposed. A second dielectric layer is selectively formed to cover the exposed portion of the semiconductor fin, wherein a thickness of the dielectric layer is smaller than a thickness of the second dielectric layer. A gate is formed between the spacers to cover the second dielectric layer, the sidewalls of the spacers and the exposed portions of the insulators.

公开(公告)号：US10998428B2

公开(公告)日：2021-05-04

申请号：US16550743

申请日：2019-08-26

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Cheng Chang ,  Chih-Han Lin ,  Wei-Chiang Hung ,  Wei-Hao Huang

IPC: H01L29/66 ,  H01L29/78 ,  H01L29/165 ,  H01L29/417 ,  H01L21/762 ,  H01L21/02 ,  H01L21/306 ,  H01L21/324 ,  H01L21/308 ,  H01L29/51 ,  H01L29/49

Abstract: Examples of an integrated circuit and a method for forming the integrated circuit are provided herein. In some examples, a method includes receiving a substrate that includes: a plurality of fins extending above a remainder of the substrate; a first region that includes a first fence region that contains a first subset of the plurality of fins; and a second region that includes a second fence region that contains a second subset of the plurality of fins. The first region has a first performance characteristic, and the second region has a second performance characteristic that is different from the first. Based on the first performance characteristic, the first subset of the plurality of fins is recessed to a first height, and based on the second performance characteristic, the second subset of the plurality of fins is recessed to a second height that is less than the first height.

公开(公告)号：US20210126110A1

公开(公告)日：2021-04-29

申请号：US16870429

申请日：2020-05-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shih-Yao Lin ,  Kuei-Yu Kao ,  Chen-Ping Chen ,  Chih-Han Lin

IPC: H01L29/66 ,  H01L21/762 ,  H01L29/78 ,  H01L21/8234 ,  H01L21/311 ,  H01L29/06 ,  H01L21/027 ,  H01L29/423 ,  H01L29/51 ,  H01L29/10 ,  H01L27/088

Abstract: A method includes simultaneously forming a first dummy gate stack and a second dummy gate stack on a first portion and a second portion of a protruding fin, simultaneously removing a first gate electrode of the first dummy gate stack and a second gate electrode of the second dummy gate stack to form a first trench and a second trench, respectively, forming an etching mask, wherein the etching mask fills the first trench and the second trench, patterning the etching mask to remove the etching mask from the first trench, removing a first dummy gate dielectric of the first dummy gate stack, with the etching mask protecting a second gate dielectric of the first dummy gate stack from being removed, and forming a first replacement gate stack and a second replacement gate stack in the first trench and the second trench, respectively.

公开(公告)号：US20210126109A1

公开(公告)日：2021-04-29

申请号：US16867867

申请日：2020-05-06

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shih-Yao Lin ,  Chih-Han Lin ,  Shu-Uei Jang ,  Ya-Yi Tsai ,  Shu-Yuan Ku

IPC: H01L29/66 ,  H01L21/8234 ,  H01L27/088

Abstract: A method includes forming a dummy gate stack, etching the dummy gate stack to form an opening, depositing a first dielectric layer extending into the opening, and depositing a second dielectric layer on the first dielectric layer and extending into the opening. A planarization process is then performed to form a gate isolation region including the first dielectric layer and the second dielectric layer. The dummy gate stack is then removed to form trenches on opposing sides of the gate isolation region. The method further includes performing a first etching process to remove sidewall portions of the first dielectric layer, performing a second etching process to thin the second dielectric layer, and forming replacement gates in the trenches.

公开(公告)号：US20210111119A1

公开(公告)日：2021-04-15

申请号：US17106766

申请日：2020-11-30

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Cheng Chang ,  Chih-Han Lin

IPC: H01L23/522 ,  H01L23/528 ,  H01L21/768 ,  H01L21/311 ,  H01L27/088 ,  H01L21/8234 ,  H01L21/288 ,  H01L23/532 ,  H01L21/027

Abstract: A semiconductor device includes a substrate, a bottom etch stop layer over the substrate, a middle etch stop layer over the bottom etch stop layer, and a top etch stop layer over the middle etch stop layer. The top, middle, and bottom etch stop layers include different material compositions from each other. The semiconductor device further includes a dielectric layer over the top etch stop layer and a via extending through the dielectric layer and the top, middle, and bottom etch stop layers. The via has a first sidewall in contact with the dielectric layer and slanted inwardly from top to bottom towards a center of the via and a second sidewall in contact with the bottom etch stop layer and slanted outwardly from top to bottom away from the center of the via.

公开(公告)号：US10854542B2

公开(公告)日：2020-12-01

申请号：US16713862

申请日：2019-12-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Cheng Chang ,  Chih-Han Lin

IPC: H01L23/522 ,  H01L23/528 ,  H01L21/768 ,  H01L21/311 ,  H01L27/088 ,  H01L21/8234 ,  H01L21/288 ,  H01L23/532 ,  H01L21/027 ,  H01L21/321 ,  H01L29/06

Abstract: A method includes providing a substrate, wherein the substrate includes a conductive feature in a top portion of the substrate; forming a buffer layer over the substrate; forming a dielectric layer over the buffer layer; performing a first etching process to form an opening in the dielectric layer, thereby exposing a top surface of the buffer layer; and performing a second etching process to extend the opening downwardly into the buffer layer, thereby exposing a top surface of the conductive feature, wherein the performing of the second etching process includes laterally enlarging a footing profile of the opening.

公开(公告)号：US10811506B2

公开(公告)日：2020-10-20

申请号：US16404017

申请日：2019-05-06

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Han Lin ,  Che-Cheng Chang ,  Horng-Huei Tseng

IPC: H01L21/02 ,  H01L29/423 ,  H01L21/28 ,  H01L29/49 ,  H01L29/66 ,  H01L29/40 ,  H01L29/51

Abstract: A method includes receiving a device having a substrate and a first dielectric layer surrounding a gate trench. The method further includes depositing a gate dielectric layer and a gate work function (WF) layer in the gate trench and forming a hard mask (HM) layer in a space in the gate trench and surrounded by the gate WF layer. The method further includes recessing the gate WF layer such that a top surface of the gate WF layer in the gate trench is below a top surface of the first dielectric layer. After the recessing of the gate WF layer, the method further includes removing the HM layer in the gate trench and depositing a metal layer in the gate trench. The metal layer is in physical contact with a sidewall surface of the gate WF layer that is deposited before the HM layer is formed.