公开(公告)号：US20090091728A1

公开(公告)日：2009-04-09

申请号：US11864423

申请日：2007-09-28

申请人： Alexander EPPLE

发明人： Alexander EPPLE

IPC分类号： G03B27/54 ,  G02B17/08

CPC分类号： G02B17/08 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70341

摘要： A catadioptric projection objective has a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA≧1.35 with electromagnetic radiation defining an operating wavelength λ. The optical elements form a first objective part configured to image the pattern from the object surface into a first intermediate image, a second objective part configured to image the first intermediate image into a second intermediate image, the second objective part including a concave mirror having a reflective mirror surface positioned at or close to a pupil surface; and a third objective part configured to image the second intermediate image into the image surface. A first deflecting mirror is arranged to deflect radiation from the object surface towards the concave mirror, and a second deflecting mirror is arranged to deflect radiation from the concave mirror towards the image surface such that the image surface is parallel to the object surface. A geometrical distance L between the object surface and the image surface is smaller than or equal to 1950 mm.

摘要翻译： 反折射投影物镜具有沿着光轴布置的多个光学元件，用于将物体的物体表面中的物场的图案成像到图像侧数值孔径NA处的物镜的图像表面区域中的图像场 > = 1.35，其中电磁辐射限定了工作波长λ。 所述光学元件形成第一物镜部分，被配置为将所述图案从所述物体表面成像为第一中间图像;第二物镜部分，被配置为将所述第一中间图像成像为第二中间图像，所述第二物镜部分包括凹面镜， 位于或靠近瞳孔表面的反射镜表面; 以及构造成将所述第二中间图像成像到所述图像表面中的第三目标部分。 第一偏转镜布置成将来自物体表面的辐射偏转到凹面镜，并且布置第二偏转镜以将来自凹面镜的辐射偏转到图像表面，使得图像表面平行于物体表面。 物体表面和图像表面之间的几何距离L小于或等于1950mm。

公开(公告)号：US20080297889A1

公开(公告)日：2008-12-04

申请号：US12184818

申请日：2008-08-01

申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

IPC分类号： G02B17/08

CPC分类号： G02B17/0804 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0844 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

公开(公告)号：US20080174858A1

公开(公告)日：2008-07-24

申请号：US12014496

申请日：2008-01-15

申请人： Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

发明人： Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

IPC分类号： G02B27/18

CPC分类号： G02B17/0844 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70308

摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

摘要翻译： 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。

公开(公告)号：US20070258134A1

公开(公告)日：2007-11-08

申请号：US10571267

申请日：2004-07-14

申请人： Hans-Juergen Rostalski ,  Alexander Epple ,  Aurelian Dodoc ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Joerg Schultz ,  Franz-Josef Stickel ,  Wolfgang Singer ,  Joachim Wietzorrek

发明人： Hans-Juergen Rostalski ,  Alexander Epple ,  Aurelian Dodoc ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Joerg Schultz ,  Franz-Josef Stickel ,  Wolfgang Singer ,  Joachim Wietzorrek

IPC分类号： G02B17/00

CPC分类号： G03F7/70066 ,  G03F7/70241

摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.

摘要翻译： 用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。 特别是可以涉及在照明系统中使用的投影物镜或中继物镜。 成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。 至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。 对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

公开(公告)号：US20070236674A1

公开(公告)日：2007-10-11

申请号：US11653366

申请日：2007-01-16

申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Buenau ,  Hans-Juergen Mann ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Buenau ,  Hans-Juergen Mann ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

IPC分类号： G02B17/08 ,  G03F7/20

CPC分类号： G02B17/0816 ,  G02B13/16 ,  G02B13/22 ,  G02B17/08 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0892 ,  G02B21/02 ,  G02B21/33 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径D max max，最大图像场高度Y'和像侧数值孔径NA; 其中COMP1 = D最大/（Y'NANA 2），并且其中条件COMP1 <10成立。

公开(公告)号：US20070165198A1

公开(公告)日：2007-07-19

申请号：US10597806

申请日：2004-12-27

申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

IPC分类号： G03B27/00

CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： A projection objective of a microlithographic projection exposure apparatus (110) is designed for immersion operation in which an immersion liquid (134) adjoins a photosensitive layer (126). The refractive index of the immersion liquid is greater than the refractive index of a medium (L5; 142; L205; LL7; LL8; LL9). that adjoins the immersion liquid on the object side of the projection objective (120; 120′; 120″). The projection objective is designed such that the immersion liquid (134) is convexly curved towards the object plane (122) during immersion operation.

