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公开(公告)号:US11211290B2
公开(公告)日:2021-12-28
申请号:US16820961
申请日:2020-03-17
Applicant: QUALCOMM Incorporated
Inventor: Jonghae Kim , Jin-Su Ko , Beomsup Kim , Periannan Chidambaram
IPC: H01L23/522 , H01L21/768 , H01L49/02
Abstract: Certain aspects of the present disclosure are generally directed to techniques and apparatus for adjusting capacitance in one or more metal-insulator-metal (MIM) capacitors in an effort to reduce capacitance variation between semiconductor devices and improve yield during fabrication. One example method for fabricating a semiconductor device generally includes measuring a capacitance value of a MIM capacitor of the semiconductor device, determining the measured capacitance value of the MIM capacitor is above a target capacitance value for the MIM capacitor, and selectively rupturing a set of connections in the MIM capacitor based on the measured capacitance value. Selectively rupturing the set of connections in the MIM capacitor may reduce the capacitance value of the MIM capacitor to a value approximately that of the target capacitance value.
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182.
公开(公告)号:US20210335738A1
公开(公告)日:2021-10-28
申请号:US16856132
申请日:2020-04-23
Applicant: QUALCOMM Incorporated
Inventor: Je-Hsiung Lan , Jonghae Kim , Jinseong Kim , Periannan Chidambaram
IPC: H01L23/00 , H01L49/02 , H01L23/48 , H01L21/768 , H01L27/01 , H01L25/18 , H01L25/00 , H01L21/288 , H01L21/311 , H01L21/56
Abstract: A capacitor interposer layer (CIL) in a die-to-wafer three dimensional integrated circuit (3DIC) and methods of forming the same are disclosed. A CIL is formed in a wafer under a powder distribution network (PDN) die area of a chip. Electrical connections between the wafer and the chip are formed using a copper-to-copper bond. This placement allows the capacitor to be close to the PDN die area within the chip to reduce equivalent series resistance (ESR) and equivalent series inductance (ESL), while permitting a relatively low profile device with reduced PDN voltage droop.
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183.
公开(公告)号:US11158590B1
公开(公告)日:2021-10-26
申请号:US16856132
申请日:2020-04-23
Applicant: QUALCOMM Incorporated
Inventor: Je-Hsiung Lan , Jonghae Kim , Jinseong Kim , Periannan Chidambaram
IPC: H01L23/00 , H01L49/02 , H01L23/48 , H01L21/768 , H01L27/01 , H01L25/18 , H01L25/00 , H01L21/288 , H01L21/311 , H01L21/56
Abstract: A capacitor interposer layer (CIL) in a die-to-wafer three dimensional integrated circuit (3DIC) and methods of forming the same are disclosed. A CIL is formed in a wafer under a power distribution network (PDN) die area of a chip. Electrical connections between the wafer and the chip are formed using a copper-to-copper bond. This placement allows the capacitor to be close to the PDN die area within the chip to reduce equivalent series resistance (ESR) and equivalent series inductance (ESL), while permitting a relatively low profile device with reduced PDN voltage droop.
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184.
公开(公告)号:US11145768B2
公开(公告)日:2021-10-12
申请号:US16782865
申请日:2020-02-05
Applicant: QUALCOMM Incorporated
Inventor: Jonghae Kim , Periannan Chidambaram
IPC: H01L29/66 , H01L29/94 , H01L23/522 , H01L27/08 , H01L21/768
Abstract: Certain aspects of the present disclosure generally relate to a capacitive element. One example capacitive element generally includes a substrate, a plurality of trench capacitors, an electrically conductive via, a first electrically conductive contact, and a second electrically conductive contact. The trench capacitors intersect the substrate. The electrically conductive via intersects the substrate and is disposed adjacent to at least one of the trench capacitors. The first electrically conductive contact is disposed above the substrate, and the second electrically conductive contact is disposed below the substrate and electrically coupled to the plurality of trench capacitors through the electrically conductive via.
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公开(公告)号:US11101228B1
公开(公告)日:2021-08-24
申请号:US16789863
申请日:2020-02-13
Applicant: QUALCOMM Incorporated
Inventor: Jonghae Kim , Milind Shah , Periannan Chidambaram
IPC: H01L23/00
Abstract: Aspects of the present disclosure provide an integrated circuit package having an inductive element with a magnetic core. An example integrated circuit package generally includes a semiconductor die, a redistribution layer, and a magnetic core. The semiconductor die includes a metal layer having first conductive traces and conductive pillars coupled to and extending from the metal layer. The redistribution layer is disposed below the semiconductor die and includes second conductive traces. A portion of the first conductive traces, a portion of the conductive pillars, and a portion of the second conductive traces are arranged to form an inductive element disposed below a portion of the semiconductor die. The magnetic core is disposed in the inductive element.
