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公开(公告)号：US6002553A
公开(公告)日：1999-12-14
申请号：US202991
申请日：1994-02-28
CPC分类号： B82Y25/00 , B82Y10/00 , G01R33/093 , G11B5/3903 , H01F10/325 , H01F10/3281 , G11B2005/3996 , G11B5/09
摘要： A magnetoresistive sensor element with a three-dimensional micro-architecture is capable of significantly improved sensitivity and highly localized measurement of magnetic fields. The sensor is formed of a multilayer film of alternately magnetic and nonmagnetic materials. The sensor is optimally operated in a current perpendicular to plane mode. The sensor is useful in magnetic read/write heads, for high density magnetic information storage and retrieval.
摘要翻译： 具有三维微架构的磁阻传感器元件能够显着改善磁场的灵敏度和高度局部化的测量。 传感器由交替磁性和非磁性材料的多层膜形成。 传感器在垂直于平面模式的电流中最佳运行。 该传感器可用于磁读/写磁头，用于高密度磁信息存储和检索。
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12.发明授权
公开(公告)号：US5958605A
公开(公告)日：1999-09-28
申请号：US969411
申请日：1997-11-10
CPC分类号： B82Y10/00 , G02B1/105 , G02B5/283 , G03F7/70958 , G21K1/062 , Y10T428/12576
摘要： A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.
摘要翻译： 钝化大衣双层用于极紫外（EUV）或软X射线应用的多层反射涂层，以防止多层涂层的氧化和腐蚀，从而提高EUV光学性能。 外涂层双层包含至少一层抵抗氧化和腐蚀的元素或复合材料的顶层之下的硅或铍层。 顶层材料包括碳，钯，碳化物，硼化物，氮化物和氧化物。 构成外涂层双层的两层的厚度被优化以在操作的波长范围产生最高的反射率。 包括三层或更多层的保护性外涂层系统也是可能的。
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公开(公告)号：US10775308B2
公开(公告)日：2020-09-15
申请号：US11844551
申请日：2007-08-24
申请人： Daniel G. Stearns , Bradley W. Rice
发明人： Daniel G. Stearns , Bradley W. Rice
摘要： Disclosed are apparatus and methods for determining accurate optical property values of turbid media. In one embodiment, the method includes (a) providing a light source, having a first wavelength and a known illumination power, sequentially at a plurality of specific illumination positions on a first surface of the specimen; (b) for each specific position of the light source, obtaining light emission measurements from a second surface of the specimen that is opposite the first surface, wherein the light emission measurements are obtained for a plurality of surface positions of the second surface; and (c) for each specific illumination position of the light source at the first surface of the specimen, determining one or more optical properties for the specimen based on the specific illumination position of the light source, the first wavelength of the light source, the known illumination power of the light source, and the obtained light emission measurements for such each specific illumination position. The optical properties for the plurality of specific illumination positions of the light source are individually determined for each specific illumination position of the light source.
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公开(公告)号：US08825140B2
公开(公告)日：2014-09-02
申请号：US13397518
申请日：2012-02-15
IPC分类号： A61B6/00
CPC分类号： G01N21/6456 , G01N21/4795 , G01N21/6428
摘要： A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.
摘要翻译： 公开了一种调查受试者中发光源的位置和尺寸的方法。 在实施该方法时，首先通过用光电检测器件从第一个角度测量光源（i）来源于发光源，（ii）穿过受试者的混浊生物组织，以及 （iii）从对象的感兴趣的第一表面区域发射。 光强度曲线与基于参数的生物光子函数匹配，以估计诸如深度和大小的函数参数。 使用除第一测量光强度分布之外的数据来精确地确定如此确定的参数，以获得对象中源的近似深度和大小。 还公开了一种用于执行该方法的装置。
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公开(公告)号：US07860549B2
公开(公告)日：2010-12-28
申请号：US12569842
申请日：2009-09-29
CPC分类号： G01N21/763 , A61K49/0013 , G01B9/02004 , G01B9/0203 , G01B9/02041 , G01B11/24 , G01B11/2518 , G01N21/6456 , H04N13/204 , H04N13/25 , H04N13/271
摘要： The present invention provides systems and methods for obtaining a three-dimensional (3D) representation of one or more light sources inside a sample, such as a mammal. Mammalian tissue is a turbid medium, meaning that photons are both absorbed and scattered as they propagate through tissue. In the case where scattering is large compared with absorption, such as red to near-infrared light passing through tissue, the transport of light within the sample is described by diffusion theory. Using imaging data and computer-implemented photon diffusion models, embodiments of the present invention produce a 3D representation of the light sources inside a sample, such as a 3D location, size, and brightness of such light sources.