摘要翻译： 微光刻投影曝光装置（110）的投影物镜被设计用于浸没操作，其中浸没液体（134）邻接感光层（126）。 浸没液的折射率大于介质的折射率（L 5; 142; L 205; LL 7; LL 8; LL 9）。 其邻接在投影物镜（120; 120'; 120“）的物体侧的浸没液体。 投影物镜被设计成使得浸入液体（134）在浸入操作期间朝向物平面（122）凸形弯曲。

公开(公告)号：US20070109659A1

公开(公告)日：2007-05-17

申请号：US11649274

申请日：2007-01-04

申请人： Hans-Juergen Rostalski ,  Aurelian Dodoc ,  Alexander Epple ,  Helmut Beierl

发明人： Hans-Juergen Rostalski ,  Aurelian Dodoc ,  Alexander Epple ,  Helmut Beierl

IPC分类号： G02B3/00

CPC分类号： G03F7/70341 ,  G02B13/143 ,  G02B13/18 ,  G02B15/177 ,  G02B21/33 ,  G02B27/0025 ,  G03F7/70241

摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.

公开(公告)号：US07209292B2

公开(公告)日：2007-04-24

申请号：US10448339

申请日：2003-05-30

申请人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

发明人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

IPC分类号： G02B3/00 ,  G02B15/02 ,  G02B27/02

CPC分类号： G03F7/70308 ,  G03F7/70258 ,  G03F7/70341

摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.

摘要翻译： 调整投影物镜的方法允许在浸入构型和干构型之间调节投影物镜。 投影物镜包括沿其光轴布置的光学元件，其包括在物平面之后的第一组元件和位于第一组之后的最后一个光学元件，其位于图像平面附近。 最后一个光学元件限定投影物镜的出射表面，该出射表面设置在距离像平面的工作距离处。 最后的光学元件基本上没有屈光力并且没有或仅有微小的曲率。 该方法包括通过引入或去除浸没介质来改变最后一个光学元件的厚度，改变出射表面和图像平面之间的空间的折射率，以及轴向移动最后一个光学元件以设定工作距离。

公开(公告)号：US07190530B2

公开(公告)日：2007-03-13

申请号：US11356525

申请日：2006-02-16

申请人： Hans-Jurgen Mann ,  Russell Hudyma ,  Alexander Epple

发明人： Hans-Jurgen Mann ,  Russell Hudyma ,  Alexander Epple

IPC分类号： G02B17/00

CPC分类号： G02B17/0892 ,  G02B17/0844 ,  G02B17/0856 ,  G03F7/70225

摘要： According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.

摘要翻译： 根据一个示例性实施例，提供了一种投影物镜，并且包括至少两个非平面（弯曲）反射镜，其中，沿着光线定义的下一个至最后的非平面镜与最后的非平面镜之间的轴向距离 路径大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。 在一个示例性实施例中，第一折射表面与单遍型透镜相关联。 当前目标形成具有至少约0.80或更高（例如0.95）的数值孔径的图像。 优选地，该目的不包括折叠反射镜，并且在两个反射镜之间不存在中间图像，以及物镜的瞳孔没有遮蔽。

公开(公告)号：US07046459B1

公开(公告)日：2006-05-16

申请号：US10869943

申请日：2004-06-18

申请人： David R. Shafer ,  Alexander Epple

发明人： David R. Shafer ,  Alexander Epple

IPC分类号： G02B17/00

CPC分类号： G02B17/08 ,  G02B17/0892

摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane while creating a real intermediate image, having a catadioptric first lens section having a concave mirror and a beam-deflection device, as well as a dioptric second lens section that follows the catadioptric lens section, between its object plane and image plane. The beam-deflection device deflects radiation coming from the object plane to the concave mirror. Positive refractive power is arranged following the first reflective surface, between the latter and the concave mirror, within an optical near-field of the object plane, within which the height of the principal ray of the outermost field point of radiation coming from the object exceeds the marginal-ray height. The intermediate image is arranged prior to light which forms the intermediate image being reflected by a second reflective surface that is provided for the purpose of allowing arranging the object plane and image plane such that they will be parallel to one another.

摘要翻译： 一种反射折射投影透镜，用于对构成物体平面的图案进行成像，同时产生具有凹面镜和光束偏转装置的反射折射式第一透镜部分的真实中间图像以及跟随反射折射透镜的屈光度第二透镜部分 在物体平面和图像平面之间。 光束偏转装置将来自物体平面的辐射偏转到凹面镜。 在物平面的光学近场内，在第一反射表面之间，后者和凹面镜之间布置正屈光力，其中来自物体的最外面的辐射场点的主光线的高度超过 边缘射线高度。 中间图像被布置在光之前，其形成由被设置用于允许布置物平面和图像平面以使得它们彼此平行的目的而被第二反射表面反射的中间图像。