Abstract:
In a nonvolatile memory cell having at least two floating gates, each floating gate (160) has an upward protruding portion. This portion can be formed as a spacer over a sidewall of the select gate (140). The spacer can be formed from a layer (160.2) deposited after the layer (160.1) which provides a lower portion of the floating gate. Alternatively, the upward protruding portion and the lower portion can be formed from the same layers or sub-layers all of which are present in both portions. The control gate (170) can be defined without photolithography. Other embodiments are also provided.
Abstract:
A control gate layer (170) for a nonvolatile memory cell is formed over a select gate (140). The control gate layer protrudes upward over the select gate. An auxiliary layer (1710) is formed over the control gate layer so as to expose a protruding portion of the control gate layer. The protruding portion is processed (e.g. oxidized) to form a protective layer (1720) selectively on the control gate layer but not on the auxiliary layer. The auxiliary layer is then removed. Then the control gate layer is etched selectively to the protective layer. The protruding portion of the control gate layer is not etched away because it is protected by the protective layer. This portion provides a self-aligned control gate. The protective layer can then be removed, and a conductive material (2920), e.g. metal silicide, can be formed selectively on the protruding portion of the control gate layer in a self-aligned manner to reduce the control gate resistance. Other embodiments are also provided.
Abstract:
In fabrication of a nonvolatile memory cell having two floating gates, one or more peripheral transistor gates are formed from the same layer (140) as the select gate. The gate dielectric (130) for these peripheral transistors and the gate dielectric (130) for the select gates are formed simultaneously. In a nonvolatile memory having a memory cell with two floating gates, the gate dielectric (130) for the peripheral transistors and the gate dielectric (130) for the select gates (140) have the same thickness.
Abstract:
In a nonvolatile memory, one or more peripheral transistor gates are formed from the same layer (140) as the select gate. The gate dielectric (130) for these peripheral transistors and the gate dielectric (130) for the select gates are formed simultaneously. In a nonvolatile memory, the gate dielectric (130) for the peripheral transistors and the gate dielectric (130) for the select gates (140) have the same thickness. Portions of the control gates (170) overlie the select gates.
Abstract:
A floating gate of a nonvolatile memory cell is formed from two conductive layers (410.1, 410.2). A dielectric (210) in substrate isolation regions and the first of the two conductive layers providing the floating gates (410.1) are formed so that the dielectric has an exposed sidewall. At least the top portion of the sidewall is exposed. Then some of the dielectric is removed from the exposed portions of the dielectric sidewalls to laterally recess the sidewalls. Then the second conductive layer (410.2) for the floating gates is formed. The recessed sidewalls of the dielectric allow the second conductive layer to expand laterally, thus increasing the capacitive coupling between the floating and control gates and improving the gate coupling ratio.
Abstract:
This invention provides a new method and system to control strategies of a combined fuel cell and battery pack power system to produce an efficient and cost-effective powertrain with acceptable drivability and low emissions. The method and system provide strategies for vehicle start-up, power load changes, and steady state driving conditions. The strategies reduce vehicle maintenance cost by increasing the battery service life and fuel efficiency. Further, the strategies reduce vehicle cost by reducing fuel cell engine size required by a hybrid electric vehicle while responding rapidly to load changes. The strategies also provide increased fuel efficiency by recovery, storage, and re-use of the vehicle kinetic energy normally dissipated as heat during braking.
Abstract:
An optical modulator that modulates light through the back side of a flip chip packaged integrated circuit die. In one embodiment, an optical modulator includes a p-n junction having a side wall that is substantially vertical or perpendicular relative to a surface of the integrated circuit die. A charged region is generated at the p-n junction and is modulated in response to an electrical signal of the integrated circuit die. An optical beam is directed through the back side, of the semiconductor substrate and through the charged region along the side wall p-n junction. The optical beam is deflected off a deflector back through the charged region along the side wall back out the back side. In one embodiment, the side wall p-n junction is provided with a metal oxide semiconductor (MOS) gate structure. In another embodiment, the side wall p-n junction is provided by an n− (or p−) well in a p− (or n−) epitaxy layer of the semiconductor substrate. In one embodiment, the well is a well ring structure. In another embodiment, there are a plurality of wells periodically located in the epitaxy layer of the semiconductor substrate. In one embodiment, the well or plurality of wells are surrounded with an optical beam confinement structure.
Abstract:
A device for confining an optical beam in an optical switch. In one embodiment, the disclosed optical switch includes an optical switching device disposed between an optical input port and an optical output port in a semiconductor substrate layer of an integrated circuit die. The semiconductor substrate layer is disposed between a plurality of optical confinement layers such that an optical beam is confined to remain within the semiconductor substrate layer until exiting through the optical output port. In one embodiment, a plurality of semiconductor substrate layers are included in the optical switch. Each of the semiconductor substrate layers is disposed between optical confinement layers such that optical beams passing through the semiconductor substrate layers are confined to remain within the semiconductor substrate layers until exiting through respective optical output ports. In one embodiment, at least one optical switching device is disposed in each of the plurality of semiconductor substrate layers. In one embodiment, integrated circuitry such as driver circuitry, controller circuitry, logic circuitry, coder-decoder circuitry, microprocessor circuitry or the like is included in at least one of the semiconductor substrate layers.