摘要翻译： 本发明提供用于获得样品（例如哺乳动物）内的一个或多个光源的三维（3D）表示的系统和方法。 哺乳动物组织是一种混浊的培养基，这意味着光子在通过组织传播时被吸收和分散。 在与吸收相比散射大的情况下，例如通过组织的红色至近红外光，通过扩散理论描述样品内的光的传输。 使用成像数据和计算机实现的光子扩散模型，本发明的实施例产生样品内的光源的3D表示，例如这种光源的3D位置，尺寸和亮度。
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公开(公告)号：US07616985B2
公开(公告)日：2009-11-10
申请号：US10606976
申请日：2003-06-25
CPC分类号： G01N21/763 , A61K49/0013 , G01B9/02004 , G01B9/0203 , G01B9/02041 , G01B11/24 , G01B11/2518 , G01N21/6456 , H04N13/204 , H04N13/25 , H04N13/271
摘要： The present invention provides systems and methods for obtaining a three-dimensional (3D) representation of one or more light sources inside a sample, such as a mammal. Mammalian tissue is a turbid medium, meaning that photons are both absorbed and scattered as they propagate through tissue. In the case where scattering is large compared with absorption, such as red to near-infrared light passing through tissue, the transport of light within the sample is described by diffusion theory. Using imaging data and computer-implemented photon diffusion models, embodiments of the present invention produce a 3D representation of the light sources inside a sample, such as a 3D location, size, and brightness of such light sources.
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17.发明授权Method and apparatus for determining target depth, brightness and size within a body region 有权用于确定身体区域内的目标深度，亮度和尺寸的方法和装置公开(公告)号：US07403812B2
公开(公告)日：2008-07-22
申请号：US10151463
申请日：2002-05-17
IPC分类号： A61B6/00
CPC分类号： G01N21/6456 , G01N21/4795 , G01N21/6428
摘要： A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.
摘要翻译： 公开了一种调查受试者中发光源的位置和尺寸的方法。 在实施该方法时，首先通过用光电检测器件从第一个角度测量光源（i）来源于发光源，（ii）穿过受试者的混浊生物组织，以及 （iii）从对象的感兴趣的第一表面区域发射。 光强度曲线与基于参数的生物光子函数匹配，以估计诸如深度和大小的函数参数。 使用除第一测量光强度分布之外的数据来精确地确定如此确定的参数，以获得对象中源的近似深度和大小。 还公开了一种用于执行该方法的装置。
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18.发明授权公开(公告)号：US07022435B2
公开(公告)日：2006-04-04
申请号：US10256454
申请日：2002-09-27
IPC分类号： G01F9/00
CPC分类号： G03F7/70283 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/30
摘要： A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.
摘要翻译： 提供了一种制造EUV相移掩模的方法，其包括在其上沉积具有复值反射率的薄膜多层涂层的基底。 将吸收层或缓冲层附着到薄膜多层上，改变薄膜多层涂层的厚度，以便在复值反射率中引入直接调制以产生相移特征。
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19.发明授权Method to repair localized amplitude defects in a EUV lithography mask blank 有权在EUV光刻掩模板中修复局部幅度缺陷的方法公开(公告)号：US06967168B2
公开(公告)日：2005-11-22
申请号：US09896722
申请日：2001-06-29
摘要： A method and apparatus are provided for the repair of an amplitude defect in a multilayer coating. A significant number of layers underneath the amplitude defect are undamaged. The repair technique restores the local reflectivity of the coating by physically removing the defect and leaving a wide, shallow crater that exposes the underlying intact layers. The particle, pit or scratch is first removed the remaining damaged region is etched away without disturbing the intact underlying layers.
摘要翻译： 提供了一种用于修复多层涂层中的振幅缺陷的方法和装置。 振幅缺陷下方的相当数量的层没有损坏。 修复技术通过物理去除缺陷并留下暴露下面完整层的宽而浅的凹坑来恢复涂层的局部反射率。 首先去除颗粒，凹坑或划痕，剩余的损伤区域被蚀刻掉，而不会干扰完整的下层。
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20.发明授权Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography 有权修复用于极紫外光刻的多层涂层掩模版坯料中的局部缺陷公开(公告)号：US06821682B1
公开(公告)日：2004-11-23
申请号：US09669390
申请日：2000-09-26
IPC分类号： G03F900
CPC分类号： G02B5/285 , B82Y10/00 , B82Y40/00 , G02B5/0891 , G02B27/32 , G03F1/24 , G03F1/72 , G21K1/062 , G21K2201/067
摘要： A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.
摘要翻译： 提供了一种用于修复分层到用于极紫外光刻（EUVL）系统的掩模版坯料上的多层涂层中的缺陷的方法。 使用高横向空间分辨率，能量沉积在缺陷附近的多层涂层中。 这可以使用聚焦电子束，聚焦离子束或聚焦电磁辐射来实现。 吸收的能量将导致膜的结构改性，产生膜厚度的局部变化。 通过调节能量剂量可以以亚纳米精度控制膜厚的变化。 厚度变化的横向空间分辨率由能量沉积的定位来控制。 局部调整膜厚以校正反射场的扰动。 例如，当结构改性是局部薄膜收缩时，缺陷的修复包括使平坦化的墩或扩展凹陷的侧面。
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