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公开(公告)号:US10944379B2
公开(公告)日:2021-03-09
申请号:US15379392
申请日:2016-12-14
Applicant: QUALCOMM Incorporated
Inventor: David Francis Berdy , Changhan Hobie Yun , Shiqun Gu , Niranjan Sunil Mudakatte , Mario Francisco Velez , Chengjie Zuo , Jonghae Kim
Abstract: An integrated radio frequency (RF) circuit combines complementary features of passive devices and acoustic filters and includes a first die, a second die, and a third die. The first die includes a substrate having one or more passive devices. The second die includes a first acoustic filter. The second die is stacked and coupled to a first surface of the first die. The third die includes a second acoustic filter. The third die is stacked and coupled to a second surface opposite the first surface of the first die.
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公开(公告)号:US10607980B2
公开(公告)日:2020-03-31
申请号:US15861140
申请日:2018-01-03
Applicant: QUALCOMM Incorporated
Inventor: Je-Hsiung Jeffrey Lan , Niranjan Sunil Mudakatte , Changhan Hobie Yun , Daeik Daniel Kim , Chengjie Zuo , David Francis Berdy , Mario Francisco Velez , Jonghae Kim
IPC: H01L27/01 , H01L23/15 , H01L23/522 , H01L49/02 , H01L23/498 , H01L21/48 , H01G2/02 , H01G4/005
Abstract: A device includes a glass substrate and a capacitor. The capacitor includes a first metal coupled to a first electrode, a dielectric structure, and a via structure comprising a second electrode of the capacitor. The first metal structure is separated from the via structure by the dielectric structure.
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公开(公告)号:US10354795B2
公开(公告)日:2019-07-16
申请号:US15242007
申请日:2016-08-19
Applicant: QUALCOMM Incorporated
Inventor: Daeik Daniel Kim , Chengjie Zuo , Changhan Hobie Yun , Mario Francisco Velez , Robert Paul Mikulka , Xiangdong Zhang , Jonghae Kim , Je-Hsiung Lan
Abstract: A method includes forming a first conductive spiral and a second conductive spiral of a spiral inductor coupled to a substrate. The second conductive spiral overlays the first conductive spiral. A first portion of an innermost turn of the spiral inductor has a first thickness in a direction perpendicular to the substrate. The first portion of the innermost turn includes a first portion of the first conductive spiral and does not include the second conductive spiral. A second portion of the innermost turn includes a first portion of the second conductive spiral. A portion of an outermost turn of the spiral inductor has a second thickness in the direction perpendicular to the substrate. The second thickness is greater than the first thickness. The portion of the outermost turn includes a second portion of the first conductive spiral and a second portion of the second conductive spiral.
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公开(公告)号:US10290414B2
公开(公告)日:2019-05-14
申请号:US14841132
申请日:2015-08-31
Applicant: QUALCOMM Incorporated
Inventor: Changhan Hobie Yun , Mario Francisco Velez , Chengjie Zuo , Daeik Daniel Kim , David Francis Berdy , Je-Hsiung Jeffrey Lan , Jonghae Kim , Niranjan Sunil Mudakatte , Robert Paul Mikulka
IPC: H01F5/00 , H01F27/28 , H01F27/245 , H01F41/14 , H01F41/04 , H01F17/00 , H01F41/32 , H01L23/64 , H05K1/16
Abstract: A substrate includes a first dielectric layer, a magnetic core at least partially in the first dielectric layer, where the magnetic core comprises a first non-horizontal thin film magnetic (TFM) layer. The substrate also includes a first inductor that includes a plurality of first interconnects, where the first inductor is positioned in the substrate to at least partially surround the magnetic core. The magnetic core may further include a second non-horizontal thin film magnetic (TFM) layer. The magnetic core may further include a core layer. The magnetic core may further include a third thin film magnetic (TFM) layer, and a fourth thin film magnetic (TFM) layer that is substantially parallel to the third thin film magnetic (TFM) layer.
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公开(公告)号:US10249580B2
公开(公告)日:2019-04-02
申请号:US15190158
申请日:2016-06-22
Applicant: QUALCOMM Incorporated
Inventor: Daeik Daniel Kim , Changhan Hobie Yun , David Francis Berdy , Chengjie Zuo , Mario Francisco Velez , Jonghae Kim
IPC: H01L23/64 , H01F41/04 , H01L23/522 , H01L23/498 , H01L23/538 , H01L25/16 , H01L27/08
Abstract: In conventional device packages, separate standalone inductors are provided and mounted on an interposer substrate along with a die. Separate inductors reduce integration density, decrease flexibility, increase footprint, and generally increase costs. To address such disadvantages, it is proposed to provide a part of an inductor in a substrate below a die. The proposed stacked substrate inductor may include a first inductor in a first substrate, a second inductor in a second a second substrate stacked on the first substrate, and an inductor interconnect coupling the first and second inductors. The core regions of the first and second inductors may overlap with each other at least partially. The proposed stacked substrate inductor may enhance integration density, increase flexibility, decrease footprint, and/or reduce costs.
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