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    COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPOLYMERS AND PROCESSES THEREOF
    13.
    发明申请
    COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPOLYMERS AND PROCESSES THEREOF 有权
    用于方向自组装块状共聚物的中性层组成及其工艺

    公开(公告)号：US20140193754A1

    公开(公告)日：2014-07-10

    申请号：US14180848

    申请日：2014-02-14

    申请人： Hengpeng WU ,  Yi CAO ,  SungEun HONG ,  Jian YIN ,  Margareta PAUNESCU ,  Mark O. NEISSER ,  Guanyang LIN

    发明人： Hengpeng WU ,  Yi CAO ,  SungEun HONG ,  Jian YIN ,  Margareta PAUNESCU ,  Mark O. NEISSER ,  Guanyang LIN

    IPC分类号： G03F7/20

    CPC分类号： G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  C08F212/08 ,  C08F212/32 ,  C08F220/14 ,  C08F293/00 ,  C08L53/00 ,  C09D125/14 ,  C09D125/16 ,  G03F7/0002 ,  G03F7/2037

    摘要： The present invention relates to novel neutral layer compositions and methods for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The compositions and processes are useful for fabrication of electronic devices. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.

    摘要翻译： 本发明涉及新型中性层组合物和使用中性层组合物对准定向自组装嵌段共聚物（BCP）的微区的方法。 组合物和方法可用于制造电子装置。 中性层组合物包含至少一种具有至少一个结构单元（1），至少一个结构单元（2）和至少一个结构单元（3）的无规共聚物，其中R1选自 C 1 -C 8烷基，C 1 -C 8氟烷基部分，C 1 -C 8部分氟化烷基，C 4 -C 8环烷基，C 4 -C 8环氟烷基，C 4 -C 8部分氟化环烷基和C 2 -C 8羟烷基; R2，R3和R5独立地选自H，C1-C4烷基，CF3和F; R 4选自H，C 1 -C 8烷基，C 1 -C 8部分氟化烷基和C 1 -C 8氟代烷基，n为1至5，R 6选自H，F，C 1 -C 8烷基 和C 1 -C 8氟烷基，m为1至3。

    Compositions of neutral layer for directed self assembly block copolymers and processes thereof
    14.
    发明授权
    Compositions of neutral layer for directed self assembly block copolymers and processes thereof 有权
    用于定向自组装嵌段共聚物的中性层组合物及其工艺

    公开(公告)号：US08691925B2

    公开(公告)日：2014-04-08

    申请号：US13243640

    申请日：2011-09-23

    申请人： Hengpeng Wu ,  Yi Cao ,  SungEun Hong ,  Jian Yin ,  Margareta Paunescu ,  Mark O. Neisser ,  Guanyang Lin

    发明人： Hengpeng Wu ,  Yi Cao ,  SungEun Hong ,  Jian Yin ,  Margareta Paunescu ,  Mark O. Neisser ,  Guanyang Lin

    IPC分类号： C08F118/02 ,  G03F7/20 ,  C08L33/12

    CPC分类号： G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  C08F212/08 ,  C08F212/32 ,  C08F220/14 ,  C08F293/00 ,  C08L53/00 ,  C09D125/14 ,  C09D125/16 ,  G03F7/0002 ,  G03F7/2037

    摘要： The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.

    摘要翻译： 本发明涉及新型中性层组合物和使用该组合物的方法。 中性层组合物包含至少一种具有至少一个结构单元（1），至少一个结构单元（2）和至少一个结构单元（3）的无规共聚物，其中R1选自 C 1 -C 8烷基，C 1 -C 8氟烷基部分，C 1 -C 8部分氟化烷基，C 4 -C 8环烷基，C 4 -C 8环氟烷基，C 4 -C 8部分氟化环烷基和C 2 -C 8羟烷基; R2，R3和R5独立地选自H，C1-C4烷基，CF3和F; R 4选自H，C 1 -C 8烷基，C 1 -C 8部分氟化烷基和C 1 -C 8氟代烷基，n为1至5，R 6选自H，F，C 1 -C 8烷基 和C 1 -C 8氟烷基，m为1至3。

    COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPOLYMERS AND PROCESSES THEREOF
    16.
    发明申请
    COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPOLYMERS AND PROCESSES THEREOF 有权
    用于方向自组装块状共聚物的中性层组成及其工艺

    公开(公告)号：US20130078576A1

    公开(公告)日：2013-03-28

    申请号：US13243640

    申请日：2011-09-23

    申请人： Hengpeng WU ,  Yi CAO ,  SungEun HONG ,  Jian YIN ,  Margareta PAUNESCU ,  Mark O. NEISSER ,  Guanyang LIN

    发明人： Hengpeng WU ,  Yi CAO ,  SungEun HONG ,  Jian YIN ,  Margareta PAUNESCU ,  Mark O. NEISSER ,  Guanyang LIN

    IPC分类号： G03F7/20 ,  C08L33/12

    CPC分类号： G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  C08F212/08 ,  C08F212/32 ,  C08F220/14 ,  C08F293/00 ,  C08L53/00 ,  C09D125/14 ,  C09D125/16 ,  G03F7/0002 ,  G03F7/2037

    摘要： The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.

    摘要翻译： 本发明涉及新型中性层组合物和使用该组合物的方法。 中性层组合物包含至少一种具有至少一个结构单元（1），至少一个结构单元（2）和至少一个结构单元（3）的无规共聚物，其中R1选自 C 1 -C 8烷基，C 1 -C 8氟烷基部分，C 1 -C 8部分氟化烷基，C 4 -C 8环烷基，C 4 -C 8环氟烷基，C 4 -C 8部分氟化环烷基和C 2 -C 8羟烷基; R2，R3和R5独立地选自H，C1-C4烷基，CF3和F; R 4选自H，C 1 -C 8烷基，C 1 -C 8部分氟化烷基和C 1 -C 8氟代烷基，n为1至5，R 6选自H，F，C 1 -C 8烷基 和C 1 -C 8氟烷基，m为1至3。

    Underlayer composition for promoting self assembly and method of making and using
    20.
    发明授权
    Underlayer composition for promoting self assembly and method of making and using 有权
    促进自组装的底层成分及制作及使用方法

    公开(公告)号：US09181449B2

    公开(公告)日：2015-11-10

    申请号：US14107325

    申请日：2013-12-16

    申请人： Yi Yi ,  Jian Yin ,  Guanyang Lin

    发明人： Yi Yi ,  Jian Yin ,  Guanyang Lin

    IPC分类号： C09D143/04 ,  C09D133/12 ,  G03F7/16 ,  C09D137/00 ,  G03F7/00

    CPC分类号： C09D143/04 ,  C09D133/12 ,  C09D137/00 ,  G03F7/0002 ,  G03F7/168

    摘要： Disclosed herein is an underlayer composition, wherein the underlayer is typically used for promoting the formation of self assembled structures, and wherein the underlayer formulation comprises: (a) a polymer comprising at least one monomer repeat unit having the structure (I) wherein X is a crosslinking group chosen from and wherein n is 0-5, p is 0-5, q is 1-2, m is 1-2 and R is H, C1-C4alkyl or tri(C1-C4alkyl)silyl; (b) at least one thermal acid generator; and (c) a solvent. The invention further relates to methods of making and using the composition.

    摘要翻译： 本文公开了一种底层组合物，其中底层通常用于促进自组装结构的形成，并且其中底层制剂包含：（a）包含至少一种具有结构（I）的单体重复单元的聚合物，其中X为 选自其中n为0-5的交联基团，p为0-5，q为1-2，m为1-2，R为H，C 1 -C 4烷基或三（C 1 -C 4烷基）甲硅烷基; （b）至少一个热酸发生器; 和（c）溶剂。 本发明还涉及制备和使用该组合物的方法。